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42 results about "Photosensitiveness" patented technology

Polyhydroxy phenolic compounds and methods for their preparation, diazonium naphthoquinone sulfonic acid esters and methods for their preparation, and photoresist compositions

The application provides a polyhydroxy phenolic compound, a preparation method thereof, a diazonium naphthoquinone sulfonate, a preparation method thereof and a photoresist composition. The polyhydroxy phenolic compound has the following structure shown in formula (I). The diazonium naphthoquinone sulfonate prepared by using the polyhydroxy phenolic compound provided by the application as an intermediate is applied to the photoresist composition as a photosensitive agent, and the obtained photoresist not only has clear resolution and high photosensitivity, but also has excellent thermal stability and etching resistance, and has a wide application prospect in the field of semiconductors.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +2

Photosensitive resin composition containing acridine methylene quaternary ammonium salt photosensitizer and application thereof

The invention provides a photosensitive resin composition containing an acridine methylene quaternary ammonium salt photosensitizer and application of the photosensitive resin composition, quaternary ammonium group substituted methylene is introduced to the ninth position of a structural main body acridine ring of the photosensitizer, and acid radical or halogen is adopted as equilibrium anion. According to the photosensitizer, a quaternary ammonium salt group is introduced to the 9 site of an acridine ring, so that the problems that a traditional 9-phenylacridine photosensitizer is poor in compatibility, prone to crystallization and precipitation, insufficient in water solubility, weak in antistatic performance and the like in a formula are effectively solved. The photosensitive resin composition disclosed by the invention shows excellent dispersion stability, high sensitivity and high resolution, and can be used for remarkably reducing precipitates in a developing process and reducing poor lamination caused by static accumulation. The photosensitive dry film prepared based on the composition is suitable for fine pattern manufacturing in the fields of dry films, paints, coatings, printing ink, forming materials and the like, and has high yield and production efficiency.
Owner:HUNAN INITIAL NEW MATERIALS CO LTD

A modified colorant, and a preparation method and application thereof

The present application provides a modified color dye, its preparation method and application. The composition of the present application contains the modified color dye, and the structure contains a naphthalene sulfonic acid group. Compared with conventional color dyes, the modified color dye can form a hydrogen bond with the oxygen atom in the photosensitive combination. On the other hand, the modified color dye has a large molecular weight and a small binding force with aluminum. After development, there is no residual color in the blank area. The modified color dye has the characteristics of high photosensitivity and mild development conditions, thereby effectively improving the dot quality of the plate material, which is beneficial to ensure the image reproduction and precision. At the same time, due to the mild development conditions, the amount of sludge residue after development is greatly reduced.
Owner:LUCKY HUAGUANG GRAPHICS

Novel high-sensitivity photoinitiator mixtures suitable for long-wavelength low-energy curing

The invention relates to the field of photocuring new material chemicals, in particular to composition of a novel photoinitiator mixture system, application of the novel photoinitiator mixture system as a photoinitiator in an ethylenically-bond-containing unsaturated radiation polymerization system and the ethylenically-bond-containing unsaturated radiation polymerization system containing the photoinitiator mixture component. The novel photoinitiator mixture system disclosed by the invention is widely suitable for emerging long-wavelength high-photosensitivity low-energy curing application scenes represented by high-end PCB (Printed Circuit Board) photoresist.
Owner:SHENZHEN UV CHEMTECH CO LTD

High-sensitivity treatment-free negative image CTP plate material and preparation method thereof

The invention relates to a high-sensitivity treatment-free negative image CTP plate material and a preparation method thereof, and belongs to the technical field of CTP plate materials, the treatment-free negative image CTP plate material comprises a plate base and a photosensitive layer, the photosensitive layer contains a modified graphene oxide composite material, the modified graphene oxide composite material can promote rapid conduction of heat, strengthen scratch resistance and improve the sensitivity of the photosensitive layer, and the modified graphene oxide composite material is essentially formed by compounding an infrared absorption dye new indocyanine green onto nitrogen-aluminum co-doped graphene oxide, so that the infrared absorption dye new indocyanine green can be effectively absorbed by the nitrogen-aluminum co-doped graphene oxide; the specific preparation method comprises the following steps: doping nitrogen and aluminum elements in graphene oxide by using urea and aluminum nitrate nonahydrate to prepare nitrogen-aluminum co-doped graphene oxide, and then adding amino-modified new indocyanine green to react by taking dehydration esterification as a reaction principle, thereby obtaining the nitrogen-aluminum co-doped graphene oxide. The amino-modified novel indocyanine green is prepared from a short-carbon-chain diamine compound and novel indocyanine green under the action of amino and halogen.
Owner:GUANGZHOU GUBANG HIGH-TECH MATERIALS TECHNOLOGY CO LTD

Photosensitive resin composition and method for producing the same

To provide a photosensitive resin composition capable of realizing a photosensitive resin layer excellent in desired properties (particularly, sensitivity, resolution, and adhesion). 【Solution means】A photosensitive resin composition containing the following components: (A) an alkali-soluble polymer; (B) a compound having an ethylenically unsaturated bond; (C) a polymerization initiator; and (D) a polymerization inhibitor, wherein the content of component (C) is 3.5% by mass or more based on the total solid content of the photosensitive resin composition, and component (D) is represented by the following general formula (I): JPEG2026060536000018.jpg2250 [In formula (I), R 1 represents a hydrocarbon group which may have a substituent, NHR 4 or NR 4 R 5 where R 4 and R 5 each independently represent a hydrocarbon group which may have a substituent.], a photosensitive resin composition containing a compound having a nitroso structure.
Owner:ASAHI KASEI KOGYO KABUSHIKI KAISHA

Image processing method and device, electronic equipment, and storage medium

The present disclosure relates to an image processing method and device, electronic equipment and storage medium. The image processing method comprises: acquiring a collection image with an ambient illumination less than a preset illumination; acquiring analog gains corresponding to a plurality of sensitivities and dark field frame images corresponding to the plurality of sensitivities; the dark field frame images are acquired under the condition of no incident ambient light; and based on the analog gains, the dark field frame images and the collection image, noise images corresponding to the collection image under the plurality of sensitivities are obtained. According to the embodiments of the present disclosure, noise images in a dark light scene can be obtained.
Owner:BEIJING XIAOMI MOBILE SOFTWARE CO LTD

Enhanced EUV photoresists and methods of their use

The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.
Owner:IRRESISTIBLE MATERIALS

Resist composition, laminate, and pattern formation method

PendingJP2026122764ACarbon numberCarboxyl radical
Provided is a non-chemically amplified resist composition that is excellent in sensitivity and limit resolution in photolithography using high-energy rays, particularly in electron beam (EB) lithography and EUV lithography. 【Solution means】A resist composition characterized by containing at least one hypervalent iodine compound, a carboxy group-containing compound, and a solvent selected from the following formulas (1), (2), and (3). TIFF2026122764000327.tif33108 (In the formula, n1 is 0 to 2, n2 is 0 to 1, and n3 is 0 to 3. R 11 ~R 13 is a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms. X 1 ~X 3 is *-O-X A1 -, or *-X A2 (-R 14 )-C(=O)-. X A1 is a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms. X A2 is nitrogen or sulfur. R 14 is a hydrogen atom, a halogen atom, or a hydrocarbyl group having 1 to 20 carbon atoms.)
Owner:SHIN ETSU CHEMICAL CO LTD

Photosensitive resin composition and use thereof

PendingCN122284212AQuinoxalinePolymer science
This invention provides a photosensitive resin composition and its application. The photosensitive resin composition comprises: (1) an alkali-soluble polymer A, (2) a compound B having an olefinic unsaturated double bond, and (3) a quinoxaline photoinitiator C having the structure shown in general formula (I). The photosensitive resin composition of this invention has good compatibility, excellent photosensitivity, and low amount of developing waste, and can be widely used in dry film and wet film applications.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +1

Fluoride-free onium salt type photoacid generator, preparation method thereof and photoresist composition

The invention relates to the technical field of photosensitizers, in particular to a fluoride-free onium salt type photoacid generator, a preparation method of the fluoride-free onium salt type photoacid generator and a chemical amplification type photoresist composition. The onium salt type comprises a sulfonium salt type and an iodonium salt type, and the application of fluoride-free anion design in different cation structures is expanded. The onium salt acid generator is stable in structure, high in photosensitivity, free of fluorine elements, suitable for KrF and ArF wavelength photoetching processes of 248 nm and 193 nm and applied to a photoresist composition, and obtained photoresist has high resolution, good photosensitivity and excellent thermal stability and etching resistance.
Owner:HUBEI THREE GORGES LAB

Shooting method, electronic equipment and storage medium

The invention provides a shooting method, electronic equipment and a storage medium, relates to the field of electronic equipment, and can avoid stroboflash in a video shooting process. The method is applied to the electronic equipment comprising a first camera and a second camera, the sensitivity of the second camera is smaller than that of the first camera, and the shooting area of the second camera comprises the shooting area of the first camera. The method comprises the steps that in response to operation of a user, a first camera is used for collecting a video, and the video comprises a plurality of image frames; determining that the video has stroboflash based on the exposure statistical data of the image frame; determining that the ambient light brightness is greater than a brightness threshold, switching the first camera to a second camera, the exposure duration of the second camera being a positive integer multiple of the light source period of the light source; the light source is a light source causing the stroboflash.
Owner:HONOR DEVICE CO LTD

Low-sensitivity and stable-inclination-angle photo-alignment liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display element

The invention provides a liquid crystal alignment agent, a liquid crystal alignment film and a liquid crystal display element, the liquid crystal alignment agent comprises polyimide, polyamide acid or polyamide acid ester and a stabilizer containing two maleimide groups, and the polyimide, the polyamide acid or the polyamide acid ester and the stabilizer are obtained by reacting a diamine component composed of basic diamine and specific diamine with a tetracarboxylic dianhydride component. The liquid crystal aligning agent can generate a high and stable pretilt angle, is insensitive to small changes of an exposure angle, and has high tolerance to light product amount, so that the pretilt angle of a liquid crystal alignment film and a liquid crystal display element prepared from the liquid crystal aligning agent does not relax, and the liquid crystal aligning agent has good thermal stability. The FDV Mura defect caused by UV2A alignment is remarkably improved by reducing the photosensitivity of the liquid crystal alignment agent, improving the reaction uniformity and optimizing the pretilt angle performance, so that the high-quality and high-performance liquid crystal display element can be manufactured, and the method has a wide prospect in the aspects of large-scale production and commercial application.
Owner:SHENZHEN DALTON ELECTRONICS MATERIAL CO LTD

Image sensor and image sensing system including the same

An image sensor includes a first pixel block including first pixel groups arranged in a Bayer pattern; and a second pixel block disposed adjacent to the first pixel block in a first direction and configured to include second pixel groups arranged in the Bayer pattern. Each of the first pixel groups and the second pixel groups includes first pixels and second pixels that are disposed in columns or rows and have different photosensitivities, and the first pixels included in the first pixel groups and the first pixels included in the second pixel groups are located at opposite positions to be disposed at different columns or different rows of the corresponding pixel groups.
Owner:SK HYNIX INC

Colored photosensitive resin composition and color filter

The invention provides a colored photosensitive resin composition and a color filter, and relates to the technical field of liquid crystal display. The coloring photosensitive resin composition is prepared from the following raw materials in percentage by mass: 40 to 60 percent of coloring agent, 2.5 to 4.5 percent of alkali-soluble resin, 2 to 3.5 percent of acrylate monomer, 0.05 to 0.1 percent of photopolymerization initiator, 0.02 to 0.03 percent of auxiliary agent and 35 to 52 percent of solvent, wherein the total mass of the raw materials is 100 percent; wherein the coloring agent is prepared from the following raw materials in percentage by mass: 8.3 to 9.8 percent of aluminum phthalocyanine dye, 17.7 to 18.5 percent of Y150 and 26 to 28.3 percent of G-Dye, wherein the total mass of the raw materials of the colored photosensitive resin composition is 100 percent. According to the invention, through collaborative optimization configuration of the components, relatively good sensitivity and developing performance can be maintained. The exposure area is fully cured, the non-exposure area is thoroughly dissolved, and the problems of non-contour line part residue and sheet-shaped object stripping are avoided.
Owner:FUYANG SINEVA MATERIAL TECHNOLOGY CO LTD

Melamine-free alkaline developable resin composition, dry film, cured product, and electronic component having cured product

Provided are: a melamine-free alkaline developable resin composition which has excellent pencil hardness, acid resistance, metal plating resistance, alkali resistance, and solvent resistance in a cured product thereof, and which has excellent drying management range, sensitivity, and resolution; a dry film; a cured product; and an electronic component having the cured product. The composition contains an epoxy resin, a carboxyl-containing vinyl ester resin, a photopolymerization initiator, a photosensitive monomer, an inorganic filler and a hydroxyl-containing compound component, and the carboxyl-containing vinyl ester resin and the inorganic filler, and the epoxy resin and the photosensitive monomer are respectively contained in different resin compositions. The hydroxyl group-containing compound component has a pH value of 4.0 or more and 5.5 or less, the hydroxyl group-containing compound component contains a hydroxyl group-containing compound having at least one hydroxyl group in the molecule, and the content of the hydroxyl group-containing compound component is 1.2-7.8 parts by mass per 100 parts by mass of the carboxyl group-containing vinyl ester resin in terms of solid content.
Owner:TAIYO INK SUZHOU

Imaging apparatus, video processing method, and video processing apparatus

To enable high-sensitivity photographing in an imaging apparatus without a slow shutter function, and to suppress deterioration in video quality accompanying the high-sensitivity photographing.SOLUTION: There is provided an imaging device including a signal processing unit that applies a filtering process to a video frame generated from an output signal of an image sensor, a first black level correction unit that applies black level correction to the video frame after the application of the filtering process, and a frame storage unit that outputs a high-luminance video frame generated using a plurality of video frames after the application of the black level correction when a high-sensitivity imaging function is turned on.SELECTED DRAWING: Figure 1
Owner:IKEGAMI TSUSHINKI

Motion camera real-time optical filter modulation system and method based on motion perception

The invention discloses a motion camera real-time optical filter modulation system and method based on motion perception. The system comprises an illumination sensor module, a motion sensor module, an image analysis module, a central control unit and an optical imaging module. The method comprises the following steps that S1, a central control unit initializes an e-ND filter to be in a full-transparent state, obtains a recording frame rate and reference sensitivity, receives an exposure value EVcur, a three-axis acceleration Acc, a rotation angular velocity Gyro and a motion vector module value Vflow at the same time, and calculates a motion intensity index of a camera; s2, the central control unit judges whether the current shooting mode of the camera is a conventional automatic exposure mode or a speed streamline shooting mode through the value of the set flag bit according to the comparison result of the exercise intensity index and a set threshold value. According to the invention, the requirement that a picture shot by a motion camera lacks a speed sense can be solved, and e-ND filter adjustment seamless shooting is realized.
Owner:WUXI CITY COLLEGE OF VOCATIONAL TECH

A photosensitive resin composition, a method for preparing the same, and a method for using the same

PendingCN122284213APolymer scienceDouble bond
This invention provides a photosensitive resin composition, its preparation method, and its applications. The photosensitive resin composition comprises the following components: (A) a hexaaryl-bisimidazole mixed photoinitiator; (B) a base-soluble polymer; (C) a compound having olefinic unsaturated double bonds; and (D) a hydrogen donor. The photosensitive resin composition of this invention exhibits excellent compatibility, high photosensitivity, good resolution and developability, and excellent hydrophilicity, allowing for the reuse of the developer solution and preventing filter clogging by developing debris. Its overall performance advantages are significant.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +2

Fluorine-free photosensitive resin composition and patterned cured product

The invention relates to a fluorine-free photosensitive resin composition, which comprises fluorine-free polyimide resin and a photosensitizer, and is characterized in that the structure of the photosensitizer is as shown in formula (1): R1 represents alkyl containing hydrogen atoms or oxygen atoms and having 1-10 carbon atoms, and comprises one or a combination of a straight chain, a branched chain, alicyclic hydrocarbon and aromatic hydrocarbon; the functional groups formed by the oxygen atoms comprise one or a combination of more of hydroxyl, carboxyl and ether bonds. The photosensitizer provided by the invention is a bifunctional azide compound, has high photosensitivity and good solubility difference before and after exposure, and can effectively improve the photosensitivity and resolution of the fluoride-free photosensitive resin composition.
Owner:WUHAN ROUXIAN SCIENCE & TECHNOLOGY CO LTD +2

Photosensitive resin composition, and preparation method therefor and use thereof

PCT designated stageWO2026138434A1Polymer scienceImage resolution
The present application provides a photosensitive resin composition, and a preparation method therefor and a use thereof. The photosensitive resin composition comprises the following components: (A) a hexaarylbiimidazole mixed photoinitiator; (B) an alkali-soluble polymer; (C) a compound having an ethylenically unsaturated double bond; and (D) a hydrogen donor. The photosensitive resin composition of the present application has excellent compatibility, high photosensitivity, good resolution and developability, and excellent hydrophilicity, so that developing solutions can be reused, no filter screen clogging by development residues will be caused, and significant overall application performance advantages are provided.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +1

Hybrid sensor, camera module, and electronic device

PCT designated stageWO2026086338A1ParallaxImage resolution
The present application relates to the field of sensors. Disclosed are a hybrid sensor, a camera module, and an electronic device. The hybrid sensor comprises: a second photosensitive layer and a first photosensitive layer, which are arranged in sequence in a thickness direction in one pixel region corresponding to the second photosensitive layer, wherein the second photosensitive layer and the first photosensitive layer are both used for receiving light rays and generating charges, and the charges generated by the first photosensitive layer and the second photosensitive layer are used for implementing RGB imaging and / or event signal monitoring. On the basis of the solutions of the present application, both an event signal monitoring function and an imaging function can be implemented in the same pixel of the same sensor, with no parallax and without affecting photosensitivity or resolution; and no motion blur is generated even when a high-speed moving photographed object is to be photographed in a dark-light scenario.
Owner:HONOR DEVICE CO LTD

Hybrid sensor, camera module and electronic equipment

PendingCN121967912AImage resolutionEngineering
The invention discloses a hybrid sensor, a camera module and electronic equipment, and relates to the field of sensors, and the image sensor comprises a second photosensitive layer and a first photosensitive layer which are sequentially arranged in a pixel region corresponding to the second photosensitive layer along the thickness direction, and the second photosensitive layer and the first photosensitive layer are both used for receiving light and generating charges; and charges generated by the first photosensitive layer and the second photosensitive layer are used for realizing RGB imaging and / or event signal monitoring. Based on the scheme of the invention, event signal monitoring and imaging functions can be simultaneously realized in the same pixel of the same sensor, and no visual angle difference exists, and the sensitivity and the resolution are not influenced; when a shooting object moving at a high speed is shot in a dark light scene, motion blur is not generated.
Owner:HONOR DEVICE CO LTD

Image sensor and electronic device

To provide an image sensor and an electronic device in order to increase photosensitivity, improve utilization of light incident on the image sensor, and reduce crosstalk of a band tube.SOLUTION: The image sensor includes at least one photosensitive pixel, and each photosensitive pixel includes a plurality of nano-antenna layers 201. The plurality of nano-antenna layers are arranged in an overlapping manner. Each of the nano antenna layers may include at least one nano antenna 2011. The at least one nano-antenna generates resonance for incident light. Different nano-antenna layers generate resonances for different bands or different polarization directions of incident light. An output signal of the nano antenna layer may be used to obtain an image.SELECTED DRAWING: Figure 3
Owner:HUAWEI TECH CO LTD

An acrylic ester copolymer containing a side chain double bond, a photosensitive resin composition, a photosensitive dry film, and a preparation method and application thereof

PendingCN122381235APolymer scienceSide chain
The present application relates to the technical field of photosensitive dry film, and particularly relates to an acrylic ester copolymer containing a side chain double bond, a photosensitive resin composition, a photosensitive dry film and a preparation method and application thereof, the composition comprising the acrylic ester copolymer containing a side chain double bond, a multifunctional polymerizable monomer, a free radical photoinitiator and a cationic photoinitiator. The acrylic ester copolymer has an acid value of 90-110 mgKOH / g, a double bond equivalent of 300-3000 g / mol, and a side chain containing a carbon-carbon unsaturated double bond capable of participating in free radical crosslinking. The present application adopts a free radical-cationic dual curing system, and the volume shrinkage rate of the cured product is less than or equal to 5%. The obtained photosensitive dry film has a photosensitivity of 15-20 mJ / cm2, a resolution L / S of less than or equal to 15 microns, and a Tg of greater than or equal to 155 DEG C, and is suitable for the fields of high-precision printed circuit board manufacturing and semiconductor packaging.
Owner:SUZHOU SHIHUA NEW MATERIAL TECH

Electroplating-resistant composition, dry film and cured product thereof, and electrode of solar cell

Provided are an anti-plating composition and a dry film which have low exposure energy and high sensitivity, and a cured product which is formed therefrom, has excellent plating resistance, high resolution, and is free of lateral erosion and diffusion plating, and an electrode of a solar cell using the same. The electroplating-resistant composition comprises (A) a carboxyl group-containing resin, (B) a photosensitive monomer and (C) a photopolymerization initiator, and the photopolymerization initiator (C) comprises 4, 4 '-diphenyl-1, 3, 4, 5-tetramethyl-1, 3, 5-tetramethyl-1, the invention relates to an oxime ester photopolymerization initiator, which is prepared from 4, 4 '-bis (diethylamino) benzophenone, 2-isopropyl thioxanthone, 2, 4, 6-trimethylbenzoyl diphenyl phosphine oxide, 2-methyl-1-(4-methylthiophenyl)-2-morpholinyl propane-1-one and an oxime ester photopolymerization initiator as shown in a formula (1),
Owner:TAIYO INK SUZHOU

Apparatus and method for automatically controlling signal strength of direct time-of-flight sensor system

The application discloses a device and a method for automatically controlling signal intensity of a direct time-of-flight 3D sensing system, the device comprising: a controller coupled with a transmitting device and a receiving device, and configured to adjust at least one of light intensity of the transmitting device, photosensitivity of the receiving device, and signal-to-noise ratio of a measurement result according to a signal histogram; the transmitting device coupled with the controller and configured to emit light; and the receiving device coupled with the controller and configured to receive light reflected by a measured object and generate a signal histogram.
Owner:SHITONG (SHANGHAI) MICROELECTRONICS TECH CO LTD

Target area photometry and exposure mapping method and system in transmission tower inspection

The present application relates to the technical field of computer vision and unmanned aerial vehicle inspection, in particular to a target area photometry and exposure mapping method and system in transmission tower inspection. The method comprises determining the target area of key components of the tower and its outer expansion ring background area, calculating the target brightness statistics and highlight risk index in the target area, and calculating the exposure compensation in combination with the background brightness statistics; under the constraints of the upper limit of shutter time and the upper limit of sensitivity, the exposure compensation is quickly mapped to the target shutter time, target sensitivity and target exposure compensation value; the mapping parameters are subjected to step limitation, exponential smoothing and hysteresis processing to obtain the exposure parameters; when the exposure is stable and the image quality meets the conditions, a photograph trigger signal is output, forming a continuous closed-loop control. The present application solves the problems of uncontrollable exposure, slow convergence and easy oscillation of the traditional method in strong reflection and high dynamic range scenes, and improves the inspection image quality and defect recognition reliability.
Owner:STATE GRID JIANGXI ELECTRIC POWER CO LTD RES INST