Preparation method of titanium-chromium alloy sputtering target material for magnetic recording

A technology for sputtering target material and magnetic recording, which is applied in sputtering plating, metal material coating process, ion implantation plating, etc. The composition is uniform, the grain size is small, and the effect of ensuring product purity

Pending Publication Date: 2021-07-09
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The preparation method also adopts vacuum smelting casting method and hot isostatic pressing method, which is complex and easy to waste raw materials, which is not conducive to industrial production

Method used

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  • Preparation method of titanium-chromium alloy sputtering target material for magnetic recording

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] This embodiment provides a method for preparing a titanium-chromium alloy sputtering target for magnetic recording, the preparation method comprising:

[0035] Chromium powder and titanium powder are mixed in a V-type powder mixer under an argon atmosphere, the content of titanium powder in the mixed powder is 95at%, the rotating speed of the V-type powder mixer is 5rpm, and the mixing time is 32h, the pressure of the protective gas was 0.02MPa, and the mixed powder was obtained; the mixed powder was put into a stainless steel sheath, and degassed at 300°C for 8h, and the vacuum degree in the mold after the degassing was 3.0×10 -3 Pa, after degassing, perform hot isostatic pressing at 600° C. and 90 MPa for 6 hours to obtain the titanium-chromium alloy sputtering target. The titanium-chromium alloy sputtering target is machined, detected, cleaned and packaged to obtain a product.

Embodiment 2

[0037]Chromium powder and titanium powder are mixed in V-type powder mixer under argon atmosphere, the content of titanium powder in the mixed powder is 13at%, the rotating speed of described V-type powder mixer is 15rpm, and the time of described mixing is 18h, the pressure of the protective gas was 0.06MPa, and the mixed powder was obtained; the mixed powder was put into a stainless steel sheath, and degassed at 600°C for 4h, and the vacuum degree in the mold after the degassing was 1.0×10 -3 Pa, after degassing, perform hot isostatic pressing at 1200° C. and 170 MPa for 3 hours to obtain the titanium-chromium alloy sputtering target. The titanium-chromium alloy sputtering target is machined, detected, cleaned and packaged to obtain a product.

Embodiment 3

[0039] Chromium powder and titanium powder are mixed in V-type powder mixer under argon atmosphere, the content of titanium powder in the mixed powder is 50at%, the rotating speed of described V-type powder mixer is 8rpm, and the time of described mixing is 24h, the pressure of the protective gas was 0.05MPa, and mixed powder was obtained; the mixed powder was put into a stainless steel sheath, and degassed at 500°C for 5h, and the vacuum degree in the mold after the degassing was 2.0×10 -3 Pa, after degassing, perform hot isostatic pressing at 1000° C. and 100 MPa for 5 hours to obtain the titanium-chromium alloy sputtering target. The titanium-chromium alloy sputtering target is machined, detected, cleaned and packaged to obtain a product.

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Abstract

The invention provides a preparation method of a titanium-chromium alloy sputtering target material for magnetic recording. The preparation method comprises the following steps: mixing chromium powder and titanium powder under protective gas to obtain mixed powder; and putting the mixed powder into a mold to be subjected to degassing treatment, carrying out hot isostatic pressing treatment after degassing, and obtaining the titanium-chromium alloy sputtering target material. The chromium-titanium target material prepared through the preparation method is an alloy target material with the density of 99% or above, small grain size, uniform components and excellent machining performance, and the process can effectively ensure that the product is not subjected to external oxidation and ensure the purity of the product.

Description

technical field [0001] The invention belongs to the field of target material preparation, and relates to a method for preparing a sputtering target material, in particular to a method for preparing a titanium-chromium alloy sputtering target material for magnetic recording. Background technique [0002] Chromium-titanium alloy sputtering targets can generally be made by hot pressing or vacuum melting and casting; the density of chromium-titanium alloy targets sintered by hot pressing is generally low, and the oxygen content is high; when the density is increased to When it is more than 99%, the sintering temperature and pressure of the product must be increased, but the product is prone to brittle hard phases, making the product very high in hardness, difficult to process, and low in product production efficiency; although the chromium-titanium alloy prepared by the vacuum melting and casting method can solve the problem of oxygen content and improve machinability, but the d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22C14/00C22C27/06
CPCC23C14/3414C23C14/3407C22C14/00C22C27/06
Inventor 姚力军潘杰王学泽曹欢欢
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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