A kind of two-dimensional polymer brush and its crystal and preparation method

A polymer brush and crystal technology, applied in the field of two-dimensional materials, can solve complex photolithography steps, damage and other problems, achieve high-efficiency connection, ensure completeness, and reduce the difficulty of characterization

Active Publication Date: 2021-07-20
SOUTH CHINA UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] For "bottom-up" patterning methods, the patterning of block copolymers can be finer and more controllable, but they are usually limited by complex photolithography steps, limited substrates and / or physical properties of substrates. destroy

Method used

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  • A kind of two-dimensional polymer brush and its crystal and preparation method
  • A kind of two-dimensional polymer brush and its crystal and preparation method
  • A kind of two-dimensional polymer brush and its crystal and preparation method

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Effect test

Embodiment

[0051] A method for preparing a two-dimensional polymer brush, comprising the following steps:

[0052](1) prepare the aldehyde-based monomer (being compound 4) of following structure, specifically comprise the following steps:

[0053]

[0054] Step (1): Synthesis of compound 1:

[0055]

[0056] Add tribromotridene (200mg, 0.345mmol) and potassium tert-butoxide (571.2mg, 5.1mmol) into the two-neck flask, after nitrogen protection, add 30mL of anhydrous THF, raise the temperature to 60°C, react for 30min, and gradually add 2-(6-Bromohexyl)tetrahydropyran (914.9mg, 3.45mol), stirred overnight; after the reaction was completed, quenched the reaction by adding water, extracted 3-4 times with dichloromethane, and the organic phase was extracted by anhydrous magnesium sulfate After drying and filtering, the solvent was distilled off under reduced pressure; the obtained crude product was purified by silica gel column chromatography and recrystallized to obtain a light yellow...

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Abstract

The invention discloses a two-dimensional polymer brush and its crystal and a preparation method. The structure of the two-dimensional polymer brush is shown in formula I. The two-dimensional polymer brush is crystallized in dichloromethane to form a special Patterned 2D polymer brush crystals. The present invention adopts a "bottom-up" method, and the crystalline polymer (mPEG-N 3 ) into the C3 symmetric aldehyde building block (compound 4) of covalent organic frameworks (COFs) with high-efficiency linkage bonds, and then use the hot solvent method in step (3) to combine it with the rigid structure with amino groups at both ends Form dynamic covalent bonds, and prepare two-dimensional polymer brushes in which crystalline polymers are periodically distributed on the surface of two-dimensional COF materials. And the polymer is brushed in a special solvent, which can realize a special crystal structure pattern at the nanometer scale.

Description

technical field [0001] The invention belongs to the field of two-dimensional materials, and in particular relates to a two-dimensional polymer brush, its crystal and a preparation method. Background technique [0002] At present, the main methods to achieve two-dimensional plane patterning are: 1) The "top-down" processing method is to copy or transfer the pattern through direct contact between the patterned mold or stamp and the substrate. This method is determined by external forces and can be designed. Arbitrarily form any patterned structure, but there are also disadvantages such as high processing cost and long cycle; 2) The "bottom-up" patterning method is to construct complex multi-scale structures through self-assembly, and the patterned structure is obtained by thermodynamics and kinetics Commonly determined, the most attractive feature of the "bottom-down" patterning method is that it can be directly patterned in large quantities without expensive tools. With the r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G12/08C08G65/332C07C67/08C07C69/606
CPCC07C45/64C07C67/08C07D309/12C08G12/08C08G65/3326C07C2603/54C07C69/606C07C47/57
Inventor 尧晟林张维司自卫田宇锋
Owner SOUTH CHINA UNIV OF TECH
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