A kind of composite nano multi-layer film and its preparation method and medical surgical knife
A nano-multi-layer and thin-film technology, which is applied in coatings, metal material coating processes, vacuum evaporation plating, etc., can solve problems such as limited use scenarios, achieve excellent surface hardness, and overcome technical bottlenecks
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Embodiment 1
[0023] A preparation method of a composite nano-multilayer film, comprising the following steps:
[0024] A. Using titanium alloy as the substrate, the titanium alloy is ground, polished, degreased and cleaned successively, and then dried for use; wherein, after grinding and polishing, the surface roughness of the substrate is guaranteed to be Ra=5-6μm, and the degreasing Use 15% NaOH aqueous solution, and the cleaning solution is absolute ethanol;
[0025] B. Put the dried substrate into a magnetron sputtering coating machine for glow discharge treatment;
[0026] C. Introduce nitrogen as the working gas, turn off the Zr target, turn on the Ti target, and sputter a TiN film on the substrate surface, where the sputtering power is 200W, the sputtering temperature is 120°C, the nitrogen flow rate is 400 sccm, and the thickness of the TiN film is 5nm;
[0027] D. Close the Ti target, open the Zr target, and sputter a ZrN film on the surface of the TiN film, wherein the sputteri...
Embodiment 2
[0031] A preparation method of a composite nano-multilayer film, comprising the following steps:
[0032] A. Using titanium alloy as the substrate, the titanium alloy is ground, polished, degreased and cleaned successively, and then dried for use; wherein, after grinding and polishing, the surface roughness of the substrate is guaranteed to be Ra=5-6μm, and the degreasing Use 15% NaOH aqueous solution, and the cleaning solution is absolute ethanol;
[0033] B. Put the dried substrate into a magnetron sputtering coating machine for glow discharge treatment;
[0034] C. Introduce nitrogen as the working gas, turn off the Zr target, turn on the Ti target, and sputter a TiN film on the substrate surface, where the sputtering power is 200W, the sputtering temperature is 120°C, the nitrogen flow rate is 400 sccm, and the thickness of the TiN film is 10nm;
[0035] D. Close the Ti target, open the Zr target, and sputter the ZrN film on the surface of the TiN film, wherein the sputt...
Embodiment 3
[0039] A preparation method of a composite nano-multilayer film, comprising the following steps:
[0040] A. Using titanium alloy as the substrate, the titanium alloy is ground, polished, degreased and cleaned successively, and then dried for use; wherein, after grinding and polishing, the surface roughness of the substrate is guaranteed to be Ra=5-6μm, and the degreasing Use 15% NaOH aqueous solution, and the cleaning solution is absolute ethanol;
[0041] B. Put the dried substrate into a magnetron sputtering coating machine for glow discharge treatment;
[0042] C. Introduce nitrogen as the working gas, turn off the Zr target, turn on the Ti target, and sputter a TiN film on the substrate surface, where the sputtering power is 200W, the sputtering temperature is 120°C, the nitrogen flow rate is 400 sccm, and the thickness of the TiN film is 15nm;
[0043] D. Close the Ti target, open the Zr target, and sputter the ZrN film on the surface of the TiN film, wherein the sputt...
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Abstract
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