Manufacturing method of embedded epitaxial layer
A manufacturing method and epitaxial layer technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problem of increasing particle defect size, and achieve the effect of low cost and simple process
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[0066] Such as figure 2 Shown is the flow chart of the exceptional extension process method of the present invention; Figure 3A to Figure 3D What is shown is a schematic diagram of the device structure in each step of the manufacturing method of the embedded epitaxial layer 6 of the embodiment of the present invention; the manufacturing method of the embedded epitaxial layer 6 of the embodiment of the present invention includes the following steps:
[0067] Step one, such as Figure 3A As shown, a dry etching process is used to form a groove 5 in the silicon substrate, and the cross section of the groove 5 has a U-shaped structure.
[0068] In the embodiment of the present invention, a gate structure is formed on the silicon substrate, and the groove 5 is self-aligned and formed in the groove 5 on both sides of the gate structure;
[0069] The gate structure includes a gate dielectric layer and a polysilicon gate 2 stacked in sequence;
[0070] A top hard mask layer 3 is covered on t...
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