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Optical phased array based on lithium niobate film material phase shift control and preparation method

An optical phased array and phase-shift control technology, which is applied in optics, nonlinear optics, instruments, etc., can solve the problems affecting the performance of optical phased array, high waveguide loss, and high power consumption of phase shifting, so as to increase the transmitted optical power And the effect of scanning speed, low optical transmission loss, high modulation speed

Pending Publication Date: 2021-11-19
UNITED MICROELECTRONICS CENT CO LTD
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, as mentioned above, the thermo-optical phase modulation and carrier injection phase modulation of silicon have the disadvantages of high phase shift power consumption, low speed and high waveguide loss respectively, which will greatly affect the performance of optical phased arrays, and further affect the ranging system

Method used

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  • Optical phased array based on lithium niobate film material phase shift control and preparation method
  • Optical phased array based on lithium niobate film material phase shift control and preparation method
  • Optical phased array based on lithium niobate film material phase shift control and preparation method

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Embodiment Construction

[0037] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0038] For example, when describing the embodiments of the present invention in detail, for the convenience of explanation, the cross-sectional view showing the device structure will not be partially enlarged according to the general scale, and the schematic diagram is only an example, which should not limit the protection scope of the present invention. In addition, the three-dimensional space dimensions of length, width and depth sho...

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Abstract

The invention provides an optical phased array based on lithium niobate film material phase shift control and a preparation method. The optical phased array comprises a silicon substrate, a silicon oxide layer on the silicon substrate, a silicon-based optical waveguide layer located on the silicon oxide layer and comprising a coupling beam splitter and a grating antenna with a gap zone between the two, a silicon oxide cladding filled around the silicon-based optical waveguide layer and in the gap zone, and a lithium niobate phase shifter comprising a lithium niobate film located on the gap zone, a lithium niobate optical waveguide located on the lithium niobate film and connected with the coupling beam splitter and the grating antenna, and modulation electrodes located on the lithium niobate film on the two sides of the lithium niobate optical waveguide. A material with a high electro-optic coefficient and low loss, such as lithium niobate, is adopted to replace a thermal regulation resistor or a carrier injection phase modulation mode used in a traditional optical phased array, and optical phase modulation with low power consumption, high speed and low waveguide loss can be carried out in the optical phased array.

Description

technical field [0001] The invention belongs to the field of design and manufacture of silicon optical devices, and in particular relates to an optical phased array based on phase shift control of lithium niobate thin film materials, a preparation method and application. Background technique [0002] Since the development of silicon photonics technology, many breakthroughs and achievements have been made in optoelectronic devices such as light sources, modulators, waveguides, and detectors. Silicon-based materials have low cost and good ductility, and can be used to manufacture optical devices using mature silicon CMOS technology, which is convenient for integration with other existing components. [0003] Due to the lattice properties of silicon, the linear electro-optic effect of silicon is relatively weak, so that the light modulation in silicon mainly depends on the free carrier dispersion effect. However, due to the intrinsic absorption and nonlinear nature of free-car...

Claims

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Application Information

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IPC IPC(8): G02F1/29G02F1/03G02F1/035
CPCG02F1/292G02F1/0305G02F1/0316G02F1/035
Inventor 路侑锡金里刘其鑫冯俊波郭进蒋平杨米杰
Owner UNITED MICROELECTRONICS CENT CO LTD
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