Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Fabrication method of a ridge-type GaAs-based laser with an asymmetric injection window

A laser, asymmetric technology, applied in the structure of the active area, the structure of the optical waveguide semiconductor, etc., can solve the problem of ignoring the control of the divergence angle, to suppress the optical catastrophe damage, reduce the spot pattern, and facilitate the spot shaping or coupling. Effect

Active Publication Date: 2021-12-07
潍坊华光光电子有限公司
View PDF29 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The aforementioned technologies have adopted a series of measures to increase the initial bandgap of the cavity surface area to improve the laser’s ability to resist COD, but neglected the control of the divergence angle. After the anti-COD ability increases, the divergence angle will change, and the divergence angle will affect the later use of the laser. effect plays a more important role

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fabrication method of a ridge-type GaAs-based laser with an asymmetric injection window
  • Fabrication method of a ridge-type GaAs-based laser with an asymmetric injection window
  • Fabrication method of a ridge-type GaAs-based laser with an asymmetric injection window

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] A preparation method of a ridge-type GaAs-based laser with an asymmetric injection window, the laser includes an epitaxial wafer, and the epitaxial wafer includes a substrate, an N confinement layer, a lower waveguide layer, a quantum well active region, and an upper waveguide that are sequentially arranged from bottom to top layer, P confinement layer and ohmic contact layer, the preparation method is as figure 1 shown, including the following steps:

[0032] Step (1), etching a ridge structure on the upper surface of the epitaxial wafer, the ridge structure is located at the center of the epitaxial wafer, and the area other than the ridge structure is etched to the upper waveguide layer, and the ridge structure remains To the ohmic contact layer, the ridge structure runs through the entire cavity length of the epitaxial wafer; as figure 2 shown.

[0033] Step (2), the ridge structure is divided into a ridge light emitting area and a window area, the window area is ...

Embodiment 2

[0040] A preparation method of a ridge-type GaAs-based laser with an asymmetric injection window, the steps of which are as described in Example 1, the difference is that in step (1), the ridge-type structure is located on the side of the epitaxial wafer.

Embodiment 3

[0042] A method for preparing a ridge-type GaAs-based laser with an asymmetric injection window, the steps of which are as described in Example 1, except that in step (3), the prepared figure is elliptical.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a preparation method of a ridge-type GaAs-based laser with an asymmetric injection window, which belongs to the technical field of semiconductor laser preparation. and the ohmic contact layer are all etched, and then the ohmic contact layer on the ridge structure in the window area is etched away, and then the area of ​​the waveguide layer is etched from all sides except the ridge structure in the window area, and the regular Then use PECVD and photolithography to prepare the current injection window in the ridge-shaped light-emitting area. Finally, the prepared sample is formed into a laser through steps such as electrode deposition, thinning, alloying, and packaging. The divergence angle of the spot pattern is changed by changing the refractive index of the waveguide layer, which limits the absorption of light near the cavity surface, effectively improves the COD threshold of high-power semiconductor lasers, restricts the divergence angle, and improves the quality of the spot.

Description

technical field [0001] The invention relates to a preparation method of a ridge-type GaAs-based laser with an asymmetric injection window, belonging to the technical field of semiconductor lasers. Background technique [0002] Since the advent of semiconductor lasers, they have been favored in various fields due to their small size, high power, long life, and convenient use. High-power semiconductor lasers have the advantages of small size, light weight, high efficiency, wide band coverage, and easy integration. They are widely used, and higher requirements are placed on their output power and beam quality performance. In the process of increasing the output power of high-power semiconductor lasers, the occurrence of optical catastrophic damage (COD) on the cavity surface has become one of the main limiting factors. Optical catastrophe damage (COD) on cavity surface Because the cavity surface of the laser is located at the edge of the heat sink, the heat dissipation is poor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/22H01S5/34
CPCH01S5/22H01S5/34
Inventor 陈康王金翠苏建任夫洋殷方军
Owner 潍坊华光光电子有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products