Manufacturing method of single-curved-surface silicon-based micro display
A technology of micro-display and manufacturing method, applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve problems such as poor sealing layer effect, achieve the effect of reducing weight and improving comfort
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Embodiment 1
[0034] like Figures 1 to 3 Shown, a kind of manufacturing method of single-curved silicon-based microdisplay, comprises the following steps:
[0035] Step 1, UV laser cutting, using a 355 nm UV laser 1 on the front side of the wafer 2 with a thickness of 400 microns to perform vertical and horizontal laser scribing and cutting, wherein the focal spot of the UV laser 1 is 20 microns, and the depth of the cutting line is 100 microns, followed by Soak in acetone, ethanol, and deionized water for 10 minutes each to clean the wafer 2;
[0036] Step 2, preparing an OLED display 7, depositing patterned anode pixel points 48, a hole functional layer 47, an organic light-emitting layer 46, an electronic functional layer 45, a transparent cathode layer 44, a sealing layer 43, and a color filter layer sequentially on the wafer 2 42 and a physical protection layer 41, and a plurality of flat OLED displays 7 are prepared on the front surface of the wafer 2. The sealing layer 43 is a mul...
Embodiment 2
[0045] like Figure 4 As shown, in this embodiment, the curved surface of the curved micro-display is concave in the horizontal direction, the light source is emitted from the stainless steel bracket toward the display, and other structures are the same as in the first embodiment.
Embodiment 3
[0047] like Figure 5 As shown, in this embodiment, the curved surface of the curved microdisplay is convex in the vertical direction, and the light source is emitted from the stainless steel bracket toward the display, and other structures are the same as in Embodiment 1.
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