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Scraper discharging full-automatic control method and production line for basic copper chloride

A copper chloride, production line technology, applied in the direction of copper chloride, chemical instruments and methods, copper halide, etc., to achieve the effects of improving production efficiency, high production efficiency, and fast unloading speed

Inactive Publication Date: 2020-09-04
RUANSHI CHEM CHANGSHU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem mainly solved by the present invention is to provide a fully automatic control method and production line for basic cupric chloride scraper unloading, which can solve the shortcomings of the existing unloading method

Method used

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  • Scraper discharging full-automatic control method and production line for basic copper chloride

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Experimental program
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Embodiment 1

[0046] Acidic etching solution and alkaline etching solution are used as raw materials, which are temporarily stored in acidic solution tank and alkaline solution tank respectively, and then sent to acid high level tank and alkali high level tank respectively through acid delivery pump and alkali delivery pump. Open the reuse water inlet valve to introduce water into the dripping water head tank, and respectively flow the acidic etching solution, alkaline etching solution and water into the respective dripping main pipes, and drop them into the reaction barrel through the dripping valve. Under the conditions of stirring in the reaction tank and direct steam heating to 60~75°C, neutralize the three liquids in the reaction tank to reach a Baume degree of 7~12 and a pH value of 4.5~4.8. During the reaction The ammonia gas produced is recycled through the exhaust gas recovery device. When the liquid level of the dropwise reaction solution reaches 90% to 95% of the volume of the re...

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Abstract

The invention discloses a scraper discharging full-automatic control method and production line for basic copper chloride and belongs to the field of chemical production. The production line comprisesa raw material supply device, a reaction barrel, a drainage device and a centrifugal discharging device. The raw material supply device is communicated with the reaction barrel, and the bottom end ofthe reaction barrel is connected with a material conveying header pipe through a bottom valve. One end of the material conveying header pipe is connected with a drainage device, and the other end ofthe material conveying header pipe is connected with the centrifugal discharging device. A material conveying pump is mounted on a pipeline between the centrifugal discharging device and the materialconveying header pipe. The full-automatic discharging control method is completed through control of a controller and comprises the following steps that a centrifugal machine is started and drained; feeding is performed by a centrifugal machine; the centrifugal machine normally feeds and is full of materials; centrifugal treatment is carried out; discharging is performed by a scraper; and the machine is shutdown for filter cloth replacement. Through the control effect of the controller, operation of all procedures of the whole production line is automatically controlled, online automatic discharging is achieved, the whole production line is high in production efficiency and discharging speed, labor and time cost is saved, and the production efficiency can be improved.

Description

technical field [0001] The invention relates to the technical field of preparation of basic copper chloride, in particular to a fully automatic control method and production line for scraper unloading of basic copper chloride. Background technique [0002] Etching solution is a raw material for copper engraving. A liquid that sculpts by eroding the properties of a material. There are six types of etching solutions currently in use: acidic copper chloride, basic copper chloride, ferric chloride, ammonium persulfate, sulfuric acid / chromic acid, sulfuric acid / hydrogen peroxide etching solution. [0003] In recent years, my country's electronics industry has developed rapidly, and a large number of acid etching solutions and alkaline etching solutions have also been produced. If these etching solutions are directly discharged, they will seriously pollute the environment, affect the survival of microorganisms in the water, destroy the structure of soil aggregates, and affect th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J4/00B04B5/10B04B11/08C01G3/05
CPCB01J4/00B01J2204/005B04B5/10B04B11/08C01G3/05
Inventor 阮玉根
Owner RUANSHI CHEM CHANGSHU
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