Photoetching imaging polarized controller with high value aperture

A technology with high numerical aperture and polarization control, which is applied in photolithographic exposure devices, micro-lithography exposure equipment, optics, etc., can solve the problems of large influence of lithography graphics and shortening of exposure wavelength, and achieve simple and convenient design and improved resolution Power and depth of focus, the effect of improving imaging contrast

Inactive Publication Date: 2005-07-27
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

However, with the increase of the numerical aperture and the shortening of the exposure wavelength, the polarization-based vector diffraction effect has an increasing influence on the lithographic pattern.

Method used

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  • Photoetching imaging polarized controller with high value aperture
  • Photoetching imaging polarized controller with high value aperture
  • Photoetching imaging polarized controller with high value aperture

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Embodiment Construction

[0016] Such as figure 1 As shown, the present invention is composed of an ellipsoid mirror 1, a light source 2, a high-energy and high-uniform illumination component 3, a mask plate 4, a projection lithography objective lens 5, a polarization pupil device 6, and a silicon wafer 7. The light emitted by the light source 2 is collected by the ellipsoidal mirror 1, and the light is gathered through the high-energy and high-uniform illumination component 3 (the uniformity can reach ±2.5%) to illuminate the mask plate 4, and the ultra-fine feature patterns on the mask plate 4 are projected The lithography objective lens 5 projects an image onto the silicon wafer 7 . A polarization pupil device for controlling the polarization of the imaging beam is placed on the pupil plane of the projection lithography objective lens. The polarization pupil device makes the imaging beam unobstructed, changes the pupil function of the projection optics lithography imaging optical system, and the tr...

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Abstract

A polarization control device is featured as setting polarization pupil being able to control polarization of imaging light beam on pupil surface of protection photoetching objective, using the polarization pupil to have imaging light beam not blocked so as to change pupil function of projection optical photoetching-imaging optical system and to change transmission function of optical system in order to modulate photoetching for imaging to be S polarization imaging for raising quality of imaging.

Description

Technical field [0001] The invention is a novel high numerical aperture lithographic imaging polarization control device, which belongs to the technical field of step-and-repeat projection lithography machines and step-and-scan projection lithography machines for ultra-large scale integrated circuit production equipment. Background technique [0002] The urgent demand for VLSI devices has promoted the rapid development of projection optical lithography technology. In order to prolong the limit and life of projection optical lithography technology, various methods have been proposed to improve the resolution of lithography and improve the depth of focus. Methods. At present, mainly by increasing the numerical aperture (NA) of the projection lithography objective lens, shortening the exposure wavelength (λ), and improving the positioning accuracy of the workpiece stage, combined with off-axis illumination, phase shift mask, pupil filter, optical proximity effect correction and...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/28G03F7/20
Inventor 余国彬姚汉民邢廷文胡松唐小萍
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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