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Manufacturing method for nano material film and display panel

A technology of material film and production method, applied in the direction of nanotechnology, nanotechnology, nano-optics, etc., can solve the problems of limited application in the field of display technology, restricted patterning of nanomaterials, etc., and achieve an effect that is conducive to industrial application

Inactive Publication Date: 2021-06-01
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a method for manufacturing a nanomaterial thin film and a display panel, which are used to solve the problem that the patterning of nanomaterials (such as quantum dots) is restricted by the manufacturing process and its application in the field of display technology is limited

Method used

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  • Manufacturing method for nano material film and display panel
  • Manufacturing method for nano material film and display panel
  • Manufacturing method for nano material film and display panel

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Experimental program
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Embodiment 1

[0049] see Figure 1 to Figure 7 , in this embodiment, the first electrode 102 and the second electrode 103 may be formed on the same substrate 101, or the second electrode 103 is formed on the substrate 101 and the first electrode 102 for external electrodes.

[0050] When the first electrode 102 and the second electrode 103 are formed on the substrate 101, two nanomaterial layers can be deposited on the substrate 101; when the second electrode 103 is formed on the substrate When the first electrode 102 is an external electrode on the bottom 101 , a nanomaterial layer can be patterned and deposited on the substrate 101 . The specific manner of forming the first electrode 102 and the second electrode 103 is determined by the type of the nanomaterial thin film to be formed.

[0051] When the first electrode 102 and the second electrode 103 are formed on the substrate 101, step S100, providing the first electrode 102 and the second electrode 103 insulated from each other may s...

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Abstract

The invention provides a manufacturing method for a nano material film and a display panel. The manufacturing method for the nano material film comprises the following steps that a first electrode and a second electrode which are insulated from each other are provided; a first solution is provided, wherein the first solution comprises a first nano material with a first electrical property; and a power supply is provided, wherein two electrodes of the power supply are electrically connected with the first electrode and the second electrode respectively so as to make the first electrode have the first electrical property and the second electrode have a second electrical property, so that a first nano material layer is formed on the second electrode. According to the manufacturing method for the nano material film, an electric field generated by the first electrode and the second electrode is used for driving a nano material with charges to move and be gathered in the electric field so as to obtain the uniformly deposited patterned nano material film, so that large-scale production of the patterned nano material film is achieved, and industrial application of the nano material film is facilitated.

Description

technical field [0001] The invention relates to the display field, in particular to a method for manufacturing a nanomaterial film and a display panel. Background technique [0002] Nano-luminescent materials, such as quantum dots, have the characteristics of small size, high energy conversion efficiency, high brightness, narrow emission, adjustable luminescent color, and good stability. They are the most potential materials for display technology in recent years. [0003] During the research and practice of the prior art, the inventors of the present application found that the patterning of nanomaterials (such as quantum dots) mainly adopts inkjet printing or photolithography process, and inkjet printing has too high requirements for ink, which is currently difficult Realize mature and stable mass production with poor repeatability, while the photolithography process involves steps such as heating, ultraviolet curing, and developer rinsing, which affect the stability of qua...

Claims

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Application Information

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IPC IPC(8): C25D5/02C25D9/04C25D9/02H01L51/56H01L51/50H01L27/32G09F9/30G09F9/33B82Y30/00B82Y40/00B82Y20/00
CPCC25D5/02C25D9/04C25D9/02G09F9/30G09F9/33B82Y30/00B82Y40/00B82Y20/00H10K59/10H10K71/125H10K50/115H10K71/00
Inventor 赵金阳
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD