Ion source device for low-energy ion beam material preparing method

Abstract

This invention relates to ion beam technique, which is applied in the low energy ion beam process method and the ion source device with arc room and crucible. The arc room and the crucible are one part and separate front and back with air hole between them; to load upper and down double screw wires in the arc room; the crucible is of stand type with two kinds of inner cylinders. The reaction container can load solid materials reacting with the working gas. The vapor container can adjust the light wire current between the adjustable assistant heating to control the working temperature of the control source.

Description

technical field [0001] The invention relates to ion beam technology, and is an ion source device that can be used in the preparation method of low-energy ion beam materials. It has simple structure, stable working performance, good beam quality, high ionization efficiency, and a range of source materials that can be selected and used Wide and other characteristics, the device is also applicable to other related ion beam technologies. Background technique [0002] The low-energy ion beam material preparation method with mass separation is a new technology in the development of material preparation, and it can also be referred to as the low-energy ion beam material preparation method. Different from other mature ion beam material preparation methods, such as ion sputtering, ion implantation, ion etching, plasma deposition, etc., this method uses mass-separated low-energy material ions to grow and prepare materials. It can be used for the growth of hard-to-purify, high melting...

AI Technical Summary

Problems solved by technology

In the early stage of the development of this technology, the Freeman type ion source was mostly used. This type of ion source has high thermal power and can generate many types of ions. Although solid source materials with high working temperature can be used as working substances, due to When the cathode filament is working, it is easily consumed and thinned by direct sputtering of ions. The service life of the filament is short, which affects its working stability. The beam quality and ionization efficiency are not very good, which also limits its use in Extensive use of low-energy ion beam material preparation techniques

Bernus-type ion source is another type of ion source used in low-energy ion beam material preparation technology. Its beam quality and work stability are better than those of Freeman-type ion source, but the original The cathode filament of the Bernus ion source is located at the upper end of the arc chamber body, and the thermal power is small. Although the ionization efficiency of the gas working substance is high, it is not suitable to use a solid source material with a high working temperature as the working substance, so it can be The types of ions produced are limited, which restricts its widespread use in the preparation of low-energy ion beam materials

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