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Composite magnetism gathering film

A thin-film and magnetic-gathering technology, applied in the field of magnetic-gathering materials, can solve the problems of high cost, difficult to achieve thickness, stress accumulation concentration and lattice defects, and achieve the effect of final cost reduction and convenient regulation.

Active Publication Date: 2022-04-12
珠海多创科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Limited by the type of sputtering target and the high energy of the sputtering process will lead to stress concentration, the thickness of the magnetic gathering film prepared by magnetron sputtering is relatively thin, generally no more than 2-3 μm, and the sputtering efficiency is extremely low, and the cost Expensive and thus highly limited
Compared with the preparation method of magnetron sputtering, electroplating has better adjustability and high yield. According to the data, at present, electroplating a single Ni x Fe y Mo z The limit thickness of the alloy can be close to 5 μm, but as the thickness of the film increases, the accumulation of stress and the accumulation of defects such as lattice defects, impurity diffusion and micro-crack expansion continue to accumulate, and it is currently difficult to achieve a thicker thickness.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] In the polymagnetic film of the present embodiment, the first electroplating film A is amorphous Ni x FE y Mo z Thin film, 73 x FE y Mo z Compound ratio close to Ni 78 FE 17 Mo 5 The second electroplated film B is a Cu film, 5 repeated stacks; single layer Ni 78 FE 17 Mo 5 The film has a thickness of 3 μm, a single layer Cu film having a thickness of 50 nm, and the first electroplating film A and the second electroplated film B are alternately stacked 5 times to obtain a composite magnetine film.

[0044] The specific steps of electroplating are as follows:

[0045] Step 1: After 10% of the dilute hydrochloric acid having a concentration of 10%, the plated substrate was immersed for 10 min, washed with deionized water, and then drying it with nitrogen after rinse;

[0046] Step 2: Configure electroplating Ni 78 FE 17 Mo 5 Electrolyte, this example Ni 78 FE 17 Mo 5 The component of the electrolyte is: 1-butyl-dodecyl-3-methylmy Chloride 25 g / L, hexahydrate sulfate 50 g / ...

Embodiment 2

[0052] The difference from the first embodiment is that the first electroplating film A is a polystrial Ni x FE y Mo z Thin film, Ni x FE y Mo z Compound ratio close to Ni 30 FE 43 Mo 27 Ni x FE y Mo z The proportion of X X is greatly improved, Ni x FE y Mo z The film is mainly based on polysone. Can be feso in the electrolyte 4 · 7h 2 The concentration of O is set to 4 ~ 6g / L to increase the X value, and the specifically can be adjusted according to the actual component test results.

[0053] The composite magnetine film of Example 2 was hysteresissed, and Hes and the face corresponding to the face c It is 0.6OE and 0.9OE; the corresponding face and the facade are fitted within ± 5OE and ± 2400oE range, and its non-linearity is within 2%, and the outgoing linear response range is effective, which can be satisfied. High requirements for the performance requirements of the magnetic flux aggregator.

Embodiment 3

[0055] The difference from the first embodiment is that the first electroplating film A is a polystrial Ni x FE y Mo z Thin film, Ni x FE y Mo z Compound ratio close to Ni 75 FE 15 Mo 10 Film, second electroplating film B is amorphous Ni x FE y Mo z Thin film, Ni x FE y Mo z Compound ratio close to Ni 78 FE 17 Mo 5 . Can be feso in the electrolyte 4 · 7h 2 The concentration of O is set to 2 to 3 g / L, and the electrolyte pH is set to 3 to 4, the electroplating temperature is 30 ° C, and the value of X, Y, Z is adjusted according to the actual component test results.

[0056] The composite polymer magnetism test obtained in Example 3 was magnetically resistant to the test results. Figure 3A and Figure 3B As shown, the HC corresponding to the face and the face is 0.4OE and 0.7OE, respectively; the corresponding face and the face are fitted within ± 4OE and ± 1600oE range, and its non-linearity is within 2%, effectively broadening The outdoor linear response range is met to meet the...

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Abstract

The composite magnetism gathering thin film comprises a plurality of first electroplating thin films and second electroplating thin films which are alternately stacked, the first electroplating thin film is a polycrystalline NixFeyMoz thin film, and the second electroplating thin film is an amorphous NixFeyMoz thin film; or the first electroplating film is a NixFeyMoz film, and the second electroplating film is a non-magnetic material film. The composite magnetism gathering film adopts a polycrystalline and amorphous laminated structure or a magnetic and non-magnetic laminated structure, so that the situation that the magnetism gathering performance of the film is reduced due to anisotropy of a single-material film after the film reaches a certain thickness can be avoided; the problem of thickness limit caused by stress concentration, lattice defects and the like in single material electroplating and the problems that components of a magnetic flux magnetism gathering thin film material prepared by magnetron sputtering are inconvenient to adjust and the thickness is difficult to increase are solved, and a uniform composite thin film which is thicker than a single-layer thin film prepared by magnetron sputtering and electroplating can be obtained; and the final cost is greatly reduced.

Description

Technical field [0001] The present invention belongs to the technical field of the magnetic material, and is, particularly, a composite magnetine film suitable for a magnetoresistance sensor. Background technique [0002] Anisotropic magnetoresistance sensor (AMR), giant magnetoresistive sensor (GMR), and tunnel magnetoresistance sensor (TMR) based on magnetoresistive effects are widely concerned due to many advantages. Further improve the sensitivity of the sensor through the magnetic flux aggregator, it can meet the more stringent test environment. The magnetic flux aggregator is composed of a low coat of soft magnetic material having a thickness, and the greater the gain factor G, the greater the sensitivity of the sensor. In the magnetoresistance sensor, in order to ensure that the magnetians are not significantly weak, the magnetic flux aggregate is generally arranged near the magnetic sensing unit. For a uniform magnetine film, its gain factor g = B x / (μ 0 Hide ext ) = Μ ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D5/10C25D5/16C25D3/56
CPCY02P10/20
Inventor 刘明马孝瑜关蒙萌胡忠强朱家训
Owner 珠海多创科技有限公司
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