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Ion plating device

A technology of ion coating and ion source, which is applied in the field of ion coating devices, can solve the problems of poor coating uniformity and short service life of ion sources, etc., and achieve uniform coating, good compactness, and enhanced film strength.

Inactive Publication Date: 2011-01-26
苏州五方光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, the ion source mainly plays the role of cleaning or coating a single-layer optical film, and the coating uniformity is relatively poor, and the service life of the ion source is relatively short

Method used

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Embodiment 1

[0018] Such as figure 1 As shown, in the ion coating device of the present invention, the preferred scheme is that the coating furnace 1 is a cylinder, and the coating furnace is provided with an ion source 3 and a film material 2, and the ion source 3 and the ion source power supply arranged outside the coating furnace 1 4 are connected, ion source power supply 4 anode voltage 200-380V, anode current 8-20A, what pass into the coating furnace 1 is the mixed gas of oxygen and argon gas with a volume ratio of 1:2, and the gas flow rate is 30sccm (standard ml / minutes), the ion source 3 can coat 42-68 layers of film, and the top in the coating furnace 1 is provided with a coating umbrella 5. The ion source 3 emits plasma, heats the film material 2, and makes it into a film material vapor, which is evenly coated on the glass sheet or lens, and the glass sheet or lens is arranged in the coating umbrella 5. Glass sheet refers to the filter used for mobile phone camera or other came...

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Abstract

The invention discloses an ion plating device and relates to a device for plating through the vacuum evaporation, sputtering or ion injection of a coating forming material, in particular to an ion plating device. The device comprises a plating furnace and a film material arranged in the plating furnace. The device is characterized in that the plating furnace is internally provided with an ion source for emitting plasma, and the ion source is used for emitting plasma to heat the film material to ensure that the film material becomes steam and is uniformly plated on a glass sheet to effectively enhance the film layer strength, thus the plating compactness is better, the reject ratios due to scraping, spot stains, and the like in the production process of lenses are reduced, and the yield of the process is effectively improved; the ion source is arranged on the middle rear part of the plating furnace so as to be beneficial to the uniformity of the ion emitting angle of the ion source to realize uniformly plating; and argon is added to mixed gas, which can increase the ion density and prolong the service life of lamp filaments of the ion source.

Description

technical field [0001] The invention relates to a device for coating by vacuum evaporation, sputtering or ion implantation of coating forming materials, in particular to an ion coating device. Background technique [0002] Optical film is to inlay one or more layers of very thin special materials on the lens, so that the lens can achieve a certain optical effect. The manufacture of optical thin films is made by vacuum evaporation, the most common method is thermal resistance, which is to put the evaporation material on the resistance wire or sheet in the vacuum evaporation machine, and heat the material into vapor under the condition of high vacuum. , directly coated on the lens. Since there are many materials with high melting points, it is not easy to use this method to melt and evaporate them. To improve this shortcoming with the electron gun, the method is to directly hit the material with a high-voltage electron beam, and the material with a high melting point can be ...

Claims

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Application Information

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IPC IPC(8): C23C14/22
Inventor 金春伟奂微微
Owner 苏州五方光电科技有限公司
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