Preparation method of ridge-type GaAs-based laser with asymmetric injection window
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 潍坊华光光电子有限公司
- Publication Date
- 2020-10-09
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Abstract
Description
Technical field
[0001] The invention relates to a method for preparing a ridge GaAs-based laser with an asymmetric injection window, and belongs to the technical field of semiconductor lasers. Background technique
[0002] Since the advent of semiconductor lasers, due to its small size, high power, long life, and easy use, it has been favored in various fields. High-power semiconductor lasers have the advantages of small size, light weight, high efficiency, wide range of coverage, easy integration, etc., are widely used, and higher requirements are put forward for their output power and beam quality performance. In the process of increasing the output power of high-power semiconductor lasers, the appearance of cavity surface optical catastrophic damage (COD) has become one of the main limiting factors. Cavity surface optical catastrophic damage (COD) Because the laser cavity surface is located at the edge of the heat sink, the heat dissipation is poor. The electron-hole pairs ge...