The invention provides an ultra-low
afterglow fast
scintillation attenuation
rare earth orthosilicate scintillation material, a preparation method and an application, the
chemical formula of the
scintillation material based on the
raw material ratio is RE2 (1-u-v-w) Ce2uM2vH2v + yN2wSi1-yAlyO5, H represents a
hydrogen element and is provided by a preparation
atmosphere, 0 < u < = 0.05, 0 < = v < = 0.02, 0 < w < = 0.05, 0 < = y < = 0.02, v + y > 0, RE represents a
rare earth element, the
rare earth element is selected from at least one of
lutetium,
yttrium,
gadolinium and
lanthanum, and y is greater than 0. The strong
oxygen vacancy
trapping type
doping element comprises an
aluminum element and / or an M element, the M element is selected from at least one of
magnesium,
calcium and
nickel elements, N represents a strong carrier bound type
doping element, and the strong carrier bound type
doping element is selected from at least one of
ytterbium,
praseodymium and
holmium elements. According to the rare earth
orthosilicate scintillating material, the
afterglow intensity can be reduced to below 200ppm (lower than 200ppm and 10ms) within 10ms after
continuous irradiation is terminated, and can be reduced to below 20ppm (lower than 20ppm and 20ms) within 20ms, and meanwhile, the attenuation time for attenuating the scintillating
light intensity to 1 / e of the original intensity under the
irradiation of
ionizing radiation is less than or equal to 15ns.