Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Production process of photosensitive monomer material

A technology of photosensitive monomer and production process, applied in the direction of photosensitive materials for opto-mechanical equipment, etc., can solve the problems of inconvenience for large-scale mass production of enterprises and high price of polymer materials, achieve low production cost and improve molding processing performance. , the effect of good photosensitive performance

Inactive Publication Date: 2022-08-02
湖南金紫宇新材料科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, photosensitive materials are often used in photography. There are many types of photosensitive materials, which are generally classified according to their use, support and color sensitivity. Functional polymer materials, but such polymer materials are expensive and not convenient for large-scale mass production

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Production process of photosensitive monomer material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Example 1, please refer to figure 1 , the present invention provides a technical scheme: the production process of the photosensitive monomer material, comprising the following steps:

[0023] S1: Solution adjustment, first take deionized water and photosensitive resin, dilute to 155ml / l working solution when using, then measure pH with acidity meter, then adjust pH, then take acrylamide and diacetone acrylamide, after obtaining the acrylamide and diacetone acrylamide in conditioned deionized water:

[0024] S2: Mixing reaction, then weigh the initiator and add it into the reaction kettle, and gradually increase the temperature of the reaction kettle itself, and keep it for 4 hours. After the maintenance, the initiator is added to the reaction kettle again, and the polymerization operation is carried out for 10 hours to obtain the photosensitive polymer:

[0025] S3: Fine treatment, then add defoaming agent to the reaction kettle, and continuously defoaming the solutio...

Embodiment 2

[0035] Example 2, please refer to figure 1 , the present invention provides a technical scheme: the production process of the photosensitive monomer material, comprising the following steps:

[0036] S1: Solution adjustment, first take deionized water and photosensitive resin, dilute to 120ml / l working solution when using, then measure pH with acidity meter, then adjust pH, then take acrylamide and diacetone acrylamide, after obtaining acrylamide and diacetone acrylamide in conditioned deionized water:

[0037] S2: Mixing reaction, then weigh the initiator and add it to the reaction kettle, and gradually increase the temperature of the reaction kettle itself, and keep it for 3 hours. After the maintenance, the initiator is added to the reaction kettle again, and the polymerization operation is carried out for 8 hours to obtain the photosensitive polymer:

[0038] S3: Fine treatment, then add defoaming agent to the reaction kettle, and continuously defoaming the solution in th...

Embodiment 3

[0048] Example three, please refer to figure 1 , the present invention provides a technical scheme: the production process of the photosensitive monomer material, comprising the following steps:

[0049] S1: Solution adjustment, first take deionized water and photosensitive resin, dilute to 200ml / l working solution when using, then measure pH with acidity meter, then adjust pH, then take acrylamide and diacetone acrylamide, after obtaining the acrylamide and diacetone acrylamide in conditioned deionized water:

[0050] S2: Mixing reaction, then weigh the initiator and add it to the reaction kettle, and gradually increase the temperature of the reaction kettle itself, and keep it for 4 hours. After holding, the initiator is added to the reaction kettle again, and the polymerization operation is carried out for 8 hours to obtain the photosensitive polymer:

[0051] S3: Fine treatment, then add defoaming agent to the reaction kettle, and continuously defoaming the solution in th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a photosensitive monomer material production technology, and relates to the technical field of photosensitive monomer material production, and the photosensitive monomer material production technology comprises the following steps: S1, solution regulation: firstly taking deionized water and photosensitive resin, diluting the deionized water and the photosensitive resin into a 40-200ml / l working solution during use, then measuring the pH value by using an acidimeter, then regulating the pH value, then taking acrylamide and diacetone acrylamide, and carrying out uniform stirring; compared with a traditional photosensitive monomer material, the photosensitive monomer material has the advantages that the sensitivity / granularity, definition and hierarchy of the obtained photosensitive monomer material can be improved by adding the silver halide emulsion, and the sensitivity / granularity, definition and hierarchy of the obtained photosensitive monomer material can be improved by adding the plasticizer, so that the sensitivity / granularity, definition and hierarchy of the obtained photosensitive monomer material can be improved, and the sensitivity / granularity, definition and hierarchy of the obtained photosensitive monomer material can be improved. The composite material weakens the acting force between polymer molecules, reduces the melting temperature and melt viscosity, improves the molding processability, endows the plastic product with flexibility and other various necessary properties within the use temperature range, and is low in manufacturing cost and suitable for large-scale production of enterprises.

Description

technical field [0001] The invention relates to the technical field of production of photosensitive monomer materials, in particular to a production process of photosensitive monomer materials. Background technique [0002] Photosensitive material refers to a semiconductor material with photosensitive properties, so it is also called photoconductive material or photosensitive semiconductor. Commonly used photosensitive materials on copiers are: organic photosensitive drum (OPC), amorphous silicon photosensitive drum, cadmium sulfide photosensitive drum and selenium photosensitive drum. In addition, photosensitive materials are often used in photography. There are many varieties of photosensitive materials, which are generally classified according to their uses, supports and color-sensing properties. Acrylamide-diacetone acrylamide copolymer is a new type of water-soluble that has developed rapidly internationally in recent years. Sexual functional polymer materials, but thi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/004C08F283/10C08F220/56C08F220/58
CPCG03F7/004C08F283/105C08F220/56C08F220/58
Inventor 石爱斌
Owner 湖南金紫宇新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com