Metal anticorrosive material
A metal anti-corrosion and photoelectrode technology, applied in nanotechnology, manganese compounds, cobalt compounds, etc. for materials and surface science, can solve the problems of high carrier recombination rate, limited visible light absorption, limited production and application, etc., to achieve Reduce recombination rate, significant protective effect, and promote the effect of photogenerated charge separation
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[0014] (1) Add 5mmol of cobalt nitrate and 5mmol of molybdenum nitrate to 30ml of glycerol, then add dodecyl mercaptan and urea, and mix well by ultrasonic. The mass ratio of cobalt nitrate, dodecyl mercaptan and urea is 1:0.3 : 0.3; transferred to the autoclave, reacted for 10h at 180 degrees Celsius to obtain flower-like CoMoO 4 ; (2) the flower-like CoMoO 4 Dissolve in 40ml of deionized water, add 1mmol of ferric nitrate, 1mmol of manganese nitrate and 0.8mmol of NH 4 F. Transfer to a high-pressure reactor and continue to react at 180 degrees Celsius for 10 hours; heat the obtained product at 300 degrees Celsius to obtain flower-shaped CoMoO 4 loaded with nano-FeMnO 3 Granular composites.
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