Exposure device

Abstract

The present application relates to an exposure device, comprising: a liquid crystal display mask, comprising a first substrate, a second substrate and a liquid crystal layer, a plurality of liquid crystals being distributed in the liquid crystal layer; a controller, used for controlling the liquid crystal display mask to display a preset pattern and controlling the area, except the area covered bythe preset pattern, of the surface of the liquid crystal display mask to be a lightproof area. First emergent light emitted by a light source irradiates and penetrates through the surface of the liquid crystal display mask. When the area is covered by the preset pattern, second emergent light is emitted, the light source irradiates the exposed object to enable the surface, irradiated by the second emergent light, of the exposed object to be exposed to display a preset shape pattern, and controls the driving voltage values of the liquid crystals in different areas in the liquid crystal layer by the controller so as to control the rotating direction and/or the twisting degree of the liquid crystals in the different areas and control the intensity value of the second emergent light. The exposure device is simple in imaging, low in cost and high in imaging accuracy.

Description

technical field [0001] The present application relates to the technical field of semiconductor manufacturing, in particular to an exposure device. Background technique [0002] With the rapid development of semiconductor technology and the increase in market demand for various semiconductor devices, the market has put forward higher requirements for the supply capacity and product quality of semiconductor manufacturers. Exposure and development is one of the important steps in the etching process of semiconductor devices. The accuracy of pattern formation by exposure and development is one of the decisive factors affecting the accuracy of etching, and determines the yield rate of the final semiconductor device, the service life of the product and the reliability of the work. stability. [0003] In the conventional exposure and development process, a light emitting diode (Light Emitting Diode, LED) parallel exposure machine or a laser direct imaging (Laser Direct Imaging, LD...

AI Technical Summary

Problems solved by technology

However, LED parallel exposure machines need to use film as the carrier of image information, and the production, use and storage of film require professional equipment and special environments. Improper handling or encountering special circumstances will bring great harm to the user. workload and increase unnecessary usage costs

Although the LDI laser exposure machine does not need to use film to directly image, the cost of laser imaging is high, and the life of the core component laser generator is short, resulting in a high average cost for a single successful exposure

The cost of exposure remains high and the accuracy of exposure imaging is difficult to meet the target requirements, which has become one of the important factors restricting the development of semiconductor manufacturing process

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