Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Deforming contact type fabric fluff removal device

A contact-type, fluffy technology, applied in the field of garment processing, can solve the problems of fabric wrinkles, increase production costs, and fluff attached, and achieve the effect of promoting sinking, reducing the possibility, and improving antistatic performance

Active Publication Date: 2020-09-11
SHANDONG TAROKO WEAVING & DYEING IND
View PDF6 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, in the process of fabric processing, a lot of fluff is easily attached to the surface of the fabric. The removal method often used in the prior art is the washing method, but only by washing with water may first cause wrinkles in the fabric itself, requiring technicians to clean the fabric. Ironing increases the production cost, and it is easy to attach fluff again after the cloth is dry

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Deforming contact type fabric fluff removal device
  • Deforming contact type fabric fluff removal device
  • Deforming contact type fabric fluff removal device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] see Figure 1-4 , a deformation contact type cloth fluff removal device, comprising a fluff removal box 1, the inner wall of the fluff removal box 1 is fixedly connected with a partition plate 2, and a semiconductor refrigeration chip 3 is embedded in the partition plate 2, and the inner wall of the fluff removal box 1 It is fixedly connected with a load-bearing filter screen 4 positioned on the upper side of the partition plate 2. The upper end of the load-bearing filter screen 4 is fixedly connected with a plurality of evenly distributed velvet picking devices 5. The top of the fluff removal box 1 is provided with a cloth 6. The velvet picking device 5 includes The metal connecting rope 7 fixedly connected with the carrying filter 4, the upper end of the metal connecting rope 7 is fixedly connected with a lifting air bag, and the lifting air bag includes a pair of heat-conducting discs 8 distributed up and down, and an annular bag is fixedly connected between the two h...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a deforming contact type fabric fluff removal device, and belongs to the technical field of clothing processing. A semiconductor refrigeration sheet is heated to 60 DEG C and the heat is transferred to a fluff collecting device. With the expansion of a lifting air bag, the lifting air bag can be promoted to move up until the fluff collecting device comes to contact with fabric. Meanwhile, by intermittently starting and turning off an electromagnet, the fluff collecting device can repeatedly move up and down between a bearing filter screen and the fabric and collect fluff adhering to the surface of the fabric with the help of collecting bore spines and hot melt adhesive layers at the outer ends of fluff collecting balls. When the fluff collecting balls come into contact with the fabric, the fluff collecting balls can squeeze the fabric until the fluff collecting balls become flat balls, and the collection efficiency of the fluff adhering to the surface of the fabric is increased. Meanwhile, traction particles are released, so that the fluff adhering with the traction particles can be adsorbed downward and collected. Moreover, the antistatic property of the fabric can be improved through an antistatic powder layer, and the possibility of the fluff adhering to the fabric again can be reduced.

Description

technical field [0001] The invention relates to the technical field of garment processing, more specifically, to a deformation contact type cloth delinting device. Background technique [0002] Garment processing, English name: Garment processing, used to refer to women's weaving, sewing and other work. People are more accustomed to using the term "female worker" to refer to a kind of work performed by female workers engaged in weaving, sewing, embroidery and other work in ancient times. Manual labor, in today's sense, refers to a modern processing method, a clothing production method that is dominated by modern machine processing and supplemented by manual processing. [0003] Cloth is a commonly used material in decorative materials. Including chemical fiber carpets, non-woven wall coverings, linen cloth, nylon cloth, colored tape, flannel and other fabrics. Cloth plays a considerable role in the decorative display, and is often the main force that cannot be ignored in t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D06G1/00F25B21/02H05F1/02
CPCD06G1/00F25B21/02H05F1/02
Inventor 不公告发明人
Owner SHANDONG TAROKO WEAVING & DYEING IND
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com