Silicon-based high-resistance film coating liquid, preparation method thereof and preparation method of silicon-based high-resistance film
A technology of large resistance and coating liquid, applied in the direction of electrical digital data processing, data processing input/output process, instruments, etc., can solve the problems of occlusion, difficult to achieve touch effect, affecting touch effect, etc., to increase wear resistance Excellent resistance to scratches and scratches, excellent flatness, and the effect of maintaining stability
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[0034] The application also provides a method for preparing a silicon-based high-resistance thin film coating solution, comprising the following steps:
[0035] After mixing the matting solution, ethanol, graphene and a dispersant, adding a silicon-based alloy, then adding a cross-linking agent and stirring to obtain a silicon-based high-resistance thin film coating solution.
[0036] The preparation sequence of the silicon-based high-resistance thin film coating solution mentioned above can ensure good uniformity of the thin film. During the above mixing process, the whole process is carried out under stirring; the stirring speed is 100-200 rpm, and the stirring time is 60-120 min.
[0037] The present application also provides a method for preparing a silicon-based high-resistance film, which prepares a silicon-based high-resistance film by using screen printing. In the process, preheating before screen printing, screen printing and subsequent The illumination of the light ...
Embodiment 1
[0049] Preparation of coating solution: mix 50 parts by weight of matting solution, 29 parts by weight of ethanol, 5 parts by weight of dispersant and 2 parts by weight of graphene at a stirring speed of 120 rpm, then add 10 parts by weight of silicon base alloy, finally add 4 parts by weight of cross-linking agent, stir for 90min to obtain a 25CP coating solution; silicon-based alloys include 70wt% silicon, 30wt% other metals (aluminum, zinc-aluminum, antimony, chromium, nickel), extinction The solution is prepared from matting powder and water with a mass ratio of 15:85. The graphene has a pore size of 60nm, a porosity of 85%, and a specific surface area of 2300m 2 / g;
[0050] Cleaning: Soak the PET substrate in a tank of 30% concentrated sulfuric acid and 70% pure water for 10-15 minutes, then soak the substrate in a 15% lye tank for 10-15 minutes, pH = 10-12, and finally Put the substrate into the clear water tank for 10-30 minutes; install a foam tube at the bottom of...
Embodiment 2
[0055] Preparation of coating solution: mix 45 parts by weight of matting solution, 27 parts by weight of ethanol, 8 parts by weight of dispersant and 4 parts by weight of graphene at a stirring speed of 150 rpm, then add 13 parts by weight of silicon base alloy, finally add 5 parts by weight of cross-linking agent, and stir for 100min to obtain a 28CP coating solution; silicon-based alloys include 75wt% silicon, 25wt% other metals (aluminum, zinc-aluminum, antimony, chromium, nickel), extinction The solution is prepared from matting powder and water with a mass ratio of 20:80. The graphene has a pore size of 70nm, a porosity of 90%, and a specific surface area of 2600m 2 / g;
[0056] Cleaning: Soak the PET substrate in a tank of 30% concentrated sulfuric acid and 70% pure water for 10-15 minutes, then soak the substrate in a 15% lye tank for 10-15 minutes, pH = 10-12, and finally Put the substrate into the clear water tank for 10-30 minutes; install a foam tube at the bott...
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