Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device and method for measuring thickness distribution of gas condensation film in moderator component

A technology of gas condensation and film thickness, which is applied in the direction of measuring devices, optical devices, and phase-influenced characteristic measurements. It can solve the problems of short working distance of the microscope, low measurement efficiency, and long-term measurement, so as to save space in the vacuum chamber, Effects of improving measurement efficiency and improving measurement accuracy

Active Publication Date: 2021-10-22
ZHEJIANG UNIV
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the working distance of the microscope, the core component of the measurement optical system, is relatively short, and the lens needs to be close to the film to be measured, which is difficult to achieve in vacuum and low temperature chambers due to structural reasons.
In addition, due to the small field of view of the microscope, to achieve 50mm area distribution measurement, it takes a long time to measure, the measurement efficiency is extremely low, and the stitching process of different fields of view will also introduce stitching errors

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device and method for measuring thickness distribution of gas condensation film in moderator component
  • Device and method for measuring thickness distribution of gas condensation film in moderator component
  • Device and method for measuring thickness distribution of gas condensation film in moderator component

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be noted that the following embodiments are intended to facilitate the understanding of the present invention, but do not limit it in any way.

[0043] Such as figure 1 As shown, a device for measuring the thickness distribution of the gas condensation film in the moderator component includes an interferometric module and a five-dimensional freedom control module.

[0044] In the interferometric module, the light beam emitted by the frequency-stabilized linearly polarized laser 1 is reflected by the mirror 2, and the polarization state is adjusted by the half-wave plate 3. The forward propagation is divided into two paths by the polarizing beam splitter prism 5: one path of transmitted parallel polarized light continues to propagate forward, passes through the quarter-wave plate 6, is reflected by the reference plane mirror 7, and return...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a device and method for measuring the thickness distribution of a gas condensation film in a moderator component. The method includes: (1) before the film is condensed, a mobile control module images the surface of a substrate onto a detector; (2) collects an interferogram and uses a mobile Phase algorithm to obtain the overall substrate phase distribution and system error distribution; (3) After the condensation film is formed, the mobile control module aligns the detector imaging position with the highest position surface of the film; (4) Use the phase shift algorithm to obtain the interferogram to calculate the corresponding Phase information, and further obtain the phase distribution of the condensed film region including the influence of multi-beam interference; (5) use modeling technology to calculate the correction function relationship between the film multi-beam interference phase and the theoretical phase of the measurement light passing through the film without multi-beam interference, and Further calculate and correct the measured phase; (6) Calculate and obtain the film thickness distribution. The invention can realize the non-contact, rapid and high-precision measurement of the thickness of the gas condensation film of the moderator component.

Description

technical field [0001] The invention belongs to the technical field of optical precision measurement, and in particular relates to a device and method for measuring the thickness distribution of a gas condensation film of a moderator component. Background technique [0002] Muon science has come a long way since their discovery in 1936 during observations of cosmic rays. In recent years, low-energy muons (LE-u + ) has opened up a new field of muon basic and applied discipline research. For example, by using LE -u + As a microprobe, the local magnetic field in thin films, multilayer structures or surfaces can be studied, and by changing its energy, different depths can be probed. [0003] In generating LE-u + Among the various methods, the most effective, simple and effective method is to moderate the high-energy muon beam. After the high-energy muon beam generated by the neutron source passes through the moderator component composed of cold substrate foil and van der Wa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/06G01N21/45
CPCG01B11/0675G01N21/45
Inventor 刘东臧仲明彭韶婧徐兆锐陈楠刘崇
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products