An Informatics Computational Lithography Method

Abstract

The invention provides an informatics calculation lithography method. Firstly, the channel model of computational lithography is established according to information theory, and then the optimal mask distribution, optimal lithography system parameters and process parameters under information theory are solved, and finally information theory is used to improve Calculate the convergence accuracy of the lithography algorithm; thus, the essence of the present invention is to describe the lithography system with a channel model, abstract the lithography imaging process as a channel transmission process, and regard mask graphics and lithography imaging as the input and For the output signal, the lithography system parameters and lithography process parameters are regarded as channel parameters that affect the transmission of lithography layout information, and the optimization of the mask by computational lithography is equivalent to the encoding process of the signal; that is to say, the present invention establishes The informatics model of computational lithography, through mathematical methods to study the information transmission mechanism and laws of lithography patterns, can obtain the theoretical limit of computational lithography imaging accuracy and improve the convergence accuracy of computational lithography algorithms.

Description

technical field [0001] The invention belongs to the field of microelectronics manufacturing and information technology, and in particular relates to an informatics calculation photolithography method. Background technique [0002] Photolithography is a key technology in the manufacture of integrated circuits. The photolithography system uses a short-wavelength light source to illuminate the mask on which the circuit pattern to be printed is pre-recorded. After the light passes through the mask, it is collected by the projection objective lens and projected onto the silicon wafer coated with photoresist. After exposure, development, etching and other processes, the circuit pattern is reproduced on the silicon wafer. [0003] However, the etching precision of a photolithography system will be affected by light diffraction, interference, and other optical effects and process variations. For this reason, computational lithography technology is widely used in the integrated cir...

AI Technical Summary

Problems solved by technology

However, researchers are still unclear about the informatics nature of computational lithography and the transmission mechanism of lithographic layout information in the framework of computational lithography. At the same time, the theoretical limit of the imaging accuracy of lithography systems that computational lithography algorithms can achieve is not yet clear. clear

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