Pen lithography system and preparation method based on optical fiber end metalens

Abstract

The invention discloses a pen photolithography system and a preparation method based on an optical fiber end hyperlens, and belongs to the technical field of preparation of optical micro-nano structures. The invention prepares a superlens on the end face of a single-mode optical fiber by means of a two-photon laser direct writing technology, and combines the prepared superlens with other optical devices to build a pen photolithography system. Because the metalens can solve the problems of poor flexibility, limited size, and low efficiency in the existing lens technology, and can realize complete control over the phase, amplitude, and polarization of the beam, it overcomes the traditional pen lithography system that is bulky, expensive, and Problems such as low efficiency and difficulty in integration; this system can prepare micro-nano devices with high precision under any substrate material and preparation environment by combining fiber-end metalens, saving preparation cost and time.

Description

technical field [0001] The invention belongs to the technical field of optical micro-nano systems, and in particular relates to a pen photolithography system and a preparation method based on a fiber-end super-lens. Background technique [0002] As an important optical device, lenses are widely used in optical instruments. However, traditional lenses have many problems such as large volume and difficulty in integration, and the size, collective shape and manufacturing materials of lenses are also limited. As an improvement of traditional lenses, metalens has been gradually developed and perfected. High-quality metalens prepared by using two-photon polymerization lithography have the characteristics of high numerical aperture, miniaturization, and packaging, and can realize the control of beam intensity, phase, and polarization. fully control. Therefore, metalenses can be integrated with optical fibers as sub-wavelength optical devices and applied in micro-nano imaging syste...

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the difficult problems of the pen lithography system in the prior art, such as difficulty in integrating light beams and complex system environment, the present invention provides a pen lithography system and a preparation method based on a fiber-end metalens. Direct writing technology to prepare metalens, and combine the prepared metalens with other optical devices to build a pen lithography system

Because the metalens can solve the problems of poor flexibility, limited size, and low efficiency in the existing lens technology, and can realize complete control over the phase, amplitude, and polarization of the beam, it overcomes the traditional pen lithography system that is bulky, expensive, and Problems such as low efficiency and difficulty in integration

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