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Standard cell delay model construction method based on logarithm expansion partial normal distribution

A standard unit and distribution model technology, applied in complex mathematical operations, electrical digital data processing, special data processing applications, etc., can solve problems such as smearing, aggravated influence of process fluctuation unit delay, large errors, etc., to improve the coefficient Effect of value precision, good shape and position, high model precision

Pending Publication Date: 2021-06-04
SOUTHEAST UNIV
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Problems solved by technology

[0004] However, under the working condition of near-threshold low voltage, the impact of process fluctuations on cell delay is intensified, and the distribution of cell delay appears asymmetric and tailing, showing non-Gaussian distribution characteristics
The mean and standard deviation determine the size and range of the statistical distribution, and cannot change the symmetry and tailing of the distribution
Therefore, using a Gaussian model to fit the delay distribution of a standard cell under near-threshold low-voltage operating conditions will bring large errors, which cannot meet the design requirements

Method used

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  • Standard cell delay model construction method based on logarithm expansion partial normal distribution
  • Standard cell delay model construction method based on logarithm expansion partial normal distribution
  • Standard cell delay model construction method based on logarithm expansion partial normal distribution

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Embodiment Construction

[0024] The invention proposes a standard unit time-delay model construction method based on the logarithm expansion partial normal distribution. Such as figure 1 As shown, firstly, a number of operating conditions are randomly set in a specific range, the operating conditions include operating voltage, temperature, input conversion time, output load, and then Monte Carlo simulation is performed on the standard unit under specific operating conditions to obtain the current Standard unit delay distribution data under working conditions; the standard unit delay data under specific working conditions are fitted by the logarithmically extended partial normal distribution model, and the four coefficient values ​​of the logarithmically extended partial normal distribution model are obtained, so , under each set of working conditions, corresponds to a set of coefficient values; with each set of working conditions as independent variables and four coefficient values ​​as dependent vari...

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Abstract

The invention discloses and protects a standard cell delay model construction method based on logarithmic expansion partial normal distribution, and the method comprises the steps: setting a plurality of working condition scenes for each standard cell, taking the cell delay distribution data about process fluctuation obtained through SPICE simulation as training data under different working conditions, and fitting the logarithm expansion partial normal distribution model by using a maximum likelihood estimation method to obtain a model coefficient; regarding the logarithm expansion partial normal distribution model coefficient as a parameter related to a working condition, establishing a quadratic model, fitting a multivariate function of the logarithm expansion partial normal distribution model coefficient about the working condition through a nonlinear regression method, and finally achieving the standard unit delay model based on logarithm expansion partial normal distribution.

Description

technical field [0001] The invention belongs to the field of integrated circuit design automation (EDA), in particular to a method for constructing a standard unit delay model based on logarithmically extended partial normal distribution. Background technique [0002] Timing analysis is a very important link in the design of large-scale integrated circuits. It can verify the correctness of the design in timing and determine whether the design can run at the required operating frequency, thereby ensuring the function and stability of the chip. As the integrated circuit manufacturing process enters the deep sub-micron era, at TSMC16nm or more advanced process nodes, the standard cell delay becomes more sensitive to changes in process fluctuation parameters. Due to the influence of various uncertain factors such as the accuracy of the equipment itself, the manufacturing environment, and human error, the actual manufactured chip parameters and the theoretically designed chip par...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/3312G06F30/367G06F17/18
CPCG06F30/3312G06F30/367G06F17/18
Inventor 闫浩陈前付文杰时霄宋慧滨
Owner SOUTHEAST UNIV
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