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Titanium target grain refining method and titanium target

A technology of grain refinement and titanium target, applied in the field of target grain refinement, titanium target, titanium target grain refinement Particles and other problems can be improved to improve processing efficiency, avoid waste of resources, improve sputtering performance and sputtering environment

Pending Publication Date: 2021-10-08
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the invention also has the problem that it cannot be used for grain refinement of titanium targets, and its scope of application is relatively limited.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] This embodiment provides a method for grain refinement of a titanium target, the method comprising the following steps:

[0037] (1) In a resistance heating furnace at 450°C, preheat a titanium target with a grain size of 25 μm for a holding time of 15 minutes;

[0038] (2) Perform three-way forging on the titanium target material obtained in step (1); the three-way forging includes 3 processing cycles, and each processing cycle includes the first pass, the second pass and the third pass in sequence ; The first pass is specifically to thicken the titanium target along the X-axis direction until the deformation is 50%, and then draw it to the original size; the second pass is to make the titanium target along the Y-axis Thickening in the direction until the deformation amount is 50%, and then drawing to the original size; the third pass is specifically to thicken the titanium target along the Z-axis direction until the deformation amount is 50%, and then drawing to the o...

Embodiment 2

[0042] This embodiment provides a method for grain refinement of a titanium target, the method comprising the following steps:

[0043] (1) In a resistance heating furnace at 425°C, a titanium target with a grain size of 22 μm is preheated for a holding time of 18 minutes;

[0044] (2) Perform three-way forging on the titanium target material obtained in step (1); the three-way forging includes 3 processing cycles, and each processing cycle includes the first pass, the second pass and the third pass in sequence ; The first pass is specifically to thicken the titanium target along the X-axis direction until the deformation is 45%, and then draw it to the original size; the second pass is to make the titanium target along the Y-axis Thickening in the direction until the deformation amount is 45%, and then drawing to the original size; the third pass is specifically to thicken the titanium target along the Z-axis direction until the deformation amount is 45%, and then drawing to th...

Embodiment 3

[0048] This embodiment provides a method for grain refinement of a titanium target, the method comprising the following steps:

[0049] (1) Preheat the titanium target with a grain size of 28 μm in a resistance heating furnace at 475°C for a holding time of 10 minutes;

[0050] (2) Perform three-way forging on the titanium target material obtained in step (1); the three-way forging includes 4 processing cycles, and each processing cycle includes the first pass, the second pass and the third pass in sequence ; The first pass is specifically to thicken the titanium target along the X-axis direction until the deformation is 55%, and then draw it to the original size; the second pass is to make the titanium target along the Y-axis Thickening in the direction until the deformation amount is 55%, and then drawing to the original size; the third pass is specifically to thicken the titanium target along the Z-axis direction until the deformation amount is 55%, and then drawing to the ...

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Abstract

The invention provides a titanium target grain refining method and a titanium target. The method comprises the following steps that (1) the titanium target is preheated at the temperature of 400-500 DEG C; (2) three-way forging is conducted on the titanium target obtained in the step (1); and (3) the titanium target obtained in the step (2) is cooled, and the titanium target with the grain size being 10-20 microns is obtained. The provided method is specially used for grain refinement of the titanium target, the sputtering performance and the sputtering environment of the titanium target are improved, the coating quality is improved, meanwhile, the technological process is simplified, and the machining cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of target material manufacturing, and relates to a method for refining target grains, in particular to a method for refining titanium target grains and the titanium target. Background technique [0002] Magnetron sputtering technology is one of the key technologies for preparing thin film materials. High-purity titanium sputtering targets are key consumables in the magnetron sputtering process and have broad market application prospects. As a high value-added coating material, titanium target has strict requirements in terms of chemical purity, microstructure and performance. Among them, the grain size not only affects the sputtering rate, but also affects the coating quality. [0003] CN 109338314A discloses a method for processing an ultrafine-grained copper-manganese alloy target. The method mainly includes the following steps: (1) performing high-temperature forging on the copper-manganese alloy ingot; ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B21J5/00
CPCC23C14/3407C23C14/3414B21J5/00
Inventor 姚力军边逸军潘杰王学泽周敏
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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