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Laser etching packer liquid and laser etching method for texture forming of groove chamber of mold

A technology of packer fluid and laser engraving, which is applied in crafts and decorative arts for producing decorative surface effects, can solve problems affecting high-precision molding of textures, low precision of texture molding, and prone to errors, etc., and achieve laser shooting penetration Stable, shorten texture molding cycle, improve the effect of precision

Inactive Publication Date: 2021-12-21
苏州星泽激光科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are relatively large defects in the characteristics and dosage of the photosensitive adhesive.
[0005] In the actual application process, it is difficult to control the intensity of laser engraving with traditional photosensitive adhesives. After the breakdown of photosensitive adhesives, there are non-flat burning phenomena on the metal surface, which affects the high-precision molding of textures, especially when there is curvature and In the state of bending surface, errors are prone to occur, and there is no necessary relationship between the amount of photosensitive adhesive and laser
[0006] In addition, the breakdown layer requires high chemical stability, which can ensure the accuracy of texture formation during etching operations. However, traditional photosensitive adhesives are prone to instability during the etching process, which eventually leads to low texture formation accuracy.

Method used

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  • Laser etching packer liquid and laser etching method for texture forming of groove chamber of mold

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Embodiment Construction

[0033] The invention provides a radium engraving etching spacer fluid and a radium engraving etching method used for texture forming of a groove chamber of a mold. The technical solution of the present invention will be described in detail below in conjunction with the accompanying drawings, so as to make it easier to understand and grasp.

[0034] Radium engraving etching process, used for texture molding of mold cavity, such as figure 1 shown, including the following steps:

[0035] S1 surface treatment,

[0036] The tank chamber of the mold is cleaned, and then the surface of the tank chamber is smoothed by sandblasting.

[0037] The processed surface of the mold has oil, dust, etc., and its surface flatness also has certain defects. The present invention cleans the processed surface and supplements it with smoothing treatment. The sandblasting uses 600-800-mesh silicon carbide abrasive particles to meet the surface smoothness requirements for texture forming, and at the...

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Abstract

The invention provides a laser etching packer liquid and a laser etching method for texture forming of a groove chamber of a mold, and belongs to the technical field of laser etching. The method comprises the following steps: surface treatment, specifically, cleaning the groove chamber of the mold, and then carrying out smoothing processing on the machined surface in the groove chamber through a sand blasting process; surface covering with a packing layer, specifically, preparing a packer liquid, evenly covering the machined surface with the packer liquid, curing the packer liquid and then forming the packing layer; laser etching windowing, specifically, carrying out windowing on the sealing layer according to the formed texture, and exposing a metal body of the windowed part; and chemical corrosion, specifically, etching the exposed metal body of the windowed part. According to the method, the laser etching process is combined with the etching process, so that the traditional etching texture forming period is shortened, and meanwhile, the cost of the whole-process laser etching operation is reduced. The sealing layer is formed scientifically, laser breakdown is stable, the etching depth of the windowed metal surface is accurately controlled, the texture forming precision is improved, and the method is particularly suitable for the machined surface with a curved surface and a bent surface.

Description

[0001] This application is a divisional application of a Chinese patent application submitted to the China Patent Office on April 24, 2019, with the application number CN201910334946.4 and the invention name "Radium Engraving Etching Process". technical field [0002] The invention belongs to the technical field of radium engraving etching, and in particular relates to a radium engraving etching spacer fluid and a radium engraving etching method for texture forming of a mold groove chamber. Background technique [0003] The traditional texture production process mostly uses film exposure. Before each film exposure, it is necessary to manually align the upper layer of patterns, and the position tolerance accuracy between each layer of patterns is ±0.03mm, and the accuracy is poor; and each manual Film alignment takes a lot of time and inaccurate positioning leads to rework, resulting in high costs. In addition, in this way, photosensitive glue needs to be sprayed on each laye...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B44C1/22
CPCB44C1/227B44C1/228
Inventor 段志宏段世茂
Owner 苏州星泽激光科技有限公司