Vacuum drying device
A vacuum drying device and drying treatment technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of different gas flow rates and directions, improve luminous efficiency and service life, improve yield, and display defects and flatness keep consistent effect
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[0025] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments that the present application can be used to implement. The directional terms mentioned in this application, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the application, but not to limit the application. In the figures, structurally similar elements are denoted by the same reference numerals.
[0026] The present application will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0027] The embodiment of the present application provides a vacuum drying device, the vacuum drying device is used to dry the display substrate, combined with figure 2 Describe in detail. Such as figure 2 as shown, figure 2 Schema...
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