Ternary layered transition metal boride and preparation method and application thereof
A transition metal, ternary layered technology, applied in the field of materials, to achieve good hydrogen evolution performance
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Embodiment 1
[0024] 1 g moalb powder was slowly added to a fluoroboric acid solution having a concentration of 40% by weight, in which the mass ratio of fluoroboric acid solution to the moalb powder was 60: 1. The mixture was then reacted at 80 ° C for 48 h. The reaction was completely cooled, and the precipitate was washed with deionized water until the pH of the supernatant was greater than 5, filtered and placed at 60 ° C vacuum oven for 12h, labeled 80-H-MAb. .
[0025] The above obtained product was added to a tetramethyl hydroxide solution (TMAOH) at a concentration of 25 wt%, and at 35 ° C for 48 h. The mass ratio of the tetramethyl hydroxide solution and the product is 20: 1, and the whole process of the reaction is measured using magnetic force. After the reaction, the reaction is completely washed with deionized water to the pH is neutral. The product was placed at a vacuum oven for 12 h at a vacuum oven at 60 ° C, labeled 80-Ht-mAb.
[0026] Moalb and HBF 4 The intermediate etch pro...
Embodiment 2
[0029] In the same embodiment, but HBF 4 The aqueous solution treatment temperature becomes 90 ° C, and the other steps are the same. After the etching of fluoroboric acid, the resulting product was added to a tetramethylammonium hydroxide solution (TmaOH) at a concentration of 25 wt%, and the reaction was reacted at 35 ° C for 48 h, and the whole process of the reaction was stirred, and the reaction was completed. Water was washed to pH as neutral. The product was placed at a vacuum oven for a vacuum oven for 12 h at a vacuum oven at 60 ° C.
[0030] Observe image 3 It can be seen that the 020 diffraction peak of the hydraheric acid etch product 90-MAb sample is shifted from 2θ = 12.61 ° to 13.24 °, and the product begins to contain MOF. 3 (2θ = 23.2 °) and ALF 3 (2θ = 25.3 °) impurities. After treatment after TMAOH, the diffraction peak of the 90-HT-MAB sample of impurity fluoride disappeared, XRD spectrum complies with MO 2 ALB 2 feature.
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