A gas quantitative and proportional dilution device based on capillary structure

Abstract

The invention discloses a gas quantitative and proportional dilution device based on a capillary structure. The dilution device includes a first air pipe, a second air pipe, an air outlet pipe, a split flow dilution assembly, a return pipe, and a recovery pump. The first air pipe and the second air pipe are respectively connected The container where the two gases to be mixed is located, the first gas pipe and the second gas pipe merge into the split flow dilution component, the split flow dilution component is also connected to the gas outlet pipe and the return pipe, the split flow dilution component divides the mixed gas in a fixed ratio and then discharges it to the gas outlet pipe respectively And the return pipe, and the concentration meter is set on the outlet pipe. The diversion dilution assembly includes a housing, an air inlet chamber, an air outlet chamber, and a shunt tube. The housing is provided with a closed air inlet chamber and an air outlet chamber. The middle of the housing is used as the shell side. The shunt tube passes through the shell side and is connected to the inlet chamber at both ends. 1. The air outlet chamber, the air inlet chamber is connected to the first air pipe and the second air pipe, the air outlet chamber is connected to the air outlet pipe, and the return pipe is connected to the side wall of the shell; the shunt pipe includes a cotton tube layer, and the cotton tube layer is soaked with a non-polar solvent.

Description

technical field [0001] The invention relates to the technical field of electronic gas processing, in particular to a gas quantitative and proportional dilution device based on a capillary structure. Background technique [0002] Electronic gas refers to the special gas used in the semiconductor industry, which is the food and blood of the electronics industry. Common electronic gases include WF6, DCS, BCl3, C5F8, ClF3, etc. When the special gas is output, it often needs to be diluted, and the commonly used dilution gases include nitrogen, argon, etc. [0003] Traditional dilution starts with changing the flow ratio, which involves the adjustment of the valve opening on the flow path. Therefore, the sensitivity of the gas mixture ratio has always been a problem. A slight adjustment of the valve opening will also affect the flow characteristics of the gas flowing there. Therefore, it is difficult to further reduce the error of the flow rate, resulting in the problem that the ...

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Problems solved by technology

[0003] Traditional dilution starts with changing the flow ratio, which involves the adjustment of the valve opening on the flow path. Therefore, the sensitivity of the gas mixture ratio has always been a problem. A slight adjustment of the valve opening will also affect the flow characteristics of the gas flowing there. Therefore, it is difficult to further reduce the error of the flow rate, resulting in the problem that the dilution ratio cannot be further improved;

[0004] In addition, almost all dilutions are to increase the amount of diluent gas, thereby reducing the concentration of functional gas. There is a large waste in the use of diluent gas. A set of special gas cylinders is often equipped with more than the theoretical ratio. Dilution gas, because it is considered for the margin during adjustment, which causes waste in use and increases the occupancy of gas cylinders

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