Uranium-doped bismuth silicate scintillation crystal and preparation method thereof
A technology of scintillation crystals and bismuth silicate, which is applied in crystal growth, chemical instruments and methods, self-solidification methods, etc., can solve the problems of low crystal light output and difficult control of crystal growth, and achieve the effect of inhibiting component separation
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Embodiment 1
[0027] A uranium-doped bismuth silicate scintillation crystal and a preparation method thereof, comprising the following steps:
[0028] 4N purity SiO 2 、 Bi 2 o 3 The raw materials are weighed and batched according to the stoichiometric ratio, ground and mixed evenly, and sintered at 820°C for 8 hours to obtain Bi 4 Si 3 o 12 Polycrystalline material; add 0.1mol% UO 2 , Grind and mix evenly, put it into a columnar Pt crucible with seed crystals, feed, inoculate, and grow in a zone furnace at 1150 ° C. The height of the melting zone is 70 mm, and the growth rate is 0.5 mm / h. After the growth is completed, the temperature is cooled to room temperature and then peeled off crucible to obtain cylindrical uranium-doped bismuth silicate crystals with high light output.
Embodiment 2
[0030] A method for preparing uranium-doped bismuth silicate scintillation crystals, comprising the following steps:
[0031] 4N purity SiO 2 、 Bi 2 o 3 The raw materials are weighed and batched according to the stoichiometric ratio, ground and mixed evenly, and sintered at 800°C for 12 hours to obtain Bi 4 Si 3 o 12 Polycrystalline material; add 1mol% UO 2, grind and mix evenly, put it into a columnar Pt crucible with a seed crystal, the thickness of the crucible is 0.2mm, place it in a ceramic tube, move it into the furnace at an appropriate height, set the temperature at 1150°C, and control the melting zone at 40mm. , inoculation, and growth with a growth rate of 0.2mm / h. After the growth was completed, the temperature was lowered to room temperature and the crucible was peeled off to obtain uranium-doped bismuth silicate crystals with high light output.
Embodiment 3
[0033] A method for preparing uranium-doped bismuth silicate scintillation crystals, comprising the following steps:
[0034] 4N purity SiO 2 、 Bi 2 o 3 The raw materials are weighed and batched according to the stoichiometric ratio, ground and mixed evenly, and sintered at 815°C for 10 hours to obtain Bi 4 Si 3 o 12 Polycrystalline material; add 0.5mol% UO 2 , Grind and mix evenly, put it into a square Pt crucible with a seed crystal, the thickness of the crucible is 0.2mm, feed, inoculate, and grow in a zone furnace at 1150°C, the height of the melting zone is 60mm, and the growth rate is 0.3mm / h. After the growth is over After cooling down to room temperature, the crucible was peeled off to obtain a uranium-doped square bismuth silicate crystal with high light output.
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