Wastewater treatment device in semiconductor production

Abstract

The invention discloses a wastewater treatment device in semiconductor production, which structurally comprises a water inlet pipe, a top cover, an energy-saving motor, a mixing and stirring device, an acid-base neutralizer body, support leg columns and a water outlet pipe. The water outlet pipe is installed at the bottom center of the acid-base neutralizer body, and the bottom of the acid-base neutralizer body is also vertically connected with the support leg columns. Compared with the prior art, the wastewater treatment device has the beneficial effects that through combined arrangement of arotating shaft, a first agent feeding mechanism, a second agent feeding mechanism and a stirring mechanism, agent feeding barrels are placed in different layers and different directions in wastewater, so that a neutralizer can be contained in different depths and different directions of the wastewater, and then the wastewater and the neutralizers are stirred and mixed, the mixing and neutralizingeffect can be improved, the wastewater is mixed and neutralized more thoroughly, the neutralizer is prevented from being directly poured into the wastewater from a high place, so that the neutralizeris prevented from being mixed and neutralized with upper-layer wastewater firstly, and the wastewater acid-base neutralization treatment efficiency is improved.

Description

Technical field[0001]The invention relates to the technical field of semiconductor production and processing, in particular to a wastewater treatment device in semiconductor production.Background technique[0002]With the improvement of IC integration, the cleanliness of the surface of the silicon wafer is very important to obtain the high performance and high yield of IC devices. Therefore, in the production process of the semiconductor diffuser, the silicon wafer needs to be cleaned 2 to 3 times. To reduce contamination, the current cleaning of silicon wafers mainly adopts wet chemical cleaning. The wastewater of wet chemical cleaning is often acidic or alkaline. If it is directly discharged, it will cause water pollution, so acid-base neutralization is required.[0003]At present, the neutralizer is poured directly into the wastewater, and the neutralizer is poured from a high place, so that the upper layer of wastewater is mixed with the neutralizer first, while the lower layer of w...

AI Technical Summary

Problems solved by technology

[0003] At present, the neutralizer is directly poured into the wastewater, and the neutralizer is poured from a high place, so that the wastewater in the upper layer is mixed with the neutralizer first, and the wastewater in the lower layer can only be mixed with the upper layer by stirring. Wastewater is mixed and neutralized. The neutralizer enters the wastewater from top to bottom, and the entering concentration is inversely proportional to the depth, so that the neutralization of the wastewater will not be complete enough.

Images