79 results about "Photosensitiveness" patented technology

A method and device for implementing high-dynamic range imaging, and an image processing system are provided. The device includes: an image sensor, a pixel array in the image sensor including a plurality of pixel units; and a column processing unit, including a gain control unit and an analog-to-digital conversion unit; where each pixel unit includes two photoelectric conversion units with different photosensitivity; and the gain control unit is configured to determine a brightness range of an image based on a signal voltage output by each pixel unit, and select the photoelectric conversion unit for signal conversion in each pixel unit, a charge-to-voltage conversion gain of each pixel unit and a voltage gain of the column processing unit based on the brightness range. With the method, device and system, the signal voltage allows to be read out only once, thereby shortening row readout time and increasing a frame rate.

The invention relates to an image motion detection method and device and electronic equipment, and the method comprises the steps: obtaining a long-term reference frame image and a current frame image, and enabling the long-term reference frame image to be updated through the multi-frame fusion of a historical frame image; obtaining a self-adaptive threshold value, wherein the self-adaptive threshold value is associated with the ISO of the current frame image; according to the long-term reference frame image, the current frame image, a self-adaptive threshold value and a plurality of preset window areas, obtaining the number of first motion areas; according to the first motion area number and a preset motion area number threshold value, an image motion detection result associated with the current frame image is obtained, and the image motion detection result is used for representing whether a moving shooting object appears in the video image at the moment when the current frame image is located. According to the method and the device, the detection accuracy and the wake-up rate can be ensured on the basis of low computing resources and storage resources, false alarms are reduced to the greatest extent, and the requirements of users are met in actual use.

The present invention provides an oxime ester photoinitiator, a photocurable resin composition and an application. The above-mentioned oxime ester photoinitiator has a structure shown in the general formula (I): compared with the existing oxime ester photoinitiators, the oxime ester photoinitiator with the general formula (I) structure has better stability, so under the irradiation of ultraviolet light, it can effectively suppress the generation and volatilization of small molecule fragments, and almost no overflow gas is generated after curing; at the same time, because the above-mentioned oxime ester photoinitiator has a specific substituent group, it has a strong ultraviolet absorption performance, thereby improving its sensitivity, and the oxime ester photoinitiator also has a high yellowing resistance. In addition, the oxime ester initiator with the structure shown in the general formula (I) can be used in a UV-LED light curing system, and is particularly suitable for initiation under the action of a 365nm light source.

The invention provides a sensitizer, a photosensitive resin composition, a photosensitive dry film and a preparation method thereof, the structure of the sensitizer is as shown in formula (I): # imgabs0 # (I), M1 is selected from-O-or-NR4-, and R4 is selected from H or methyl; q is a single bond or-(CHCH) n-, and n is an integer of 1 or more; r1 is selected from aryl and heteroaryl, or R1 is selected from aryl or heteroaryl substituted by at least one substituent group of halogen, nitryl, trifluoromethyl, cyano, C1-C4 alkanoyl, C1-C4 ester group, C1-C8 alkyl, C1-C4 alkoxy and # imgabs 1 #, or R1 is selected from aryl or heteroaryl substituted by at least one substituent group of halogen, nitryl, trifluoromethyl, cyano, C1-C4 alkanoyl, C1-C4 ester group, C1-C8 alkyl, C1-C4 alkoxy and # imgabs 1 #; and R3 is selected from H, halogen, C1-C8 alkyl groups or C1-C4 alkoxy groups. Based on the sensitizer provided by the invention, the problems of low resolution, high sensitivity and low adhesive ability of a photosensitive resin composition in the prior art are solved.

The application provides a polyhydroxy phenolic compound, a preparation method thereof, a diazonium naphthoquinone sulfonate, a preparation method thereof and a photoresist composition. The polyhydroxy phenolic compound has the following structure shown in formula (I). The diazonium naphthoquinone sulfonate prepared by using the polyhydroxy phenolic compound provided by the application as an intermediate is applied to the photoresist composition as a photosensitive agent, and the obtained photoresist not only has clear resolution and high photosensitivity, but also has excellent thermal stability and etching resistance, and has a wide application prospect in the field of semiconductors.

The invention provides a photosensitive resin composition containing an acridine methylene quaternary ammonium salt photosensitizer and application of the photosensitive resin composition, quaternary ammonium group substituted methylene is introduced to the ninth position of a structural main body acridine ring of the photosensitizer, and acid radical or halogen is adopted as equilibrium anion. According to the photosensitizer, a quaternary ammonium salt group is introduced to the 9 site of an acridine ring, so that the problems that a traditional 9-phenylacridine photosensitizer is poor in compatibility, prone to crystallization and precipitation, insufficient in water solubility, weak in antistatic performance and the like in a formula are effectively solved. The photosensitive resin composition disclosed by the invention shows excellent dispersion stability, high sensitivity and high resolution, and can be used for remarkably reducing precipitates in a developing process and reducing poor lamination caused by static accumulation. The photosensitive dry film prepared based on the composition is suitable for fine pattern manufacturing in the fields of dry films, paints, coatings, printing ink, forming materials and the like, and has high yield and production efficiency.

The preparation method comprises the following steps: adding silver acetylene-silver nitrate (SASN) into a 4, 4 ', 6, 6'-tetraazido hydrazine-1, 3, 5-triazine (THT) solution, uniformly stirring to obtain an SASN / THT suspension, removing a solvent, and drying to obtain the photosensitive high-energy composite material. The synthesis method is safe, simple, efficient and easy for industrial production. The addition of THT improves the photosensitivity of the composite material in the ultraviolet band, and improves the energy release at the same time. The photosensitive high-energy composite material not only solves the problem of insufficient light response performance of the traditional SASN, but also enhances the energy release effect through the high nitrogen characteristic of THT, and provides a better technical scheme for the application of the photosensitive high-energy composite material.

The present application provides a modified color dye, its preparation method and application. The composition of the present application contains the modified color dye, and the structure contains a naphthalene sulfonic acid group. Compared with conventional color dyes, the modified color dye can form a hydrogen bond with the oxygen atom in the photosensitive combination. On the other hand, the modified color dye has a large molecular weight and a small binding force with aluminum. After development, there is no residual color in the blank area. The modified color dye has the characteristics of high photosensitivity and mild development conditions, thereby effectively improving the dot quality of the plate material, which is beneficial to ensure the image reproduction and precision. At the same time, due to the mild development conditions, the amount of sludge residue after development is greatly reduced.

The invention relates to the field of photocuring new material chemicals, in particular to composition of a novel photoinitiator mixture system, application of the novel photoinitiator mixture system as a photoinitiator in an ethylenically-bond-containing unsaturated radiation polymerization system and the ethylenically-bond-containing unsaturated radiation polymerization system containing the photoinitiator mixture component. The novel photoinitiator mixture system disclosed by the invention is widely suitable for emerging long-wavelength high-photosensitivity low-energy curing application scenes represented by high-end PCB (Printed Circuit Board) photoresist.

The invention relates to a high-sensitivity treatment-free negative image CTP plate material and a preparation method thereof, and belongs to the technical field of CTP plate materials, the treatment-free negative image CTP plate material comprises a plate base and a photosensitive layer, the photosensitive layer contains a modified graphene oxide composite material, the modified graphene oxide composite material can promote rapid conduction of heat, strengthen scratch resistance and improve the sensitivity of the photosensitive layer, and the modified graphene oxide composite material is essentially formed by compounding an infrared absorption dye new indocyanine green onto nitrogen-aluminum co-doped graphene oxide, so that the infrared absorption dye new indocyanine green can be effectively absorbed by the nitrogen-aluminum co-doped graphene oxide; the specific preparation method comprises the following steps: doping nitrogen and aluminum elements in graphene oxide by using urea and aluminum nitrate nonahydrate to prepare nitrogen-aluminum co-doped graphene oxide, and then adding amino-modified new indocyanine green to react by taking dehydration esterification as a reaction principle, thereby obtaining the nitrogen-aluminum co-doped graphene oxide. The amino-modified novel indocyanine green is prepared from a short-carbon-chain diamine compound and novel indocyanine green under the action of amino and halogen.

This disclosure provides embodiments of a low-light image enhancement method, apparatus, electronic device, and computer-readable medium. One specific implementation of the method includes: acquiring an initial low-light image; performing image quality detection processing on the initial low-light image; in response to determining that the image quality detection information does not meet preset detection conditions, sending exposure adjustment information corresponding to the image quality detection information to a low-light camera device to adjust the sensitivity and exposure time of the low-light camera device; and acquiring the low-light image again using the adjusted low-light camera device; obtaining a normal-light reference image; inputting the normal-light reference image into a reference image feature extraction cooperative network of a pre-trained low-light image enhancement model; and inputting the low-light image and reference image feature information into an image enhancement association network to obtain an enhanced low-light image corresponding to the low-light image. This implementation improves the image quality and image sharpness of the enhanced low-light image.

This application relates to the field of terminals, and more particularly to a shooting method, electronic device, and storage medium. The method includes: the electronic device displaying a shooting preview interface. Then, in a first shooting scenario, in response to a user's first operation, the electronic device captures a first blurred image. Next, in the same first shooting scenario, in response to a user's second operation, the electronic device captures a second blurred image. The degree of blurring in the second blurred image is greater than that in the first blurred image; the first blurred image corresponds to a first ISO sensitivity, and the second blurred image corresponds to a second ISO sensitivity; the second ISO sensitivity is greater than the first ISO sensitivity. In this method, the electronic device can flexibly adjust the degree of blurring of the blurred image according to the ISO sensitivity. Furthermore, using the above method can improve the blurring effect of the blurred image captured by the electronic device, enhancing the aesthetics of the blurred photo.

To provide a photosensitive resin composition capable of realizing a photosensitive resin layer excellent in desired properties (particularly, sensitivity, resolution, and adhesion). 【Solution means】A photosensitive resin composition containing the following components: (A) an alkali-soluble polymer; (B) a compound having an ethylenically unsaturated bond; (C) a polymerization initiator; and (D) a polymerization inhibitor, wherein the content of component (C) is 3.5% by mass or more based on the total solid content of the photosensitive resin composition, and component (D) is represented by the following general formula (I): JPEG2026060536000018.jpg2250 [In formula (I), R 1 represents a hydrocarbon group which may have a substituent, NHR 4 or NR 4 R 5 where R 4 and R 5 each independently represent a hydrocarbon group which may have a substituent.], a photosensitive resin composition containing a compound having a nitroso structure.

The present disclosure relates to an image processing method and device, electronic equipment and storage medium. The image processing method comprises: acquiring a collection image with an ambient illumination less than a preset illumination; acquiring analog gains corresponding to a plurality of sensitivities and dark field frame images corresponding to the plurality of sensitivities; the dark field frame images are acquired under the condition of no incident ambient light; and based on the analog gains, the dark field frame images and the collection image, noise images corresponding to the collection image under the plurality of sensitivities are obtained. According to the embodiments of the present disclosure, noise images in a dark light scene can be obtained.

A method for preparing a silicon heterojunction solar cell comprises the following steps: 1) forming a plasma containing oxygen active group energy with carbon dioxide to form an oxide layer on the surface of a silicon wafer for passivating dangling bonds on the surface of the silicon wafer during PECVD chemical deposition; 2) continuing to deposit the silicon wafer with dangling bonds on the surface of the silicon wafer passivated in a gas atmosphere with a low hydrogen dilution ratio to provide abundant hydrogen for interface passivation; 3) bombarding the silicon wafer with argon plasma to break and reorganize silicon-silicon or silicon-hydrogen weak bonds in amorphous silicon, allowing free hydrogen atoms to diffuse to the interface and combine with dangling bonds on the surface of the silicon wafer, thereby reducing interface defect density and improving photosensitivity; and 4) introducing carbon dioxide as an oxygen source to continue deposition in a gas atmosphere with a high hydrogen dilution ratio to increase the bandgap width of amorphous silicon, reduce parasitic light absorption, and improve the photocurrent density of the solar cell, thereby effectively reducing the parasitic light absorption problem of intrinsic amorphous silicon and solving the problem of reduced photocurrent of heterojunction solar cells.

The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.

The invention provides a photosensitive polyimide resin composition, a cured film as well as a preparation method and application of the cured film. The composition comprises (A) 100 parts by weight of polyimide resin with a protecting group and a structural unit shown in a general formula (1), (B) 1-50 parts by weight of a photosensitizer and (C) 1-200 parts by weight of a thermal crosslinking agent, the photosensitive polyimide resin composition disclosed by the invention has the advantages that the light sensitivity, the mechanical property, the chemical resistance and the heat resistance of a polyimide resin film can be improved, and the photosensitive polyimide resin composition can be widely applied to organic electroluminescent display devices.

The present invention provides an imide sulfonate photoacid, an anti-corrosion composition, an electronic device and an application thereof. The imide sulfonate photoacid has the following structure, R 3 Selected from C 1 ‑C 20 A straight or branched alkyl group, C 1 ‑C 20 A straight or branched fluoroalkyl group, C 3 ‑C 20 Cycloalkyl, C 3 ‑C 20 Fluorinated cycloalkyl, C 6 ‑C 18 A substituted or unsubstituted aryl or camphor group. 3 The introduction of the group makes the imide sulfonate photoacid provided in the present application have higher photosensitivity and sensitivity, better thermal stability and chemical stability (such as amine stability) compared to the existing imide sulfonate photoacid, and has better compatibility with other components during the application process.

Provided is a non-chemically amplified resist composition that is excellent in sensitivity and limit resolution in photolithography using high-energy rays, particularly in electron beam (EB) lithography and EUV lithography. 【Solution means】A resist composition characterized by containing at least one hypervalent iodine compound, a carboxy group-containing compound, and a solvent selected from the following formulas (1), (2), and (3). TIFF2026122764000327.tif33108 (In the formula, n1 is 0 to 2, n2 is 0 to 1, and n3 is 0 to 3. R 11 ~R 13 is a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms. X 1 ~X 3 is *-O-X A1 -, or *-X A2 (-R 14 )-C(=O)-. X A1 is a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms. X A2 is nitrogen or sulfur. R 14 is a hydrogen atom, a halogen atom, or a hydrocarbyl group having 1 to 20 carbon atoms.)

The invention belongs to the technical field of high polymer materials, and particularly relates to high photosensitive resin for PCB circuit ink and a preparation method of the high photosensitive resin. The method comprises the following steps: 1) uniformly mixing an ester compound, an acid ester compound and polyphenol in proportion to prepare a premixed monomer; 2) mixing the composite photoinitiator and the premixed monomer in proportion, and stirring to prepare a precursor; 3) uniformly mixing the precursor and a carboxylic acid compound in proportion, and stirring to prepare an optimized base material; and 4) deaerating the optimized base material under reduced pressure, and filtering to prepare the high-photosensitive resin. According to the invention, a novel PCB circuit ink photosensitive resin system with high sensitivity, high resolution, excellent chemical resistance and excellent thermal mechanical properties is successfully developed through a multi-dimensional collaborative strategy of molecular structure design, photo-initiation system optimization, cross-linked network construction and process parameter control; and a key material support is provided for sustainable development of a high-density interconnection technology.

Embodiments of this application relate to the technical field of video shooting, and provide a video processing method and apparatus, an electronic device, and a storage medium. The video processing method includes: determining one video style template among a plurality of video style templates, where each video style template is corresponding to a preset look up table LUT; obtaining a video shot through a camera lens; processing the video shot through the camera lens by using a logarithm LOG curve corresponding to a current photosensitivity ISO of the camera lens, to obtain a LOG video; and processing the LOG video based on a LUT corresponding to the determined video style template, to obtain a video corresponding to the determined video style template.

This in-vehicle camera includes an infrared light source capable of projecting infrared light, a camera unit including a lens unit and an imaging device unit and having a sensitivity to a wavelength of the infrared light, and a board on which the infrared light source and the camera unit are mounted.

This invention provides a photosensitive resin composition and its application. The photosensitive resin composition comprises: (1) an alkali-soluble polymer A, (2) a compound B having an olefinic unsaturated double bond, and (3) a quinoxaline photoinitiator C having the structure shown in general formula (I). The photosensitive resin composition of this invention has good compatibility, excellent photosensitivity, and low amount of developing waste, and can be widely used in dry film and wet film applications.

The invention relates to the technical field of photosensitizers, in particular to a fluoride-free onium salt type photoacid generator, a preparation method of the fluoride-free onium salt type photoacid generator and a chemical amplification type photoresist composition. The onium salt type comprises a sulfonium salt type and an iodonium salt type, and the application of fluoride-free anion design in different cation structures is expanded. The onium salt acid generator is stable in structure, high in photosensitivity, free of fluorine elements, suitable for KrF and ArF wavelength photoetching processes of 248 nm and 193 nm and applied to a photoresist composition, and obtained photoresist has high resolution, good photosensitivity and excellent thermal stability and etching resistance.

The present application provides a phenolic compound, a preparation method, an application thereof, and a photoresist, belonging to the field of photolithography technology. The phenolic compound of the present application can improve the resolution of the photoresist and at the same time make the photoresist have better photolithography performance, specifically manifested in better sensitivity, greater contrast, a morphology with a more vertical sidewall angle, and a larger process window. The photoresist comprises 10 to 30 wt% of a phenolic resin, 2 to 10 wt% of a diazonaphthoquinone sensitizer, 0.1 to 5 wt% of a leveling agent, 40 to 80 wt% of a solvent, and 0.1 to 10 wt% of a phenolic compound.

The invention provides a shooting method, electronic equipment and a storage medium, relates to the field of electronic equipment, and can avoid stroboflash in a video shooting process. The method is applied to the electronic equipment comprising a first camera and a second camera, the sensitivity of the second camera is smaller than that of the first camera, and the shooting area of the second camera comprises the shooting area of the first camera. The method comprises the steps that in response to operation of a user, a first camera is used for collecting a video, and the video comprises a plurality of image frames; determining that the video has stroboflash based on the exposure statistical data of the image frame; determining that the ambient light brightness is greater than a brightness threshold, switching the first camera to a second camera, the exposure duration of the second camera being a positive integer multiple of the light source period of the light source; the light source is a light source causing the stroboflash.

The application discloses a camphorsulfonate-based flavone photoacid generator and a preparation method thereof. 16 fatty alkyl, C1-C 16 fatty alkoxy, dimethylamino or phenyl. The camphorsulfonate-based flavone photoacid generator prepared by the application realizes long-wave absorption based on a flavone nucleus, has strong absorption to 248nm and 365nm UV LED light sources, and has high photosensitivity. The camphorsulfonate-based flavone photoacid generator contains a camphorsulfonate group which is directly connected with a flavone aromatic ring. The structure has photosensitive cleavage characteristics, and strong acid camphorsulfonic acid is generated by photolysis. Because the van der Waals volume of camphorsulfonic acid is large, the diffusion of camphorsulfonic acid is slow, and therefore the diffusion in a resin matrix is poor, so that better resolution and line edge roughness can be obtained.

The invention provides a liquid crystal alignment agent, a liquid crystal alignment film and a liquid crystal display element, the liquid crystal alignment agent comprises polyimide, polyamide acid or polyamide acid ester and a stabilizer containing two maleimide groups, and the polyimide, the polyamide acid or the polyamide acid ester and the stabilizer are obtained by reacting a diamine component composed of basic diamine and specific diamine with a tetracarboxylic dianhydride component. The liquid crystal aligning agent can generate a high and stable pretilt angle, is insensitive to small changes of an exposure angle, and has high tolerance to light product amount, so that the pretilt angle of a liquid crystal alignment film and a liquid crystal display element prepared from the liquid crystal aligning agent does not relax, and the liquid crystal aligning agent has good thermal stability. The FDV Mura defect caused by UV2A alignment is remarkably improved by reducing the photosensitivity of the liquid crystal alignment agent, improving the reaction uniformity and optimizing the pretilt angle performance, so that the high-quality and high-performance liquid crystal display element can be manufactured, and the method has a wide prospect in the aspects of large-scale production and commercial application.

The invention provides a photosensitive resin composition, a photosensitive dry film, a cured film, a printed circuit board and a display module. The photosensitive resin composition is prepared from the following components in parts by weight: 100 to 115 parts of alkali-soluble resin, 5 to 20 parts of photopolymerization monomer, 3 to 10 parts of sulfydryl-terminated ester-containing compound, 1 to 5 parts of photoinitiator and 10 to 30 parts of epoxy resin, wherein the epoxy resin comprises sulfur-containing epoxy resin. By controlling the types and contents of the components of the photosensitive resin composition in the range, even if the curing time is short in the photocuring and thermocuring processes, the surface layer and the deep layer of a cured film can be uniformly cured, and meanwhile, the photosensitive resin composition also has high sensitivity, heat resistance and good developing performance.

An image sensor includes a first pixel block including first pixel groups arranged in a Bayer pattern; and a second pixel block disposed adjacent to the first pixel block in a first direction and configured to include second pixel groups arranged in the Bayer pattern. Each of the first pixel groups and the second pixel groups includes first pixels and second pixels that are disposed in columns or rows and have different photosensitivities, and the first pixels included in the first pixel groups and the first pixels included in the second pixel groups are located at opposite positions to be disposed at different columns or different rows of the corresponding pixel groups.