Photoetching splicing error detection method, two-dimensional grating manufacturing method and mask plate

Abstract

The invention provides a photoetching splicing error detection method, a two-dimensional grating manufacturing method and a mask plate. The photoetching splicing error detection method comprises the following steps: forming a photoresist layer on a substrate; a mask plate is used for executing exposure and development processes to form a graphical photoresist layer, the mask plate comprises a first repeated exposure area and a second repeated exposure area, and the first repeated exposure area and the second repeated exposure area are located on the edge of the exposure area of the mask plate. The grating pattern on the first repeated exposure area and the grating pattern on the second repeated exposure area are complementary, and the first repeated exposure area and the second repeated exposure area of adjacent exposure fields are overlapped during exposure; and detecting splicing errors of the patterned photoresist layers formed in the first repeated exposure region and the second repeated exposure region of the adjacent exposure fields by utilizing defect scanning equipment. According to the splicing error detection result, the position, direction and size of the splicing error of the two-dimensional grating can be determined, process correction is carried out, and the splicing error of the two-dimensional grating is avoided.

Description

technical field [0001] The invention relates to the technical field of integrated circuits, in particular to a method for detecting splicing errors in photolithography, a method for manufacturing a two-dimensional grating, and a mask. Background technique [0002] Gratings are widely used in high-precision measurement, especially the current integrated circuits, precision machining, microscopic technology, etc. have put forward higher requirements for accurate measurement of position. The measurement systems in these fields need to accurately measure and position the two-dimensional direction of the worktable. Taking semiconductor equipment as an example, the lithography machine used for advanced manufacturing uses two-dimensional gratings to realize the nanometer precision of the workpiece table in the long stroke. Level precise positioning, which means that the grating itself needs to achieve extremely high manufacturing accuracy. [0003] The traditional grating manufact...

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Problems solved by technology

[0005] The object of the present invention is to provide a method for detecting lithographic splicing errors, a method for manufacturing a two-dimensional grating and a mask plate, so as to solve the problem of lithographic splicing errors that occur in grating manufacturing

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