Multilayer film for hyperspectral-laser stealth

A multi-layer thin film and hyperspectral technology, applied in the field of hyperspectral-laser stealth, can solve the problems of lack of control means for hyperspectral-laser compatible stealth, destroy broadband reflection characteristics, etc., achieve high absorption and high frequency selective characteristics, and improve absorption rate effect

Pending Publication Date: 2022-07-01
HUAZHONG UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the narrow-band absorption of the 1.06 μm laser is contradictory to the broadband high reflection of the 0.8-1.3 μm “near-infrared plateau” required for hyperspectral stealth
The reason is that the conventional 1.06μm laser absorbing materials (rare earth elements, etc.) are all broadband absorption, which will destroy the broadband reflection characteristics of the "near-infrared plateau", because the two requirements are difficult to achieve at the same time, and hyperspectral-laser compatible stealth lacks effective control means

Method used

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  • Multilayer film for hyperspectral-laser stealth
  • Multilayer film for hyperspectral-laser stealth
  • Multilayer film for hyperspectral-laser stealth

Examples

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Embodiment 1

[0052] In this embodiment, the thickness of the germanium film in the visible light antireflection absorption dielectric film layer is 2 nm, the thickness of the magnesium fluoride film in the visible light color control layer is 265 nm, and the corresponding surface color is green. image 3 The 0.4-2.5μm simulated reflection spectrum diagram of the multi-layer thin film structure for hyperspectral-laser stealth provided in Example 1 of the present invention, it can be seen from the figure that the reflectivity is lower than 10% at the 1.06μm laser wavelength , and the rest of the band ranges can accurately simulate the reflection spectrum of green plants, and the spectral similarity with the standard reflection spectrum is greater than 90%. In this embodiment, the color of visible light is green, and the chromaticity coordinates are (0.324, 0.440).

Embodiment 2-4

[0054] The hyperspectral-laser stealth multilayer thin film structure provided in Example 2-4 differs from Example 1 in that the thickness of the outermost visible light color control layer magnesium fluoride film is different, and the thickness of the magnesium fluoride film in Example 2-5 is sequentially 255, 275, 285nm.

[0055] The 0.4-0.8 μm simulated reflection spectrum of the multilayer thin film structure for hyperspectral-laser stealth provided in Example 2-4 is as follows Figure 4 shown. Different thicknesses of magnesium fluoride films affect the wavelength positions of different reflection peaks in the visible light band, thereby affecting the surface color. The corresponding visible light chromaticity diagram is shown in Table 1, showing dark green, yellow-green, and yellow in turn, so it can meet different background environments. under the visible light stealth requirements.

[0056] Table 1 Magnesium fluoride film thickness and corresponding color properties...

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Abstract

The invention discloses a multilayer film for hyperspectral-laser stealth, and belongs to the technical field of hyperspectral-laser stealth. The high-spectrum-laser compatible stealth structure sequentially comprises a high-spectrum-laser compatible stealth layer, a visible light anti-reflection absorption dielectric film layer and a visible light color regulation and control layer from bottom to top. The hyperspectral-laser compatible stealth layer comprises multiple layers of dielectric materials with different refractive indexes, and the multiple layers of dielectric materials are alternately stacked; the refractive index imaginary part of the visible light anti-reflection absorption dielectric film layer material is not zero, and the visible light anti-reflection absorption dielectric film layer material is used for achieving selective high absorption of visible light wave bands. The refractive index of a dielectric material of the visible light color regulation and control layer is smaller than that of the visible light anti-reflection absorption dielectric film layer, and the color of the surface of the visible light color regulation and control layer changes along with the thickness of the material of the visible light color regulation and control layer. According to the invention, high reflection of 0.8-1.3 [mu] m near-infrared plateau and low reflection of normal incidence 1.06 [mu] m laser are realized, the high spectrum-laser compatible stealth performance is realized, and visible light stealth requirements in different environments can be met.

Description

technical field [0001] The invention belongs to the technical field of hyperspectral-laser stealth, and more particularly relates to a multilayer film for hyperspectral-laser stealth. Background technique [0002] In modern high-tech warfare, the development of advanced detection technologies such as hyperspectral and laser has enhanced the ability to identify and strike ground military targets, posing a strong threat to the combat effectiveness of ground military targets. [0003] Hyperspectral detection technology is an advanced optical detection technology that can accurately measure the spectral characteristics of each pixel in the reconnaissance image. The hyperspectral detection technology identifies traditional visible light stealth targets by measuring and analyzing the differences in spectral characteristics between different pixel points (such as plants, paints, plastics, etc.) shape. Hyperspectral reconnaissance poses a huge threat to traditional optical stealth...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/115G02B5/22
CPCG02B1/115G02B5/22
Inventor 王鲜邓子琛周鹏龚韦王韬龚荣洲
Owner HUAZHONG UNIV OF SCI & TECH
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