59 results about "Photosensitiveness" patented technology

The application provides a polyhydroxy phenolic compound, a preparation method thereof, a diazonium naphthoquinone sulfonate, a preparation method thereof and a photoresist composition. The polyhydroxy phenolic compound has the following structure shown in formula (I). The diazonium naphthoquinone sulfonate prepared by using the polyhydroxy phenolic compound provided by the application as an intermediate is applied to the photoresist composition as a photosensitive agent, and the obtained photoresist not only has clear resolution and high photosensitivity, but also has excellent thermal stability and etching resistance, and has a wide application prospect in the field of semiconductors.

The invention provides a photosensitive resin composition containing an acridine methylene quaternary ammonium salt photosensitizer and application of the photosensitive resin composition, quaternary ammonium group substituted methylene is introduced to the ninth position of a structural main body acridine ring of the photosensitizer, and acid radical or halogen is adopted as equilibrium anion. According to the photosensitizer, a quaternary ammonium salt group is introduced to the 9 site of an acridine ring, so that the problems that a traditional 9-phenylacridine photosensitizer is poor in compatibility, prone to crystallization and precipitation, insufficient in water solubility, weak in antistatic performance and the like in a formula are effectively solved. The photosensitive resin composition disclosed by the invention shows excellent dispersion stability, high sensitivity and high resolution, and can be used for remarkably reducing precipitates in a developing process and reducing poor lamination caused by static accumulation. The photosensitive dry film prepared based on the composition is suitable for fine pattern manufacturing in the fields of dry films, paints, coatings, printing ink, forming materials and the like, and has high yield and production efficiency.

The present application provides a modified color dye, its preparation method and application. The composition of the present application contains the modified color dye, and the structure contains a naphthalene sulfonic acid group. Compared with conventional color dyes, the modified color dye can form a hydrogen bond with the oxygen atom in the photosensitive combination. On the other hand, the modified color dye has a large molecular weight and a small binding force with aluminum. After development, there is no residual color in the blank area. The modified color dye has the characteristics of high photosensitivity and mild development conditions, thereby effectively improving the dot quality of the plate material, which is beneficial to ensure the image reproduction and precision. At the same time, due to the mild development conditions, the amount of sludge residue after development is greatly reduced.

The invention relates to the field of photocuring new material chemicals, in particular to composition of a novel photoinitiator mixture system, application of the novel photoinitiator mixture system as a photoinitiator in an ethylenically-bond-containing unsaturated radiation polymerization system and the ethylenically-bond-containing unsaturated radiation polymerization system containing the photoinitiator mixture component. The novel photoinitiator mixture system disclosed by the invention is widely suitable for emerging long-wavelength high-photosensitivity low-energy curing application scenes represented by high-end PCB (Printed Circuit Board) photoresist.

The invention relates to a high-sensitivity treatment-free negative image CTP plate material and a preparation method thereof, and belongs to the technical field of CTP plate materials, the treatment-free negative image CTP plate material comprises a plate base and a photosensitive layer, the photosensitive layer contains a modified graphene oxide composite material, the modified graphene oxide composite material can promote rapid conduction of heat, strengthen scratch resistance and improve the sensitivity of the photosensitive layer, and the modified graphene oxide composite material is essentially formed by compounding an infrared absorption dye new indocyanine green onto nitrogen-aluminum co-doped graphene oxide, so that the infrared absorption dye new indocyanine green can be effectively absorbed by the nitrogen-aluminum co-doped graphene oxide; the specific preparation method comprises the following steps: doping nitrogen and aluminum elements in graphene oxide by using urea and aluminum nitrate nonahydrate to prepare nitrogen-aluminum co-doped graphene oxide, and then adding amino-modified new indocyanine green to react by taking dehydration esterification as a reaction principle, thereby obtaining the nitrogen-aluminum co-doped graphene oxide. The amino-modified novel indocyanine green is prepared from a short-carbon-chain diamine compound and novel indocyanine green under the action of amino and halogen.

This disclosure provides embodiments of a low-light image enhancement method, apparatus, electronic device, and computer-readable medium. One specific implementation of the method includes: acquiring an initial low-light image; performing image quality detection processing on the initial low-light image; in response to determining that the image quality detection information does not meet preset detection conditions, sending exposure adjustment information corresponding to the image quality detection information to a low-light camera device to adjust the sensitivity and exposure time of the low-light camera device; and acquiring the low-light image again using the adjusted low-light camera device; obtaining a normal-light reference image; inputting the normal-light reference image into a reference image feature extraction cooperative network of a pre-trained low-light image enhancement model; and inputting the low-light image and reference image feature information into an image enhancement association network to obtain an enhanced low-light image corresponding to the low-light image. This implementation improves the image quality and image sharpness of the enhanced low-light image.

This application relates to the field of terminals, and more particularly to a shooting method, electronic device, and storage medium. The method includes: the electronic device displaying a shooting preview interface. Then, in a first shooting scenario, in response to a user's first operation, the electronic device captures a first blurred image. Next, in the same first shooting scenario, in response to a user's second operation, the electronic device captures a second blurred image. The degree of blurring in the second blurred image is greater than that in the first blurred image; the first blurred image corresponds to a first ISO sensitivity, and the second blurred image corresponds to a second ISO sensitivity; the second ISO sensitivity is greater than the first ISO sensitivity. In this method, the electronic device can flexibly adjust the degree of blurring of the blurred image according to the ISO sensitivity. Furthermore, using the above method can improve the blurring effect of the blurred image captured by the electronic device, enhancing the aesthetics of the blurred photo.

To provide a photosensitive resin composition capable of realizing a photosensitive resin layer excellent in desired properties (particularly, sensitivity, resolution, and adhesion). 【Solution means】A photosensitive resin composition containing the following components: (A) an alkali-soluble polymer; (B) a compound having an ethylenically unsaturated bond; (C) a polymerization initiator; and (D) a polymerization inhibitor, wherein the content of component (C) is 3.5% by mass or more based on the total solid content of the photosensitive resin composition, and component (D) is represented by the following general formula (I): JPEG2026060536000018.jpg2250 [In formula (I), R 1 represents a hydrocarbon group which may have a substituent, NHR 4 or NR 4 R 5 where R 4 and R 5 each independently represent a hydrocarbon group which may have a substituent.], a photosensitive resin composition containing a compound having a nitroso structure.

The present disclosure relates to an image processing method and device, electronic equipment and storage medium. The image processing method comprises: acquiring a collection image with an ambient illumination less than a preset illumination; acquiring analog gains corresponding to a plurality of sensitivities and dark field frame images corresponding to the plurality of sensitivities; the dark field frame images are acquired under the condition of no incident ambient light; and based on the analog gains, the dark field frame images and the collection image, noise images corresponding to the collection image under the plurality of sensitivities are obtained. According to the embodiments of the present disclosure, noise images in a dark light scene can be obtained.

The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.

Provided is a non-chemically amplified resist composition that is excellent in sensitivity and limit resolution in photolithography using high-energy rays, particularly in electron beam (EB) lithography and EUV lithography. 【Solution means】A resist composition characterized by containing at least one hypervalent iodine compound, a carboxy group-containing compound, and a solvent selected from the following formulas (1), (2), and (3). TIFF2026122764000327.tif33108 (In the formula, n1 is 0 to 2, n2 is 0 to 1, and n3 is 0 to 3. R 11 ~R 13 is a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms. X 1 ~X 3 is *-O-X A1 -, or *-X A2 (-R 14 )-C(=O)-. X A1 is a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms. X A2 is nitrogen or sulfur. R 14 is a hydrogen atom, a halogen atom, or a hydrocarbyl group having 1 to 20 carbon atoms.)

The invention belongs to the technical field of high polymer materials, and particularly relates to high photosensitive resin for PCB circuit ink and a preparation method of the high photosensitive resin. The method comprises the following steps: 1) uniformly mixing an ester compound, an acid ester compound and polyphenol in proportion to prepare a premixed monomer; 2) mixing the composite photoinitiator and the premixed monomer in proportion, and stirring to prepare a precursor; 3) uniformly mixing the precursor and a carboxylic acid compound in proportion, and stirring to prepare an optimized base material; and 4) deaerating the optimized base material under reduced pressure, and filtering to prepare the high-photosensitive resin. According to the invention, a novel PCB circuit ink photosensitive resin system with high sensitivity, high resolution, excellent chemical resistance and excellent thermal mechanical properties is successfully developed through a multi-dimensional collaborative strategy of molecular structure design, photo-initiation system optimization, cross-linked network construction and process parameter control; and a key material support is provided for sustainable development of a high-density interconnection technology.

Embodiments of this application relate to the technical field of video shooting, and provide a video processing method and apparatus, an electronic device, and a storage medium. The video processing method includes: determining one video style template among a plurality of video style templates, where each video style template is corresponding to a preset look up table LUT; obtaining a video shot through a camera lens; processing the video shot through the camera lens by using a logarithm LOG curve corresponding to a current photosensitivity ISO of the camera lens, to obtain a LOG video; and processing the LOG video based on a LUT corresponding to the determined video style template, to obtain a video corresponding to the determined video style template.

This invention provides a photosensitive resin composition and its application. The photosensitive resin composition comprises: (1) an alkali-soluble polymer A, (2) a compound B having an olefinic unsaturated double bond, and (3) a quinoxaline photoinitiator C having the structure shown in general formula (I). The photosensitive resin composition of this invention has good compatibility, excellent photosensitivity, and low amount of developing waste, and can be widely used in dry film and wet film applications.

The invention relates to the technical field of photosensitizers, in particular to a fluoride-free onium salt type photoacid generator, a preparation method of the fluoride-free onium salt type photoacid generator and a chemical amplification type photoresist composition. The onium salt type comprises a sulfonium salt type and an iodonium salt type, and the application of fluoride-free anion design in different cation structures is expanded. The onium salt acid generator is stable in structure, high in photosensitivity, free of fluorine elements, suitable for KrF and ArF wavelength photoetching processes of 248 nm and 193 nm and applied to a photoresist composition, and obtained photoresist has high resolution, good photosensitivity and excellent thermal stability and etching resistance.

The present application provides a phenolic compound, a preparation method, an application thereof, and a photoresist, belonging to the field of photolithography technology. The phenolic compound of the present application can improve the resolution of the photoresist and at the same time make the photoresist have better photolithography performance, specifically manifested in better sensitivity, greater contrast, a morphology with a more vertical sidewall angle, and a larger process window. The photoresist comprises 10 to 30 wt% of a phenolic resin, 2 to 10 wt% of a diazonaphthoquinone sensitizer, 0.1 to 5 wt% of a leveling agent, 40 to 80 wt% of a solvent, and 0.1 to 10 wt% of a phenolic compound.

The invention provides a shooting method, electronic equipment and a storage medium, relates to the field of electronic equipment, and can avoid stroboflash in a video shooting process. The method is applied to the electronic equipment comprising a first camera and a second camera, the sensitivity of the second camera is smaller than that of the first camera, and the shooting area of the second camera comprises the shooting area of the first camera. The method comprises the steps that in response to operation of a user, a first camera is used for collecting a video, and the video comprises a plurality of image frames; determining that the video has stroboflash based on the exposure statistical data of the image frame; determining that the ambient light brightness is greater than a brightness threshold, switching the first camera to a second camera, the exposure duration of the second camera being a positive integer multiple of the light source period of the light source; the light source is a light source causing the stroboflash.

The application discloses a camphorsulfonate-based flavone photoacid generator and a preparation method thereof. 16 fatty alkyl, C1-C 16 fatty alkoxy, dimethylamino or phenyl. The camphorsulfonate-based flavone photoacid generator prepared by the application realizes long-wave absorption based on a flavone nucleus, has strong absorption to 248nm and 365nm UV LED light sources, and has high photosensitivity. The camphorsulfonate-based flavone photoacid generator contains a camphorsulfonate group which is directly connected with a flavone aromatic ring. The structure has photosensitive cleavage characteristics, and strong acid camphorsulfonic acid is generated by photolysis. Because the van der Waals volume of camphorsulfonic acid is large, the diffusion of camphorsulfonic acid is slow, and therefore the diffusion in a resin matrix is poor, so that better resolution and line edge roughness can be obtained.

The invention provides a liquid crystal alignment agent, a liquid crystal alignment film and a liquid crystal display element, the liquid crystal alignment agent comprises polyimide, polyamide acid or polyamide acid ester and a stabilizer containing two maleimide groups, and the polyimide, the polyamide acid or the polyamide acid ester and the stabilizer are obtained by reacting a diamine component composed of basic diamine and specific diamine with a tetracarboxylic dianhydride component. The liquid crystal aligning agent can generate a high and stable pretilt angle, is insensitive to small changes of an exposure angle, and has high tolerance to light product amount, so that the pretilt angle of a liquid crystal alignment film and a liquid crystal display element prepared from the liquid crystal aligning agent does not relax, and the liquid crystal aligning agent has good thermal stability. The FDV Mura defect caused by UV2A alignment is remarkably improved by reducing the photosensitivity of the liquid crystal alignment agent, improving the reaction uniformity and optimizing the pretilt angle performance, so that the high-quality and high-performance liquid crystal display element can be manufactured, and the method has a wide prospect in the aspects of large-scale production and commercial application.

An image sensor includes a first pixel block including first pixel groups arranged in a Bayer pattern; and a second pixel block disposed adjacent to the first pixel block in a first direction and configured to include second pixel groups arranged in the Bayer pattern. Each of the first pixel groups and the second pixel groups includes first pixels and second pixels that are disposed in columns or rows and have different photosensitivities, and the first pixels included in the first pixel groups and the first pixels included in the second pixel groups are located at opposite positions to be disposed at different columns or different rows of the corresponding pixel groups.

The invention provides a colored photosensitive resin composition and a color filter, and relates to the technical field of liquid crystal display. The coloring photosensitive resin composition is prepared from the following raw materials in percentage by mass: 40 to 60 percent of coloring agent, 2.5 to 4.5 percent of alkali-soluble resin, 2 to 3.5 percent of acrylate monomer, 0.05 to 0.1 percent of photopolymerization initiator, 0.02 to 0.03 percent of auxiliary agent and 35 to 52 percent of solvent, wherein the total mass of the raw materials is 100 percent; wherein the coloring agent is prepared from the following raw materials in percentage by mass: 8.3 to 9.8 percent of aluminum phthalocyanine dye, 17.7 to 18.5 percent of Y150 and 26 to 28.3 percent of G-Dye, wherein the total mass of the raw materials of the colored photosensitive resin composition is 100 percent. According to the invention, through collaborative optimization configuration of the components, relatively good sensitivity and developing performance can be maintained. The exposure area is fully cured, the non-exposure area is thoroughly dissolved, and the problems of non-contour line part residue and sheet-shaped object stripping are avoided.

Provided are: a melamine-free alkaline developable resin composition which has excellent pencil hardness, acid resistance, metal plating resistance, alkali resistance, and solvent resistance in a cured product thereof, and which has excellent drying management range, sensitivity, and resolution; a dry film; a cured product; and an electronic component having the cured product. The composition contains an epoxy resin, a carboxyl-containing vinyl ester resin, a photopolymerization initiator, a photosensitive monomer, an inorganic filler and a hydroxyl-containing compound component, and the carboxyl-containing vinyl ester resin and the inorganic filler, and the epoxy resin and the photosensitive monomer are respectively contained in different resin compositions. The hydroxyl group-containing compound component has a pH value of 4.0 or more and 5.5 or less, the hydroxyl group-containing compound component contains a hydroxyl group-containing compound having at least one hydroxyl group in the molecule, and the content of the hydroxyl group-containing compound component is 1.2-7.8 parts by mass per 100 parts by mass of the carboxyl group-containing vinyl ester resin in terms of solid content.

To enable high-sensitivity photographing in an imaging apparatus without a slow shutter function, and to suppress deterioration in video quality accompanying the high-sensitivity photographing.SOLUTION: There is provided an imaging device including a signal processing unit that applies a filtering process to a video frame generated from an output signal of an image sensor, a first black level correction unit that applies black level correction to the video frame after the application of the filtering process, and a frame storage unit that outputs a high-luminance video frame generated using a plurality of video frames after the application of the black level correction when a high-sensitivity imaging function is turned on.SELECTED DRAWING: Figure 1

The invention discloses a motion camera real-time optical filter modulation system and method based on motion perception. The system comprises an illumination sensor module, a motion sensor module, an image analysis module, a central control unit and an optical imaging module. The method comprises the following steps that S1, a central control unit initializes an e-ND filter to be in a full-transparent state, obtains a recording frame rate and reference sensitivity, receives an exposure value EVcur, a three-axis acceleration Acc, a rotation angular velocity Gyro and a motion vector module value Vflow at the same time, and calculates a motion intensity index of a camera; s2, the central control unit judges whether the current shooting mode of the camera is a conventional automatic exposure mode or a speed streamline shooting mode through the value of the set flag bit according to the comparison result of the exercise intensity index and a set threshold value. According to the invention, the requirement that a picture shot by a motion camera lacks a speed sense can be solved, and e-ND filter adjustment seamless shooting is realized.

To provide a photosensitive composition that allows formation of a cured film having high sensitivity along with excellent heat resistance, bending resistance, and reworkability.SOLUTION: A photosensitive composition comprises a polymer component and a quinonediazide compound, wherein the polymer component includes a polymer (A) having a first structural unit and a second structural unit, the first structural unit having a cyclic ether structure and a methylene group bonded to a carbon atom constituting the cyclic ether structure in a main chain, the second structural unit being at least one selected from the group consisting of a structural unit derived from maleimide and a structural unit having an acid group, and the polymer (A) is contained in an amount of 25 mass% or more relative to the total amount of the polymer component.SELECTED DRAWING: None

The present invention aims to provide a positive-type photosensitive composition that exhibits excellent developability, such as sensitivity, suppression of developing residue, and developing film rate, and to provide a method for producing a patterned cured product using the positive-type photosensitive composition. [Solution] A method for producing a patterned cured product, comprising the steps of: applying a positive-type photosensitive composition onto a substrate to form a coating film; exposing the coating film to light; developing the exposed coating film; and heating the pattern after development, wherein the positive-type photosensitive composition contains a silsesquioxane having a structural unit (I) represented by the following formula (1). JPEG2026093369000060.jpg32170 (In equation (1) above, X is a base represented by a specific equation.)

This invention provides a photosensitive resin composition, its preparation method, and its applications. The photosensitive resin composition comprises the following components: (A) a hexaaryl-bisimidazole mixed photoinitiator; (B) a base-soluble polymer; (C) a compound having olefinic unsaturated double bonds; and (D) a hydrogen donor. The photosensitive resin composition of this invention exhibits excellent compatibility, high photosensitivity, good resolution and developability, and excellent hydrophilicity, allowing for the reuse of the developer solution and preventing filter clogging by developing debris. Its overall performance advantages are significant.

The invention relates to a fluorine-free photosensitive resin composition, which comprises fluorine-free polyimide resin and a photosensitizer, and is characterized in that the structure of the photosensitizer is as shown in formula (1): R1 represents alkyl containing hydrogen atoms or oxygen atoms and having 1-10 carbon atoms, and comprises one or a combination of a straight chain, a branched chain, alicyclic hydrocarbon and aromatic hydrocarbon; the functional groups formed by the oxygen atoms comprise one or a combination of more of hydroxyl, carboxyl and ether bonds. The photosensitizer provided by the invention is a bifunctional azide compound, has high photosensitivity and good solubility difference before and after exposure, and can effectively improve the photosensitivity and resolution of the fluoride-free photosensitive resin composition.

The present application provides a photosensitive resin composition, and a preparation method therefor and a use thereof. The photosensitive resin composition comprises the following components: (A) a hexaarylbiimidazole mixed photoinitiator; (B) an alkali-soluble polymer; (C) a compound having an ethylenically unsaturated double bond; and (D) a hydrogen donor. The photosensitive resin composition of the present application has excellent compatibility, high photosensitivity, good resolution and developability, and excellent hydrophilicity, so that developing solutions can be reused, no filter screen clogging by development residues will be caused, and significant overall application performance advantages are provided.