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Net-knot-free SE screen printing plate etching process

A knotless, screen technology, applied in the field of knotless SE screen etching process, can solve the problems of fine grid parallel direction steel wire and screen knot, unable to meet the strict control requirements of SE screen, etc.

Pending Publication Date: 2021-03-09
SHANGHAI XIN ZHUO ZHUANG PRINTING TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the mesh distance is fixed during weaving, the difficulties and challenges brought by the conventional process are: the production of no-knot technology cannot meet the strict control requirements of the size and spacing of the SE screen, and there will be parallelism inside the fine grid. Problems with Direction Wires and Knots

Method used

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  • Net-knot-free SE screen printing plate etching process
  • Net-knot-free SE screen printing plate etching process
  • Net-knot-free SE screen printing plate etching process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] A kind of no mesh SE screen plate etching process, comprises the following steps:

[0034] S1 rinse

[0035] Clean the SE screen to be processed, and rinse the SE screen with deionized water for 60s;

[0036] S2 coating

[0037] Coating the photosensitive emulsion for the screen to form a protective film, the thickness of the protective film is 200 μm;

[0038] S3 pattern processing

[0039] Expose the screen according to the requirements, and then wash it. The obtained screen is as follows: the steel wire in a specific position is exposed, and the rest of the position is protected with a photosensitive emulsion.

[0040] S4 etching

[0041] Place the SE screen in the etching solution in the etching tank, and after the etching is completed, immerse it in the cleaning solution for cleaning.

[0042] Described etchant comprises the raw material of following percentage by weight:

[0043] HCl: 4%, FeCl 3 : 35%, H 3 PO 4 : 13%, NaCl: 1.5%, and the rest is water.

...

Embodiment 2

[0046] A kind of no mesh SE screen plate etching process, comprises the following steps:

[0047] S1 rinse

[0048] Clean the SE screen to be processed, and rinse the SE screen with deionized water for 20s;

[0049] S2 coating

[0050] Coating photosensitive emulsion for the screen to form a protective film, the thickness of the protective film is 100 μm;

[0051] S3 Exposure

[0052] Expose the screen according to the requirements, and then wash it. The obtained screen is as follows: the steel wire in a specific position is exposed, and the rest of the position is protected with a photosensitive emulsion.

[0053] S4 etching

[0054] Place the SE screen in the etching solution in the etching tank, and after the etching is completed, immerse it in the cleaning solution for cleaning.

[0055] Described etchant comprises the raw material of following percentage by weight:

[0056] HCl: 3%, FeCl 3 : 30%, H 3 PO 4 : 10%, NaCl: 1%, and the rest is water.

[0057] The cond...

Embodiment 3

[0059] A kind of no mesh SE screen plate etching process, comprises the following steps:

[0060] S1 rinse

[0061] Clean the SE screen to be processed, and rinse the SE screen with deionized water for 60s;

[0062] S2 coating

[0063] Coating the screen with polyimide to form a protective film, the thickness of the protective film is 12 μm;

[0064] S3 pattern processing

[0065] According to the requirements, laser is used to process the required pattern on the PI film, and the obtained screen is as follows: the steel wire in a specific position is exposed, and the remaining positions are protected by PI.

[0066] S4 etching

[0067] Place the SE screen in the etching solution in the etching tank, and after the etching is completed, immerse it in the cleaning solution for cleaning.

[0068] Described etchant comprises the raw material of following percentage by weight:

[0069] HCl: 5%, FeCl 3 : 40%, H 3 PO 4 : 15%, NaCl: 2%, and the rest is water.

[0070] The condi...

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Abstract

The invention discloses a net-knot-free SE screen printing plate etching process. The net-knot-free SE screen printing plate etching process comprises the following steps: S1, flushing: an SE screen printing plate to be processed is cleaned and processed, deionized water is adopted for flushing the SE screen printing plate, and the flushing time is 20s-60s; S2, coating: a photosensitive emulsion is used for coating the screen printing plate to form a protective film, and the thickness of the protective film is 5-200[mu]m; S3, pattern processing: the screen printing plate is processed in an exposure / laser mode according to requirements to obtain a pattern, then flushing is conducted, and the obtained screen printing plate is characterized in that steel wires at specific positions are exposed, and other positions are protected through the emulsion; and S4, etching: the screen printing plate is put into an etching solution in an etching tank for a certain time, and after etching is completed, the screen printing plate is immersed into a cleaning solution for cleaning treatment.

Description

technical field [0001] The invention belongs to the field of screen processing, more specifically, it relates to a no-network SE screen etching process. Background technique [0002] The screen plate is usually composed of stainless steel / tungsten steel and other materials woven into mesh yarns of different mesh sizes and latex coated on the mesh yarns and installed in a mesh frame. It has important application value in the field of solar printing. At present, the client's main requirements for the screen plate have two directions: reduce the cost and improve the battery efficiency. Due to its good shaping and printing performance, the knotless screen began to develop and gradually mature in 2017, and has been used in important applications; in the same year, SE laser mass production equipment was launched. SE technology can obtain high-quality boron-doped layers, with Excellent BSF, based on the original PERC high-efficiency cells, the efficiency can be increased by 0.2%. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/02C23F1/28
CPCC23F1/02C23F1/28
Inventor 卢志强
Owner SHANGHAI XIN ZHUO ZHUANG PRINTING TECH
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