High-efficiency low-pollution plasma source

Abstract

The invention belongs to the technical field of plasma sources, and particularly relates to a high-efficiency low-pollution plasma source which comprises a cathode, a water-cooled anode and a magnet yoke base which are coaxially arranged, inner magnetic steel arranged at the center of the magnet yoke base, an inner shield which sleeves the inner magnetic steel, and outer magnetic steel and an outer shield which are fixedly mounted above the outer edge of the magnet yoke base, the magnet yoke base is positioned in the cathode; the water-cooled anode is connected with the cathode in an insulating manner; the magnetic force directions of the inner magnetic steel and the outer magnetic steel are opposite; and a discharge power supply A is connected between the cathode and the water-cooling anode. The inner magnetic pole and the outer magnetic pole of the plasma source are located at the suspension potential or different bias voltages are applied to a workpiece or a vacuum chamber respectively, and the potential is distributed by designing a discharge channel, so that self-sputtering of discharge plasma to the wall can be reduced and controlled, and the purposes of improving the utilization rate of discharge current and leading out ion energy are achieved.

Description

technical field [0001] The invention belongs to the technical field of plasma sources, and in particular relates to a plasma source with high efficiency and low pollution. Background technique [0002] Closed drift ion source is a low energy and large beam current (voltage 0-1000eV) ion source with high beam current density (≥2mA / mm 2 )), wide ion energy range (discharge voltage 30%-100%), simple structure, low maintenance cost, and suitable for oxygen, nitrogen, acetylene and corrosive gases, etc., widely used in ion beam etching, cleaning, activation and Auxiliary coating and other processes. [0003] The ion source is mainly composed of anode, cathode, and magnetic steel. Under the action of cathode and anode voltage, electrons move along the magnetic force line to the anode. Since there are almost orthogonal magnetic force lines and electric force lines in the area near the anode surface, in this intersection Under the action of the electromagnetic field, the electrons...

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Problems solved by technology

[0005] In order to reduce the sputtering etching of the discharge ions on the magnetic poles, an additional magnetic field coil is often used at present to control the ion beam current characteristics in the channel by optimizing the magnetic field position, so as to achieve the purpose of reducing the ion flux bombarded to the wall. This method increases The structure complexity and control difficulty of the Hall ion source

The other is to extend the anode structure and extend the anode to the outside of the magnetic pole structure to reduce the bombardment of ions on the magnetic pole or side wall. Although the ion source of the anode layer can greatly reduce the etching of the magnetic pole, its working discharge voltage range is very small (300- 600V), affecting the application range of the Hall ion source

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