39results about How to "Contributes to uniformity" patented technology

The invention relates to a method for biologically testing chemoreception potential of plant root system secretions, belonging to the field of biological test technology.The method comprises the following steps: preparing agar liquid with a concentration less than or equal to 0.3% with water; sterilizing the agar liquid and pouring the agar liquid into a culture dish; disinfecting the donor plantand sowing the donor plant in the culture dish; sealing the culture dish, keeping the culture dish in a culture room with a temperature of 25-28 DEG C for 12 hours and culturing for 10-14 days in thebright / dark environment; removing all plants to be tested from the 11th day to the 15th day; disinfecting the receptor plant and sowing the receptor plant in the culture dish with the donor plant removed; sealing the culture dish, keeping the culture dish in a culture room with a temperature of 25-28 DEG C for 12 hours and culturing for 5-7 days in the bright / dark environment; then taking out thereceptor plant to measure growth amount thereof and growth amount of the receptor plant not affected by the donor plant; calculating influence of the plant root system secretions on the growth of thereceptor plant according to the measured growth amount to carry out chemoreception potential assessment.The invention is characterized by excluding competition among plant species for water and nutrient and fully reflecting effects the donor plant root system secretions have on the receptor plant.

The invention discloses a moisture-permeable waterproof film used for a fabric and a fabrication process thereof. According to the invention, a primary coating comprises polyurethane resin, butanone, toluene, water, hexane diisocyanate and N-methylethanolamine, and a first and second surface coatings comprise polyurethane resin, butanone, toluene, water and N-methylethanolamine. The fabrication process comprises the following steps: mixing hexane diisocyanate with main resin; mixing water with butanone to form a solvent which is put into a main resin mixed solution in at least six steps; filtering the mixed solution with a nylon net so as to obtain a filtered main resin mixed solution and carrying out deaeration treatment so as to form a primary coating slurry; preparing a surface coating slurry with the viscosity of a conjugate solution being 3500 to 6000 mpas; coating the primary coating slurry on the surface of release paper to form the primary coating, with coated weight being 4 to 6 g / m<2>; coating the surface coating slurry on the surface of the primary coat to form the surface coatings; and drying the release paper with the surface coatings and peeling the surface coatings off the release paper. According to the invention, the disadvantages that existing hydrophilic moisture permeable processing coating fabrics have nonuniform micropores and easily swell when contacting with water are overcome, and therefore, moisture permeable performance of a fabric itself is improved.

The invention provides a vehicle-specific phosphating solution and a preparation method thereof, belonging to the field of industrial phosphating solutions. The phosphating solution includes phosphoric acid, nitric acid, zinc oxide, manganese dihydrogen phosphate, zinc dihydrogen phosphate, manganese nitrate, calcium nitrate, polyvinylpyrrolidone, polyhydroxy carboxylic acid compound, ethylenediaminetetraacetic acid, citric acid, tartaric acid, muscle acid Alcohol hexaphosphoric acid, polyaluminum chloride and polyacrylamide. The phosphating solution prepared by the method of the present invention has good stability, simple process operation, less phosphating residue, fast film forming speed, uniform and fine film layer, good corrosion resistance, and enhanced adhesion between metal parts and coatings. Moreover, the phosphating solution has the characteristics of saving materials and energy, reasonable functions, and the product does not endanger human health or damage the ecological environment during and after use; it is low in cost, easy to use, and can meet the requirements of industrialized production of vehicles.

The invention comprises a light guide (2) comprising a transparent body (4) substantially elongated in a main direction, having an outer surface (12) forming a diopter with the environment of said body; a first a row (16) of inclined surfaces (20), said first row (16) of inclined surfaces (20) adapted to reflect light rays so that they emerge; and at least one second row (14, 18) of reflective surfaces (24), said At least one second row (14, 18) of reflective surfaces (24) has smaller dimensions than the corresponding first row (16) of reflective surfaces (20). Light reflected by the second row or rows is added to the beam from the first row. The width of the first row and the second row can be gradually increased and decreased respectively from the light source in order to compensate for the progressive loss of light traveling in the light guide.

The invention discloses a universal environment-friendly non-phosphorus phosphating solution, which comprises the following components in percentage by weight: 3 to 5 percent of ammonium zirconium hexafluoride, 5 to 7 percent of nitric acid, 1.5 to 2 percent of boric acid, 0.4 to 0.6 percent of ethylene diamine tetraacetic acid, 3 to 3.4 percent of sodium nitrite, 1 to 2.5 percent of zinc molybdate and the balance of water. An adhesion test and a salt spray test show that the non-phosphorus phosphating solution has a good effect on improvement in the adhesion force of a metal substrate and a surface coating, the adhesion force obtained by the adhesion test is over 1 grade, and the adhesion force obtained by the salt spray test can be maintained for 1,000 hours; and the non-phosphorus phosphating solution is convenient to prepare and significant for environmental protection.

The present invention proposes a memory device and a manufacturing method thereof. The memory device includes a substrate, a plurality of first gate structures, a first dielectric layer, a second dielectric layer, a third dielectric layer and contact plugs. These first gate structures are formed on the substrate of the array area. The first dielectric layer is formed on the top surface and sidewalls of the first gate structure. The second dielectric layer is formed on the first dielectric layer and in direct contact with the first dielectric layer. The second dielectric layer is made of the same material as the first dielectric layer. The third dielectric layer is formed between the first gate structures and defines a plurality of contact holes exposing the substrate. Contact plugs are filled in the aforementioned contact holes.