Chemical reinforcing type positive photoresist composition
A positive photoresist, enhanced technology, applied in optics, optomechanical equipment, photosensitive materials for optomechanical equipment, etc., can solve the problem of scum generation
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[0008] The resin component of the photoresist composition of the present invention basically has two kinds of polymerized units, namely, a polymerized unit derived from hydroxystyrene and a polymerized unit derived from 2-ethyl-2-adamantyl (meth)acrylate . Although the resin component itself is insoluble or hardly soluble in alkali, it is chemically changed by the action of acid to become alkali-soluble. These polymerized units are formed by opening the double bonds in the styrene moiety and the double bonds in the (meth)acrylic acid moiety, specifically represented by the following formulas (I) and (II):
[0009] where R 1 Represents a hydrogen atom or a methyl group, R 2 Indicates ethyl.
[0010] In the hydroxystyrene unit of formula (I), the positional relationship between the hydroxyl group and the vinyl group is not particularly limited, but p-hydroxystyrene is generally used.
[0011] A resin having polymerized units derived from hydroxystyrene and polymerized unit...
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