PRODUCTION METHOD FOR ADDITIVE-MANUFACTURED PRODUCT USING PURE COPPER POWDER HAVING Si COATING
A technology of additive manufacturing and manufacturing method, which is applied in the field of manufacturing of additive manufacturing products, and can solve the problems of difficulty in powder, detachment, and sintering of metal powder.
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Embodiment 1、 comparative example 1
[0125] (Example 1, Comparative Example 1: heat treatment temperature after surface treatment)
[0126] As pure copper powder, prepared by the atomization method with an average particle size (D50) of 72μm and a specific surface area of 0.0024m 2 / g of pure copper powder, the pure copper powder is immersed in dilute sulfuric acid aqueous solution, thereby removing the natural oxide film on the surface. Next, after immersing the pure copper powder in a coupling agent aqueous solution (5%) diluted with pure water for 60 minutes, it was dried at 70° C. to 120° C. in a vacuum or in the air. After drying, this pure copper powder was heat-processed at 550 degreeC - 800 degreeC in vacuum (Example 1-1, 1-2). On the other hand, Comparative Examples 1-1 and 1-2 were not heat-treated.
[0127] Table 1 summarizes the Si deposition amount, Si coverage ratio, Si film thickness, C deposition amount, and weight ratio C / Si of the pure copper powder coated by the above treatment.
[0128] A...
Embodiment 2
[0130] (Example 2: Kind of Surface Treatment Agent)
[0131] As pure copper powder, prepared by the atomization method with an average particle size (D50) of 72 μm and a specific surface area of 0.0028m 2 / g of pure copper powder, the pure copper powder is immersed in dilute sulfuric acid aqueous solution, thereby removing the natural oxide film on the surface. Next, after immersing the pure copper powder in an epoxysilane aqueous solution (5%) diluted with pure water for 60 minutes, it was dried at 70° C. to 120° C. in a vacuum or in the air. After drying, the pure copper powder was heat-treated at 800° C. in vacuum (Example 2-1). Table 2 summarizes the Si deposition amount, the C deposition amount, and the weight ratio C / Si of the pure copper powder on which the Si coating was formed by the above treatment.
[0132] The verification of "the state of the powder after the sintering test" was performed on these pure copper powders on which the Si coating was formed showed g...
Embodiment 3
[0134] (embodiment 3: the particle diameter of pure copper powder)
[0135] As the pure copper powder, an average particle diameter (D50) of 38 μm produced by an atomization method was prepared, and the pure copper powder was immersed in a dilute sulfuric acid aqueous solution to remove the natural oxide film on the surface. Next, after immersing the pure copper powder in a diaminosilane aqueous solution (5%) diluted with pure water for 60 minutes, it was dried at 70° C. to 120° C. in a vacuum or in the air. After drying, this pure copper powder was heat-treated at 550° C. in vacuum (Example 3-1). Table 3 summarizes the Si deposition amount, the C deposition amount, and the weight ratio C / Si of the pure copper powder on which the Si coating was formed by the above treatment.
[0136] The verification of "the state of the powder after the sintering test" was performed on these pure copper powders on which the Si coating was formed showed good results. Table 3 shows the above ...
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