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Positioning system, positioning method and interferometer verification method

A positioning system and interferometer technology, applied in the field of positioning systems, can solve the problems of deviation between key dimensions and the theoretical value of vertical control, and achieve the effects of improving vertical control performance, improving yield, and improving exposure and imaging effects.

Active Publication Date: 2021-08-27
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a positioning system, a positioning method and an interferometer verification method to solve the problem of deviation between the critical dimension after exposure and development and the vertical control theoretical value in the actual application of the lithography machine

Method used

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  • Positioning system, positioning method and interferometer verification method
  • Positioning system, positioning method and interferometer verification method
  • Positioning system, positioning method and interferometer verification method

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Embodiment Construction

[0057] The positioning system, positioning method and interferometer verification method proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. The advantages and features of the present invention will become clearer from the following description. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention. In addition, the structures shown in the drawings are often a part of the actual structures. In particular, each drawing needs to display different emphases, and sometimes uses different scales.

[0058] see figure 1 , the present embodiment provides a positioning system, and the positioning system includes: an illumination unit 10 , a shading member 20 , a reflective member 30 , a first detector 40 and a focusing and levelin...

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Abstract

The invention provides a positioning system, a positioning method and a verification method of an interferometer. The positioning system comprises a lighting unit, a shading part, a reflecting part, a first detector and a focusing and leveling unit. A light beam provided by the illumination unit is shielded by the light shielding piece, a dark spot is formed on the image plane of the objective lens, the center of the dark spot is located on the central optical axis of the objective lens, and the first detector detects horizontal direction coordinates of the center of the dark spot to serve as first position coordinates. The projection part of the focusing and leveling unit emits a plurality of light spots, the light spots are projected on the light reflecting part and are reflected by the light reflecting part to form reflected light spots, the second detector receives the reflected light spots and obtains the coordinates of each light spot as second position coordinates, and therefore, the focusing and leveling unit is positioned. Therefore, the problem that a deviation exists between the critical size of the photoetching machine after exposure and development and the vertical control theoretical value is solved, the vertical control performance of the photoetching machine is improved, the exposure imaging effect of the photoetching machine in the previous stage is improved, and the yield of products is improved.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a positioning system, a positioning method and an interferometer verification method. Background technique [0002] A photolithography machine is a kind of equipment used in the manufacture of integrated circuits. The use of this equipment includes but is not limited to: photolithography equipment for integrated circuit manufacturing, liquid crystal panel photolithography equipment, photomask marking equipment, MEMS (micro-electromechanical systems) / MOMS (micro-optical machine system) lithography equipment, advanced packaging lithography equipment, printed circuit board lithography equipment and printed circuit board processing equipment, etc. A projection lithography machine is a device that projects the pattern on the mask onto the upper surface of the silicon wafer through the objective lens. In the projection exposure equipment, there is a focusing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/702G03F7/70141G03F9/7007G03F9/7003
Inventor 张建新高彩霞杨志勇
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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