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Production process of transparent conductive low-radiation glass coating

A technology of low-emissivity glass and production method, which is applied in the field of doped tin oxide coating, which can solve the problems that hydrogen chloride gas is difficult to be effectively treated, the treatment cost is high, and the utilization rate is low, and the solubility range is increased and the atmosphere requirement is low. , The effect of less investment in spraying equipment

Inactive Publication Date: 2006-12-27
烟台佳隆纳米产业有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Off-line vacuum magnetron sputtering uses expensive solid targets and large-scale vacuum sputtering equipment, while on-line CVD uses gaseous metal-organic compounds, which are not only expensive, but also require undecomposed raw materials and The by-products after its decomposition are processed, and the processing cost is very high
The traditional tin tetrachloride solution spraying method instantaneously decomposes and reacts at high temperature, which is difficult to control, and it is difficult to effectively deal with the large amount of hydrogen chloride gas produced continuously

Method used

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Examples

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Effect test

Embodiment 1

[0060] Embodiment 1, a kind of production method of transparent conductive low-emissivity glass coating, is first to coat the silicon dioxide intermediate transition layer on the surface of float glass, then spray tin oxide low-emissivity coating on the silicon dioxide layer with precursor solution layer, and finally coat the outer layer of silicon dioxide on the low-radiation coating, the precursor solution is synthesized by selective wet chemical reaction with tin chloride, the synthesized precursor solution is separated and purified, and the selective chemical reaction It is carried out in an alcohol solvent, and the alcohol solvent is a monohydric alcohol with a carbon content of 1-6, a polyhydric alcohol, or a mixed solvent of the two, and the tin chloride is tin dichloride or tin tetrachloride, and the monohydric alcohol is selected in this embodiment As a solvent, the inorganic compound of tin is tin dichloride, and the concentration of the tin inorganic compound is 0.01...

Embodiment 2

[0061] Embodiment 2, a kind of production method of transparent conductive low-emissivity glass coating, is first to coat silicon dioxide intermediate transition layer on the surface of float glass, then use precursor solution to spray tin oxide low-emissivity coating on the silicon dioxide layer layer, and finally coat the outer layer of silicon dioxide on the low-radiation coating, the precursor solution is synthesized by selective wet chemical reaction with tin chloride, the synthesized precursor solution is separated and purified, and the selective chemical reaction Carry out in alcoholic solvent, alcoholic solvent is monohydric alcohol, polyhydric alcohol or both mixed solvents of carbon content 1-6, and tin chloride is tin dichloride or tin tetrachloride, present embodiment selects monohydric alcohol and Polyhydric alcohol mixture is used as solvent, and the inorganic compound of tin is tin tetrachloride, and the concentration of tin inorganic compound is at 0.01-1 mol / li...

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Abstract

The present invention discloses the production process of transparent conductive low-radiation glass coating. The inorganic compound of tin is used as material in synthesizing one kind of precursor solution for producing transparent conductive low-radiation glass coating on the surface of float glass; and the precursor solution is sprayed to the surface of hot float glass to form doped low-radiation tin oxide layer with required thickness and performance. The present invention has the features of low material cost, high chemical stability at normal temperature, high decomposition efficiency at high temperature, less pollution, simple production process and being suitable for on-line and of-line producing transparent conductive low-radiation glass coating.

Description

1. Technical field [0001] The invention belongs to the technical field of forming a transparent conductive low-emissivity glass coating on the surface of float glass, and in particular relates to a precursor solution of using tin chloride to synthesize tin through selective chemical reaction as a coating raw material. A production method for depositing a transparent conductive low-radiation doped tin oxide coating on the surface. 2. Background technology [0002] Low-emissivity glass coating is to coat one or more layers of specific metal, metal oxide or nitride or a combination thereof on the glass surface by physical or chemical methods, under the premise of ensuring the visible light transmittance as high as possible , a glass functional coating that prevents the transmission of mid- and far-infrared heat radiation energy, thereby achieving energy-saving and heat-insulating effects. Because of its low emissivity, it is called low-emissivity glass coating, and the glass c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/34C03C17/23C03C4/14
Inventor 卢金山盛振宏
Owner 烟台佳隆纳米产业有限公司
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