Metal anticorrosive material

A metal anti-corrosion and photoelectrode technology, applied in nanotechnology, manganese compounds, cobalt compounds, etc. for materials and surface science, can solve the problems of high carrier recombination rate, limited visible light absorption, limited production and application, etc., to achieve Reduce recombination rate, significant protective effect, and promote the effect of photogenerated charge separation

Active Publication Date: 2022-03-25
上海集优张力控制螺栓有限公司
View PDF10 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing photoelectric protection composite materials are TiO 2 , the carrier recombination rate of a single photocat

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metal anticorrosive material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] (1) Add 5mmol of cobalt nitrate and 5mmol of molybdenum nitrate to 30ml of glycerol, then add dodecyl mercaptan and urea, and mix well by ultrasonic. The mass ratio of cobalt nitrate, dodecyl mercaptan and urea is 1:0.3 : 0.3; transferred to the autoclave, reacted for 10h at 180 degrees Celsius to obtain flower-like CoMoO 4 ; (2) the flower-like CoMoO 4 Dissolve in 40ml of deionized water, add 1mmol of ferric nitrate, 1mmol of manganese nitrate and 0.8mmol of NH 4 F. Transfer to a high-pressure reactor and continue to react at 180 degrees Celsius for 10 hours; heat the obtained product at 300 degrees Celsius to obtain flower-shaped CoMoO 4 loaded with nano-FeMnO 3 Granular composites.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a photoelectrode metal anticorrosive material which is characterized by being prepared by the following process: (1) adding Co salt and Mo salt into glycerol, then adding n-dodecyl mercaptan and urea, ultrasonically mixing uniformly, transferring into a high-pressure reaction kettle, and reacting at 180-200 DEG C for 10-15 hours to obtain flower-shaped CoMoO4; (2) dissolving the flower-like CoMoO4 in deionized water, sequentially adding soluble ferric salt, Mn salt and NH4F, transferring into a high-pressure reaction kettle, and continuously reacting at 180-200 DEG C for 10-15 hours; and carrying out heating treatment on the obtained product at 300-400 DEG C, so as to obtain the flower-like composite material with the FeMnO3 particles loaded on the CoMoO4.

Description

technical field [0001] The invention belongs to the field of preparation of anti-corrosion nanometer materials, and in particular relates to a protective composite material for photogenerated electrodes and a preparation method thereof. Background technique [0002] Corrosion of metal materials is ubiquitous in nature, which not only causes large economic losses, but also causes pollution and waste of resources. Traditional electrochemical anticorrosion technologies mainly include impressed current protection and sacrificial anode protection. However, these traditional electrochemical methods need to consume more electric energy and anode materials, which are costly and are not conducive to the practical application of the industry. Photoelectrochemical technology is an effective means to study metal corrosion and corrosion inhibition behavior. Semiconductor materials provide photogenerated electrons for coupling metal substrates to achieve photocathode protection. Its low ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23F13/14C01G51/00C01G45/12B82Y40/00B82Y30/00
CPCC23F13/14C01G51/00C01G45/125B82Y40/00B82Y30/00C01P2004/80C01P2004/45Y02P20/133
Inventor 张丽娟
Owner 上海集优张力控制螺栓有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products