Signal line structure and manufacturing method thereof

Abstract

The invention provides a signal line structure. The signal line structure comprises a signal line, the first shielding line and the second shielding line are located on two sides of the same layer of the signal line at intervals; the third shielding lines are located above the signal lines at intervals; the fourth shielding lines are located below the signal lines at intervals; and a through hole structure; the third shielding line and the fourth shielding line are in gapless connection with the first shielding line and the second shielding line through through hole structures. The invention further provides a manufacturing method of the signal line structure. Compared with the prior art, medium gaps of existing columnar through holes are eliminated through the long-strip-shaped through hole structure, shielding lines on the same layer and shielding lines on the upper layer and the lower layer are completely sealed, the shielding effect is improved, no extra photomask is needed, no extra cost is generated, the area of the signal line structure is consistent with that of an original structure, no extra area is occupied, and cost is reduced. The method has a good application prospect in radio frequency, microwave and millimeter wave chips.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a signal line structure and a manufacturing method thereof. Background technique [0002] With the rapid development of semiconductor technology, miniaturization and high integration have become the mainstream of the industry. Therefore, how to shield and protect the signal line to prevent signal crosstalk is a problem that the industry has always hoped to solve and optimize. [0003] At present, the processing of signal lines in the industry is as follows: shielding lines are arranged near the signal lines to completely cover the signal lines up, down, left, and right. like figure 1 As shown, the signal line 10 is completely enclosed, including the first shielded line 1 and the second shielded line 2 located on the same layer of the signal line 10 and located on both sides thereof, and the third shielded line 3 located on the upper layer of the signal line ...

AI Technical Summary

Problems solved by technology

[0004] In this processing of signal lines, although the through holes adopt a densely arranged columnar through hole structure, due to the influence of design rules, the minimum spacing is limited, and there are dielectric gaps between the through holes, the upper layer and the lower layer, such as figure 2 As shown, part of the noise can still propagate to the signal line, and the shielding effect is average

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