Gas flow control system and method in plasma reaction chamber based on internet of things

Abstract

The invention relates to a gas flow control system and method in a plasma reaction chamber based on the Internet of Things. The control system includes a flow guide tube, a gas supply nozzle, a jet pump, a magnetic field control device, a throttle valve, a magnetic field sensor, and a driving circuit based on the Internet of Things. The rear end surface of the gas supply nozzle communicates with the throttle valve through the guide tube, the throttle valve communicates with the jet pump through the guide tube, the magnetic field control device is covered outside the gas supply nozzle, and the magnetic field sensor is embedded in the side wall of the gas supply nozzle. Its control method includes two steps of equipment assembly and supply flow regulation. The invention has good versatility and a high degree of automatic operation, and can effectively meet the needs of a variety of gases and the supporting operation of the reaction chamber. At the same time, it has the ability to accurately control the flow rate, concentration, and pressure of the transported airflow, and effectively reduces system operation and maintenance. The difficulty and cost of the system reduce the failure rate of the system operation.

Description

technical field [0001] The invention relates to a gas flow control system and method in a plasma reaction chamber based on the Internet of Things, and belongs to the technical field of chemical equipment and sensors. Background technique [0002] At present, when the plasma gas medium is introduced into the reaction chamber, in order to improve the working efficiency and control accuracy of the reactant reaction in the reactor, it is necessary to precisely adjust the delivery flow rate of the high-temperature plasma gaseous medium. In order to meet this demand, the current Mainly by installing various detection sensors and control valves on the delivery pipeline of high-temperature plasma gaseous medium to monitor and adjust the delivery volume of high-temperature plasma gaseous medium. Poor performance, which can only meet the needs of specific equipment operation; on the other hand, the control accuracy is poor to varying degrees, and in operation, due to the large number ...

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Problems solved by technology

[0002] At present, when the plasma gas medium is introduced into the reaction chamber, in order to improve the working efficiency and control accuracy of the reactant reaction in the reactor, it is necessary to precisely adjust the delivery flow rate of the high-temperature plasma gaseous medium. In order to meet this demand, the current Mainly by installing various detection sensors and control valves on the delivery pipeline of high-temperature plasma gaseous medium to monitor and adjust the delivery volume of high-temperature plasma gaseous medium. Poor performance, which can only meet the needs of specific equipment operation; on the other hand, the control accuracy is poor to varying degrees, and in operation, due to the large number of valves, the system control and maintenance operations are difficult, costly, and control accuracy is relatively poor In addition, valves are also prone to failure due to high-temperature and high-pressure gas medium erosion, which seriously affects the stability of system operation and further increases the labor intensity and cost of system maintenance.

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