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Light emitting diode chip and manufacturing method thereof

A technology of light-emitting diodes and chips, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of low current lateral expansion effect and high current density, and achieve the effects of increasing reflection, high luminous efficiency, and improving overall luminous efficiency

Pending Publication Date: 2022-01-21
HUAIAN AUCKSUN OPTOELECTRONICS TECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The first purpose of the present invention is to provide a light-emitting diode chip to solve technical problems such as low current lateral expansion effect and relatively high current density in the prior art.

Method used

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  • Light emitting diode chip and manufacturing method thereof
  • Light emitting diode chip and manufacturing method thereof
  • Light emitting diode chip and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0149] This embodiment provides a light emitting diode chip, refer to figure 1 and figure 2 ,include:

[0150] Substrate 10, N-type semiconductor layer 21, active layer 22, P-type semiconductor layer 23, current blocking layer 30, transparent conductive layer 40, N-type electrode 51 and P-type electrode 52;

[0151] The N-type semiconductor layer 21, the active layer 22 and the P-type semiconductor layer 23 are sequentially stacked on the substrate 10, and have a structure extending from the P-type semiconductor layer 23 to the N-type semiconductor layer 21. The formed N step region 24;

[0152] The current blocking layer 30 is disposed on the P-type semiconductor layer 23, and the current blocking layer 30 includes several sublayers distributed at intervals; the transparent conductive layer 40 covers the current blocking layer 30 stacked on the P-type semiconductor layer 23;

[0153] The N-type electrode 51 is disposed on the N-type semiconductor layer 21 of the N step r...

Embodiment 2

[0163] This embodiment provides a light-emitting diode chip. Referring to Embodiment 1, the only difference is that in the current blocking layer, the arrangement of the first sub-layer 31 and the second sub-layer 32 is different.

[0164] The arrangement of the first sublayer 31 and the second sublayer 32 in the P-type semiconductor layer 23 in this embodiment refers to Figure 4 The arrangement of the first through holes 310 and the second through holes 320.

experiment example 1

[0168] The flip-chip light-emitting diode chips of embodiment 1 and embodiment 2 and comparative example 1 were subjected to a comparative test under the same test conditions at a test current of 65mA, and the luminous brightness of the LED chips provided by embodiment 1 of the present invention and embodiment 2 were compared Compared with Comparative Example 1, they were increased by 0.3% and 0.4%.

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Abstract

The invention relates to the technical field of semiconductors, in particular to a light-emitting diode chip and a manufacturing method thereof. The light-emitting diode chip comprises a substrate, and an N-type semiconductor layer, an active layer, a P-type semiconductor layer, a current blocking layer, a transparent conductive layer and a P-type electrode which are sequentially arranged on the substrate, the current blocking layer comprises at least two sub-layers which are distributed at intervals; the P-type electrode is arranged on the transparent conducting layer and electrically connected to the P-type semiconductor layer, and no P-type electrode is arranged over at least one sub-layer. According to the invention, the sub-layers are arranged on the P-type semiconductor layer corresponding to the P-type electrode, and at the same time, the sub-layers are distributed on other positions of the surface of the P-type semiconductor layer, so that further transverse expansion of current of the transparent conductive layer can be assisted, low current density and high luminous efficiency are realized, and light reflection is increased without increasing voltage, thereby achieving the effect of improving brightness.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a light emitting diode chip and a manufacturing method thereof. Background technique [0002] Light-emitting diode (referred to as LED) is a commonly used light-emitting device, which has the advantages of low voltage, low power consumption, small size, long life, etc., and is widely used in lighting and display fields. [0003] The existing LED chip structure includes a substrate, an N-type semiconductor layer, an active layer, a P-type semiconductor layer, a current blocking layer, a transparent conductive layer, an N-type electrode, a P-type electrode, and the like. However, the existing light-emitting diode chips have low current lateral expansion effect, resulting in relatively high current density and affecting light efficiency. [0004] In view of this, the present invention is proposed. Contents of the invention [0005] The first purpose of the present inventi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/14H01L33/36
CPCH01L33/145H01L33/36
Inventor 王东山王思博廖汉忠
Owner HUAIAN AUCKSUN OPTOELECTRONICS TECHNOLOGY CO LTD