Semiconductor storage apparatus containing image RAM
A storage device and semiconductor technology, applied in the field of image RAM, can solve problems such as high-capacity structural barriers of storage capacitors
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[0044] Next, embodiments of the present invention are explained with reference to the drawings. 2A to 4C show an example of applying the present invention to an SRAM of a four-layer structure described in the conventional art. In addition, the cross-sectional views of FIGS. 2A and 2B are cross-sectional views taken along lines AA' and BB' in FIGS. 3A to 4C, and the corresponding layout diagrams of FIGS. Projection layout in line direction. 2A and 2B, on a silicon substrate 1, a transistor layer 100, a first wiring layer 101, a second wiring layer 102, a third wiring layer 103 , the fourth wiring layer 104 , the fifth wiring layer 105 and the sixth wiring layer 106 . The uppermost layer is a passivation film 117 .
[0045] FIG. 3A is a view showing a transistor layer 100. In a memory cell MC region of a silicon substrate 1, a transistor region is formed by selectively forming a component isolation insulating film 121 by the LOCOS method. Afterwards, in some regions of the t...
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