Method of manufacturing corrosion-resistant coated article, corrosion-resistant coated article, and uses thereof
A corrosion-resistant, coating technology that is used in semiconductor/solid-state device manufacturing, coatings, overlay plating, etc. to extend operating life and reduce processing time
Pending Publication Date: 2021-01-19
PICOSUN OY
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- Application Information
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[0010] It is an object of the invention to solve or at least alleviate every problem arising from limitations and disadvantages of the related art
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[0036] Figure 1A and 1B The underlying concept of various embodiments of a method for producing a plasma corrosion resistant coated article 100 from a profiled substrate 10 is schematically presented.
[0037] The profiled substrate 10 is provided as a three-dimensional object suitable for coating by chemical deposition methods. The inventive concept is particularly applicable to profiled substrates that contain high aspect ratio features 11, such as recesses and / or perforations, referred to as "profiles". Thus, the profiled substrate can be configured as a perforated substrate, a substrate with a patterned surface, or a combination of perforated and patterned surfaces. Profiles may be configured as discrete (eg, in the form of discrete, individual apertures / holes) or continuous, such as grooves, channels (including through channels), grooves, and the like. While perforations may be described as through holes or channels penetrating through the substrate; recesses are descr...
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Abstract
The invention provides a method of manufacturing a corrosion-resistant coated article, a corrosion-resistant coated article, and uses thereof. The present invention provides a method of manufacturinga corrosion resistant coated article from a profiled substrate, comprising: depositing, in a device of chemical deposition, a conformal first coating on the profiled substrate, the first coating beingprovided as a first metal compound, and depositing, on top of the first coating, a second coating provided as a second metal compound; delivering a halogen-containing plasma onto the profiled substrate in a plasma processing apparatus to produce a corrosion-resistant third coating; wherein the third coating consists of a halogen-doped second metal compound. The method enables deposition of triplecoatings for protection of articles used in plasma processing apparatuses such as plasma enhanced chemical vapor deposition (PECVD) devices or plasma etchers.
Description
technical field [0001] The present invention generally relates to methods of protecting surfaces in plasma processing methods such as plasma etching. In particular, the present invention relates to the manufacture of plasma corrosion resistant coated articles using vapor chemical deposition methods. Background technique [0002] Chemical deposition methods, such as chemical vapor deposition (CVD) and atomic layer deposition (ALD), are widely described in the art. ALD technology, generally considered a subclass of CVD processes, has proven to be an effective tool for fabricating high-quality conformal coatings on three-dimensional substrate structures. [0003] Yttrium oxide is known to provide effective countermeasures against halogen plasmas such as fluorine and chlorine generated, for example, during plasma assisted processing such as plasma etching or plasma enhanced chemical vapor deposition (PECVD) widely used in the integrated circuit (IC) industry Plasma protection....
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IPC IPC(8): C23C16/455C23C16/50C23C16/40H01L21/02
CPCC23C16/45525C23C16/50C23C16/403C23C16/405C23C16/40H01L21/02192H01L21/0228H01L21/02274C23C16/30C23C28/042C23C16/45536C23C28/04C23C16/0272C23C16/045C23C16/4404C23C16/45565H01J37/32477
Inventor 朱哈纳·科斯塔莫马尔科·普达斯
Owner PICOSUN OY