Rare earth metal electrochromic film electrode and preparation method and application thereof

An electrochromic, rare earth metal technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of poor weather resistance, light color, easy aging and so on

Pending Publication Date: 2020-10-20
深圳唯杰科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the existing inorganic electrochromic electrodes have poor weather resistance and are easy to age, and generally use single metal sputtering, which has a slow discoloration reaction and a lighter color

Method used

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  • Rare earth metal electrochromic film electrode and preparation method and application thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] This embodiment provides a rare earth metal electrochromic thin film electrode, its structure is as follows figure 1 As shown, the transparent color-changing functional layer 1, the transparent conductive layer 2 and the substrate 3 are in the order of top and bottom; the transparent color-changing functional layer 1 is formed by mixing rare earth color-changing metal W and interstitial metal Ni. The thickness of the transparent color-changing functional layer is 25nm. The transparent conductive layer is an ITO layer with a thickness of 20nm. The tetragonal resistance of the ITO layer is 100Ω. The base material is PET, the thickness is 30 μm, and the thickness error is not more than 5 μm. The mass content W of the rare earth color-changing metal in the transparent color-changing functional layer is 92%, and the mass content of the interstitial metal Ni is 8wt%. The preparation method of this film electrode is:

[0027] (1) Form a transparent conductive layer on the ...

Embodiment 2

[0032] This embodiment provides a rare earth metal electrochromic thin film electrode, its structure is as follows figure 1 As shown, there are transparent color-changing functional layer 1, transparent conductive layer 2 and substrate 3 in the order of top and bottom; transparent color-changing functional layer 1 is made of rare earth color-changing metal Nb 2 o 5 Mixed with interstitial metal Ti. The thickness of the transparent color-changing functional layer is 20nm. The transparent conductive layer is an ITO layer with a thickness of 30nm. The tetragonal resistance of the ITO layer is 200Ω. The base material is PET, the thickness is 50 μm, and the thickness error is not more than 5 μm. The mass content of rare earth color-changing metal Nb in the transparent color-changing functional layer 2 o 5 W is 85%, and the mass content of interstitial metal Ti is 15wt%. The preparation method of this film electrode is:

[0033] (1) Form a transparent conductive layer on the...

Embodiment 3

[0038] This embodiment provides a rare earth metal electrochromic thin film electrode, its structure is as follows figure 1 As shown, the transparent color-changing functional layer 1, the transparent conductive layer 2 and the substrate 3 are followed in the order of top and bottom; the transparent color-changing functional layer 1 is made of rare earth color-changing metal IrO 2 and interstitial metal Ta 2 o 5 mixed. The thickness of the transparent color-changing functional layer is 30nm. The transparent conductive layer is an ITO layer with a thickness of 10nm. The tetragonal resistance of the ITO layer is 80Ω. The base material is PET, the thickness is 100 μm, and the thickness error is not more than 5 μm. The mass content IrO of the rare earth discoloration metal in the transparent discoloration functional layer 2 W is 80%, interstitial metal Ta 2 o 5 The mass content is 20wt%. The preparation method of this film electrode is:

[0039] (1) Form a transparent co...

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Abstract

The invention provides a rare earth metal electrochromic film electrode and a preparation method and application thereof. The film electrode sequentially comprises a transparent color-changing functional layer, a transparent conductive layer and a base material from top to bottom, and the transparent color-changing functional layer is formed by mixing rare earth color-changing metal and interstitial metal. The preparation method comprises the steps of forming the transparent conductive layer on the base material through magnetron sputtering; uniformly mixing rare earth color-changing metal andinterstitial metal, and impacting into blocks to form a metal sputtering target material; and carrying out magnetron sputtering on the metal sputtering target material on the transparent conductive layer to form the transparent color-changing functional layer. The color-changing functional layer adopts the technical scheme of mixing the color-changing metal and the interstitial metal, and has thecharacteristics of multiple holes, large hole diameter and small obstruction to ion intercalation and extraction, so that the film electrode is quick in color-changing response and relatively deep incolor.

Description

technical field [0001] The invention relates to the technical field of electrochromic film preparation, in particular to a rare earth metal electrochromic thin film electrode, a preparation method and application thereof. Background technique [0002] Electrochromic film is the latest product in the field of electro-optic responsive film, which has the advantages of no angle, low haze, low voltage, low power consumption, and memory. It is usually divided into two categories: organic electrochromic electrodes and inorganic electrochromic electrodes. Organic electrochromic electrodes have poor weather resistance and cannot be used in outdoor, high-temperature and high-humidity places for a long time, so their application prospects are lower than inorganic electrochromic electrodes. [0003] The existing inorganic electrochromic electrodes are based on the target of rare earth metals, and then the electrochromic layer is formed by magnetron sputtering. Generally, unsaturated tr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1523G02F1/155G02F1/153C23C14/35C23C14/08
CPCG02F1/1523G02F1/155G02F1/153C23C14/35C23C14/08C23C14/086C23C14/0036
Inventor 高太恒张成黄越楷廖兆贤廖德艺廖兆雄
Owner 深圳唯杰科技有限公司
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