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A high-stability film monitoring method and coating device

A high-stability coating device technology, applied in sputtering coating, vacuum evaporation coating, ion implantation coating, etc., can solve the change of film thickness uniformity, film thickness ratio change, and reduce the yield rate of high-precision coating, etc. problem, to achieve the effect of improving the yield

Active Publication Date: 2021-06-11
上海米蜂激光科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the process of actual mass production, although the process parameters have been determined, the evaporation parameter n value between actual heats will have a certain slight change, resulting in a change in the film thickness ratio of A1 and A2
A change in the film thickness ratio between A1 and A2 will cause two problems: First, the spectral repeatability of the film between heats is not good
The uniformity of film thickness between furnaces at different positions of conventional coating equipment will also change, which will reduce the yield rate of high-precision coatings, and conventional single-point film thickness monitoring systems cannot monitor this ratio change. Therefore, conventional coating Method and equipment cannot solve above-mentioned two problems

Method used

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  • A high-stability film monitoring method and coating device
  • A high-stability film monitoring method and coating device
  • A high-stability film monitoring method and coating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0064] Example 1: Verification of film thickness uniformity

[0065] The high-stability vacuum coating machine in the present invention has a multi-point film thickness monitoring and monitoring system, and compared with the traditional single-point film thickness monitoring system, the uniformity can be effectively improved.

[0066] The specific experimental verification method is: use A and B coating machines to debug the uniformity of the 400-700nm anti-reflection coating respectively. Figure 6-Figure 9 The schematic diagrams of the uniformity curves of the two furnaces prepared for A and B coating machines respectively, Figure 6 A1 is the uniformity of the first furnace of A coating machine, Figure 7 In a2 is the uniformity of the second furnace of A coating machine, Figure 8 In b1 is the uniformity of the first furnace of B coating machine, Figure 9 Middle b2 is the uniformity of the second furnace of B coating machine. From Figure 6 and Figure 7 From the co...

Embodiment 2

[0067] Example 2: Repeatability Verification

[0068] The high-stability vacuum coating machine in the present invention has a three-point monitoring and monitoring system, and compared with the traditional single-point film thickness monitoring system, the repeatability improvement effect between furnaces is good.

[0069] The specific experimental verification method is: use a coating machine with a single film thickness monitoring system, such as Figure 10 Shown ∠CAB is the coating machine of the 90 ° three-point monitoring and detection system and the present invention Figure 5 The shown ∠CAB is the 400-700nm anti-reflection film prepared by the coating machine of the 60° three-point monitoring and monitoring system. Three furnaces were prepared respectively. After the preparation, the spectra of the samples at the same position and different furnaces were compared. The spectra are as follows: Figure 11 , Figure 12 , Figure 13 as shown, Figure 11 , Figure 12 , ...

Embodiment 3

[0070] Example 3: Monitoring and Process Adjustment of Material Evaporation Characteristic Parameter n

[0071] This example illustrates how to calculate the material evaporation characteristic parameter n through the actual measured three-point film thickness data, and how to improve the quality of the coating film through process adjustment when n changes.

[0072] The n-valued evaluation function of a three-point monitoring system is established as shown in formula (3):

[0073] (3)

[0074] in is the material parameter n calculated according to the position of the center point of the umbrella stand, , , Respectively are the instantaneous film thicknesses tested at points A, B, and C at this moment.

[0075] Using TiO 2 / SiO 2 In the process of preparing 400-700nm of the two materials, the data was summarized after monitoring many times. In the case of good repeatability, TiO 2 The material evaporation characteristic parameter n of the material is stable at ab...

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Abstract

The invention provides a high-stability film monitoring method and a film coating device, the method comprising: setting a film thickness monitoring system at least three points on the umbrella stand of a film coating machine to obtain at least three instantaneous film thickness data; Substituting the instantaneous film thickness data into the film thickness distribution formula to obtain the material evaporation characteristic parameter n; by monitoring the change of the material evaporation characteristic parameter n value, the film thickness is monitored and corrected in real time. The invention can obtain an optical thin film with good uniformity, high repeatability and good stability in the mass production process of the thin film, and effectively improves the yield rate of the high-precision coating film.

Description

technical field [0001] The disclosure relates to the technical field of optical thin film preparation, in particular to a method for monitoring a high-stability thin film and a coating device. Background technique [0002] Conventional coating equipment, whether it is a spherical revolution umbrella or a plane public rotation umbrella structure, its thickness monitoring is to place a crystal oscillator film thickness control system or an optical control system at the center of the coating machine umbrella frame to monitor the coating thickness and rate, etc., the coating machine The structure is as figure 1 shown. figure 2 Shown are the innermost A1 and the outermost A2 sample points on the spherical revolving umbrella. In the case of good ideal repeatability, the film thickness ratio of A1 and A2 points is constant. In the actual mass production process, although the process parameters have been determined, the evaporation parameter n value between actual heats will have...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/54C23C14/30C23C14/08C23C14/10
CPCC23C14/083C23C14/10C23C14/30C23C14/546C23C14/547
Inventor 林兆文
Owner 上海米蜂激光科技有限公司