Continuous evaporation coating device of plasma with magnet

Abstract

The continuous evaporation coating equipment includes technological chamber, upper electrode, lower electrode, unwinding unit, winding unit and N / S pole magnet. The upper negative electrode and the lower negative electrode are set in the upper and the lower part inside the technological chamber separately and in certain interval; the unwinding unit on one side of the chamber provides material belt to between the upper electrode and the lower electrode; the winding unit on the opposite side of the chamber winds the coated material belt; and the N / S pole magnet set behind the upper electrode and the lower electrode separately produces magnetic field to raise the ionizing rate of the reacted gas. The present invention has increased collision probability between electron and reaction gas and raised evaporation coating efficiency.

Description

technical field [0001] The invention relates to a vapor deposition device, especially a continuous vapor deposition device for plasma that increases ionization capacity and enhances polymerization efficiency by alternately arranging N-pole magnets and S-pole magnets behind electrodes and increasing ionization capacity through generated electromagnetic fields. Background technique [0002] In order to improve the hydrophilicity and superhydrophobicity of the metal surface, the metal surface is usually treated by plasma vapor deposition. Using the plasma evaporation method, the adhesion is strong, and the surface treatment can also be carried out under low temperature conditions, which reduces the deformation and denaturation of the mold due to high temperature heating. [0003] The general method for evaporating polymer materials on the surface of metal materials by using plasma is: two electrodes are arranged inside the process chamber, so that the material is located betwee...

AI Technical Summary

Problems solved by technology

[0009] However, in the polymer film continuous vapor deposition device using plasma with the above structure, sufficient vapor deposition cannot be obtained when the material moves rapidly, which affects production efficiency.

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