Photoetching splicing error detection method, two-dimensional grating manufacturing method and mask plate
A detection method and mask technology, applied in the field of integrated circuits, can solve problems such as lithographic splicing errors, and achieve the effect of avoiding splicing errors and ensuring integrity
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[0041] The method for detecting splicing errors in lithography, the method for manufacturing a two-dimensional grating, and the mask plate proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0042] figure 1 It is a flow chart of a method for detecting a photolithography splicing error according to an embodiment of the present invention. Such as figure 1 As shown, an embodiment of the present invention provides a method for detecting a photolithography splicing error, including:
[0043] Step S10, forming a photoresist layer on the substrate;
[0044] Step S1...
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