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Mask defect detection method and system based on AOI system

A technology of defect detection and reticle, which is applied in the photolithographic process of patterned surface, originals for photomechanical processing, semiconductor/solid-state device testing/measurement, etc., which can solve product rework, repair time and process difficulty increase, Affect the correct judgment of product defects and other issues, to achieve the effect of improving manufacturing accuracy and product quality, simple and reliable implementation methods, and shortening the product manufacturing cycle

Pending Publication Date: 2021-07-20
成都路维光电有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The manufacturing process of the mask plate includes gluing of the mask substrate (Mask Blank), photolithography, chemical process (developing, etching), defect scanning and repairing, etc., in which AOI (Automated Optical Inspection) is used to scan the defect all the time It is the difficulty of defect control in the mask plate manufacturing process. There will be a large number of false defects in the conventional AOI scanning process (false defects: real defects that do not exist in the product itself), and the existence of false defects will seriously affect the correct judgment of product defects
Therefore, the existence of a large number of false defects will double the time for manual review, and may cause missed detection of true product defects, resulting in missed repairs of subsequent true defects, increased repair time and process difficulty, and even product repairs and scrapping , customer complaints and other serious consequences

Method used

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  • Mask defect detection method and system based on AOI system
  • Mask defect detection method and system based on AOI system
  • Mask defect detection method and system based on AOI system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] Such as figure 1 As shown, this embodiment provides a false defect detection method for AOI horizontal lines on a reticle based on the present invention, such as figure 1 shown, including the following steps:

[0058] S1. Scan the Mask substrate to be detected to obtain the scanning pattern of the Mask substrate;

[0059] S2. Based on the mask substrate scanning pattern and the mask substrate standard image, perform preliminary defect marking on the mask substrate scanning pattern to obtain preliminary defect point information;

[0060] S3. Perform a re-inspection (Review) for each preliminary defect point according to the preliminary defect point information;

[0061] S4. If the total number of AOI false defects is determined to be within the normal range (DEF Total≤300) according to the re-inspection results, execute S5; if the number of AOI horizontal line false defects exceeds the standard (DEF Total>300), execute S1;

[0062] S5. Complete re-inspection of all d...

Embodiment 2

[0068] Such as image 3 As shown, this embodiment provides a method for detecting false defects on the AOI edge of the reticle based on the present invention, including the following steps:

[0069] S1. Scan the Mask substrate to be detected to obtain the scanning pattern of the Mask substrate;

[0070] S2. Based on the mask substrate scanning pattern and the mask substrate standard image, perform preliminary defect marking on the mask substrate scanning pattern to obtain preliminary defect point information;

[0071] S3. Perform a re-inspection (Review) for each preliminary defect point according to the preliminary defect point information;

[0072] S4. If the total number of AOI false defects is determined to be within the normal range (DEF Total≤300) according to the re-inspection results, then execute S5; if the number of AOI edge false defects exceeds the standard (DEF Total>300), then return to S1 ;

[0073] S5. Complete re-inspection of all defect points, and record ...

Embodiment 3

[0078] Such as Figure 5 As shown, this embodiment provides a method for detecting false defects at the corners of AOI reticle based on the present invention, including the following steps:

[0079] S1. Scan the Mask substrate to be detected to obtain the scanning pattern of the Mask substrate;

[0080] S2. Based on the mask substrate scanning pattern and the mask substrate standard image, perform preliminary defect marking on the mask substrate scanning pattern to obtain preliminary defect point information;

[0081] S3. Perform a re-inspection (Review) for each preliminary defect point according to the preliminary defect point information;

[0082] S4. If the total number of AOI false defects is determined to be within the normal range (DEF Total≤300) according to the re-inspection results, then execute S5; if the number of AOI corner false defects exceeds the standard (DEF Total>300), then return to S1 ;

[0083] S5. Complete re-inspection of all defect points, and recor...

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Abstract

The invention discloses a mask defect detection method and system based on an AOI system, and the method comprises the steps: firstly scanning a to-be-detected Mask substrate to obtain a Mask substrate scanning pattern, and carrying out the preliminary defect marking of the Mask substrate scanning pattern, and obtaining the preliminary defect point information; rechecking each preliminary defect point location according to the preliminary defect point location information, screening out standard-exceeding false defect point locations, judging whether the number of the false defect point locations exceeds the standard or not, and if yes, screening out the false defect point locations according to the types of the false defect point locations; and finally, retaining and recording defect point location information. According to the method, the reasons for generating the AOI false defects of the mask are comprehensively analyzed in multiple aspects of the mask feeding position, the key process parameters, the equipment state and the like of the Mask substrate, practical and effective improvement countermeasures are provided for the three types of false defects respectively, the overall implementation method is simple and reliable, and large economic benefits can be created.

Description

technical field [0001] The invention relates to the technical field of mask plate defect detection, in particular to a mask plate defect detection method and system based on an AOI system. Background technique [0002] Photo mask, also known as photomask, mask, etc., is a graphic master used in photolithography in microelectronics manufacturing. A mask pattern is formed on a transparent substrate by an opaque light-shielding film, and the pattern is exposed through exposure. Transfer to the product substrate. The mask plate is the graphic "negative" in the semiconductor and panel manufacturing process, which is used to transfer high-precision circuit design and carries intellectual property information such as graphic design and process technology. The manufacturing process of the mask plate includes gluing of the mask substrate (Mask Blank), photolithography, chemical process (developing, etching), defect scanning and repairing, etc., in which AOI (Automated Optical Inspec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/72G03F1/84H01L21/66
CPCG03F1/72G03F1/84H01L22/24
Inventor 林超林伟王伟轶古朋远
Owner 成都路维光电有限公司